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    ELECTRON BEAM APPARATUS, AND X-RAY GENERATION APPARATUS AND SCANNING ELECTRON MICROSCOPE EACH INCLUDING THE SAME
    61.
    发明申请
    ELECTRON BEAM APPARATUS, AND X-RAY GENERATION APPARATUS AND SCANNING ELECTRON MICROSCOPE EACH INCLUDING THE SAME 审中-公开

    公开(公告)号：US20180366294A1

    公开(公告)日：2018-12-20

    申请号：US15919561

    申请日：2018-03-13

    Applicant: Shimadzu Corporation

    Inventor： Akihiro MIYAOKA

    IPC: H01J3/07 ,  H01J37/075 ,  H01J35/14 ,  H01J3/02 ,  H01J37/12

    Abstract: An electron beam apparatus includes: a cathode configured to emit electrons; an anode that is an electrode which forms an electric field such that an electron beam is formed by the electrons emitted from the cathode, and that is formed with a first hole through which the electron beam passes; an aperture member formed with an opening that shades a part of the electron beam which passes through the anode; and a convergence electrode that is an electrode which forms an electric field such that the electron beam which passes through the opening converges, and that is configured to include one single-hole electrode formed with a second hole through which the electron beam passes.

    Multi charged particle beam writing apparatus and multi charged particle beam writing method
    62.
    发明授权
    Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权
    多带电粒子束写入装置和多带电粒子束写入方法

    公开(公告)号：US09159555B2

    公开(公告)日：2015-10-13

    申请号：US13798669

    申请日：2013-03-13

    Applicant: NuFlare Technology, Inc.

    Inventor： Hiroshi Matsumoto

    IPC: H01J3/07 ,  H01J29/51 ,  H01J37/26 ,  H01L21/02 ,  G03F7/20 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01L21/02675 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/3177 ,  H01J2237/30433 ,  H01J2237/30455 ,  H01J2237/31794

    Abstract: A multi charged particle beam writing apparatus includes a unit to calculate a predetermined function expression by a correction coefficient that corrects an open area of each opening for forming a beam group, wherein the predetermined function expression minimizes a sum of squared values of all the beam groups, where each of the squared values is calculated by squaring a difference between a current value measured of the beam group and a sum of products for the beam group, where each of the products is obtained by multiplying a corrected open area by the predetermined function expression; a unit to calculate the correction coefficient that corrects the open area by using the predetermined function expression and the current value of the beam, for each beam; and a unit to calculate a current density of each of the multiple beams by the predetermined function expression.

    Abstract translation: 多带电粒子束写入装置包括：通过校正用于形成光束组的每个开口的开放区域的校正系数来计算预定函数表达式的单元，其中，所述预定函数表达式将所有波束组的平方值的和最小化 其中每个平方值通过平方光束组的测量的当前值与波束组的乘积之和之间的差值来计算，其中每个乘积通过将校正的开放面积乘以预定函数表达式而获得 ; 对于每个光束，计算通过使用预定函数表达式和光束的当前值来校正开放区域的校正系数的单元; 以及通过预定函数表达式计算多个光束中的每一个的电流密度的单元。

    Ion source having a shutter assembly
    63.
    发明授权
    Ion source having a shutter assembly 有权
    具有快门组件的离子源

    公开(公告)号：US08497486B1

    公开(公告)日：2013-07-30

    申请号：US13651685

    申请日：2012-10-15

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Jeffrey Charles Blahnik ,  William T. Weaver

    IPC: H01J49/10 ,  H01J37/317 ,  H01J27/02 ,  H01J3/07

    CPC classification number: H01J27/024 ,  H01J27/08 ,  H01J37/08 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/043 ,  H01J2237/30472 ,  H01J2237/3171

    Abstract: An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a shutter assembly positioned outside of the arc chamber proximate the extraction plate. The shutter assembly is configured to block at least a portion of one of the plurality of extraction apertures during one time interval. The ion source combined with relative movement of a workpiece to be treated with an ion beam extracted from the ion source enables a two dimensional ion implantation pattern to be formed on the workpiece using only one ion source.

    Abstract translation: 离子源包括限定电弧室的电弧室壳体。 电弧室壳体具有固定位置的提取板，并且提取板限定多个提取孔。 离子源还包括位于靠近提取板的弧形室外部的快门组件。 快门组件构造成在一个时间间隔期间阻挡多个提取孔中的一个的至少一部分。 离子源与从离子源提取的离子束相关的待处理工件的相对移动结合使得仅使用一个离子源就能在工件上形成二维离子注入图案。

    Apparatus for generating a plurality of beamlets
    66.
    发明公开
    Apparatus for generating a plurality of beamlets 审中-公开
    用于生成多个子束的设备

    公开(公告)号：EP2503587A3

    公开(公告)日：2017-08-23

    申请号：EP12172592.3

    申请日：2004-03-10

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Kruit, Pieter

    IPC: H01J37/317 ,  H01J37/063 ,  H01J3/02 ,  H01J37/153 ,  H01J37/12 ,  H01J3/07

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
    a charged particle source (1) for generating a diverging charged particle beam;
    a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
    said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),

    wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.

    Abstract translation: 本发明涉及用于产生多个带电粒子小射束的设备和包括这种设备的带电粒子束光刻系统，所述设备包括：用于产生发散带电粒子束的带电粒子源（1） 准直所述发散带电粒子束的准直装置（4），其中所述准直装置包括至少一个偏转器阵列，所述偏转器阵列适于使施加到所述偏转器阵列的每个偏转器上的电压偏转小射束（8），其中 所述偏转器阵列的至少一个偏转器适于确定与其相对于光束的光轴的距离成比例的偏转效应。

    NEUTRAL PARTICLE GENERATOR
    69.
    发明公开
    NEUTRAL PARTICLE GENERATOR 审中-公开
    NEUTRALPARTIKELGENERATOR

    公开(公告)号：EP2308273A1

    公开(公告)日：2011-04-13

    申请号：EP09802262.7

    申请日：2009-06-22

    Applicant: Jiddtek Pty Ltd

    Inventor： SHRIER, Oded

    IPC: H05H3/06 ,  H01J1/92 ,  H01J3/07 ,  H01J29/50

    CPC classification number: H05H3/02 ,  G21B1/19 ,  H05H3/06 ,  Y02E30/16

    Abstract: A neutral particle generator is disclosed that includes a container which holds a material in at least a partial plasma state, for example a Deuterium plasma. In one form, a first cathode is positioned within the container and produces a first beam of neutral particles directed away from the first cathode. Optionally, a second cathode is also positioned within the container and produces a second beam of neutral particles directed away from the second cathode, and/or a target is also positioned within the container. In one form, the first cathode and the second cathode are linearly opposed so that the first beam interacts/collides with the second beam resulting in fusion reactions of at least some of the neutral particles, which thereby results in generation of emitted neutrons.

    콘버젼스 보정 회로
    70.
    实用新型
    콘버젼스 보정 회로 无效
    转换校正电路

    公开(公告)号：KR2019950009914U

    公开(公告)日：1995-04-21

    申请号：KR2019930019239

    申请日：1993-09-23

    Applicant: 주식회사 엘지이아이

    Inventor： 박정술

    IPC: H01J3/07

    Abstract: 본고안은횡방향미스콘버젼스를보정하기위하여사용하던콘버젼스요크코일을제거하고, 전류제어용다이오드와전류제어용가변저항을사용함으로생상성이향상되고미스콘버젼스의보정이정밀하게함으로제품의신뢰성이향상시키기위하여, 직렬로연결되어 3색(R,G,B)빔을편향시켜초점을일치시키도록조정하는좌,우수직편향코일(L,L)과; 상기좌수직편향코일(L)병렬로연결되어좌수직편향코일(L) 흐르는전류를제어하는제1전류제어부(1)와; 상기우수직편향코일(L)에병렬로연결되어우수직편향코일(L)에흐르는전류를제어하는제2전류제어부(20)와; 상기제1전류제어부(10)와제2전류제어부(20)에접속되어제1전류제어부(10)와제2전류제어부(20)에인가되는전류를제어함과동시에우수직편향코일(L)과좌수직편향코일(L)에제어단자를공통접속하여상기좌,우수직편향코일(L,L)에분배되는전압비를제어하는가변저항(R)으로구성함을특징으로하는콘버젼스보정회로이다.

    Abstract translation: 纸内侧横向错过锥体除去锥体版本的磁轭线圈被用于补偿版本开关，以及电流控制二极管涡流控制通过使用可变电阻器的saengsangseong通过的准确产物提高命中锥体版本的补偿可靠性 为了聚散度，其串联连接到三种颜色（R，G，B），以偏转的光束被调整为焦点左和优良的直线偏转线圈（L，L）和相匹配; 第一电流控制单元1与左垂直偏转线圈L并联连接，以控制流经左垂直偏转线圈L的电流; 和用于控制电流流过并联地连接到垂直偏转线圈固体（L）的实垂直偏转线圈（L）的第二电流控制部20; 第一电流控制单元10沃赫2被连接到一个电流控制器20，第一电流控制部分10沃赫第二电流控制部20良好的直偏转线圈（L），并在同一时间控制电流施加到gwajwa垂直 一个反面的版本​​的校正电路，其特征在于，它包括一个可变电阻器（R）到共同连接的控制端子，以用于控制所述电压比所述偏转线圈（L）的要被分发到左和优异的垂直偏转线圈（L，L）。

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