SYSTEM AND METHOD FOR COMPENSATING FOR NON-LINEAR RESPONSE CHARACTERISTIC IN PHASE-SHIFTING DEFLECTOMETRY

    公开(公告)号:US20210172731A1

    公开(公告)日:2021-06-10

    申请号:US16610664

    申请日:2018-08-14

    Abstract: The present disclosure is directed to a system and a method for compensating non-linear response characteristics in measuring the shape of an object using phase-shifting deflectometry. More particularly, the present disclosure is directed to a method for compensating non-linear response characteristics in phase-shifting deflectometry including steps of: generating a pattern by a pattern generating portion and projecting the same to a measurement object; obtaining an image of a deformed pattern reflected from the measurement object by a detector; linearizing non-linear responses on the basis of a look up table considering non-linear response characteristics of the pattern generating portion and the detector by a compensation means; and compensating phase-shifting amounts generated due to non-linear response characteristics by the compensation means.

    METHOD OF FORMING DOUGHNUT-SHAPED SKYRMION

    公开(公告)号:US20210050509A1

    公开(公告)日:2021-02-18

    申请号:US16654647

    申请日:2019-10-16

    Abstract: Disclosed is a method of forming a doughnut-shaped skyrmion, the method including heating a local area of a vertical magnetic thin film magnetized in a first direction, which is any one of an upward direction and a downward direction, applying a magnetic field having a second direction, which is opposite the first direction, and having intensity higher than coercive force of the vertical magnetic thin film to the vertical magnetic thin film to form a first area magnetized in the second direction, applying a magnetic field having the second direction to the vertical magnetic thin film to form a second area, which is an extension of the first area, and applying a magnetic field having the first direction to the vertical magnetic thin film to form a third area magnetized in the first direction in the second area.

    METHOD FOR DETERMINING LOSS OF GAS IN GAS CONTAINER

    公开(公告)号:US20210025549A1

    公开(公告)日:2021-01-28

    申请号:US16477017

    申请日:2018-01-16

    Abstract: The present invention relates to a method for determining loss of gas in a gas container. According to an embodiment of the present invention, the method for determining the loss of gas in the gas container is characterized by including the steps of (a) filling a first container (10) with a component gas and a balance gas, (b) measuring a gas pressure inside the first gas container (11), (c) allowing the first gas container and a second gas container having an evacuated inside to communicate and performing a first-stage gas pressure split, and (d) measuring a gas pressure inside the second gas container, wherein an amount of the component gas adsorbed inside the gas container is calculated through a difference between a measured value of step (b) and a measured value of step (d) and is determined as an amount of gas loss.

    Electromagnetic Wave Impedance Measuring Apparatus and Calibration Method of Impedance

    公开(公告)号:US20190235000A1

    公开(公告)日:2019-08-01

    申请号:US16332349

    申请日:2016-10-27

    Abstract: An electromagnetic wave impedance measuring apparatus includes a network analyzer, configured to measure scattering parameters according to a frequency, including a first port and a second port; and a multilayer substrate, connected to the first port and the second port by a coaxial cable, having a via connecting conductive layers to each other and including three or more conductive layers including at least an uppermost layer, a lowermost layer, and an intermediate layer. The multilayer substrate includes a test sample disposed between the uppermost layer and the lowermost layer; a through calibration standard disposed between the uppermost layer and the lowermost layer; a reflect calibration standard disposed between the uppermost layer and the lowermost layer; and a line calibration standard disposed between the uppermost layer and the lowermost layer. Each of the test sample, the through calibration standard, the reflect calibration standard, and the line calibration standard is connected by a first error box, having the via, and a second error box having the via of the same structure as the via of the first error box.

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