公开(公告)号：KR100477703B1

公开(公告)日：2005-03-18

申请号：KR1020030006284

申请日：2003-01-30

Applicant: 삼성전자주식회사

Inventor： 김태균 ,  조서현 ,  정명송

IPC: B41J2/235

Abstract: 잉크젯 프린트헤드 및 그 제조방법이 개시된다. 개시된 잉크젯 프린트헤드는, 잉크 저장고로부터 잉크를 공급하는 잉크 유로와, 공급된 잉크를 토출하는 다수의 노즐이 형성된 노즐 플레이트를 구비하며, 상기 노즐 플레이트의 상부에 발수층이 형성된 잉크젯 프린트헤드에 있어서; 상기 발수층은, 그 두께가 10~30 Å 인 것을 특징으로 한다. 이에 따르면, 노즐 플레이트의 표면에 발수층을 형성시 고가 장비인 CVD, PVD를 사용하지 않아도 된다. 또한, 간단한 접촉 인쇄에 의해 노즐면 위에 발수층을 형성할 수 있으며, 더욱이 노즐 단의 내부에 발수 코팅층을 형성함으로써 노즐 단에서의 잉크 고임을 방지하고 잉크의 메니스커스의 안정화를 이루어 인쇄 품질을 향상시킬 수 있다.

公开(公告)号：KR100474848B1

公开(公告)日：2005-03-10

申请号：KR1020020042485

申请日：2002-07-19

Applicant: 삼성전자주식회사

Inventor： 김태균 ,  이종하

IPC: G06K9/00

CPC classification number: G06K9/00228

Abstract: 본 발명은 입력영상에서 복수의 얼굴을 실시간으로 검출하고 추적할수 있는 시스템 및 방법을 개시한다.
본 발명의 시스템은 입력영상으로부터 배경영상을 제거하여 움직이는 영역을 추출하는 배경제거부, 얼굴 피부색 모델로부터 생성된 피부색 확률맵(P
skin )과 얼굴이 존재할 확률을 나타내는 전역적 확률맵을 이용하여, 움직이는 영역에서 얼굴이 위치할 수 있는 후보얼굴영역을 추출하는 후보얼굴영역 추출부, 후보얼굴영역에서 ICA(Independent Component Analysis) 특징을 추출하여, 후보얼굴영역이 얼굴영역인지를 판단하는 얼굴 영역 판단부, 및 피부색 확률맵에 기반하여, 다음 프레임에서 얼굴이 위치할 확률을 나타내는 방향 지향성 커널에 따라서 얼굴 영역을 추적하는 얼굴영역 추적부를 포함한다.

公开(公告)号：KR100462183B1

公开(公告)日：2004-12-17

申请号：KR1020020087920

申请日：2002-12-31

Applicant: 삼성전자주식회사

Inventor： 김태균 ,  김상룡 ,  기석철 ,  황원준 ,  김현우

IPC: G06T7/00

Abstract: PURPOSE: A face searching method by using coupled component descriptor and a device thereof are provided to realize a single face descriptor by coupling component descriptors divided by component, thereby reducing the data processing amount and realize the precise search. CONSTITUTION: A face searching device by using coupled component descriptor includes a cascaded LDA conversion part(10), a similarity determining part(20), and an image DB(30) for storing studied face images. The cascaded LDA conversion part has an image input part(100) for inputting face images, and a component dividing part(200) for dividing the input images by L components with reference to eyes, a noise or a mouth. In the division, the respective components are partially overlapped for preventing the loss of the face characteristics. The L divided components are LDA converted to respective component descriptors by a first LDA conversion part(300). A vector synthesizing part(400) couples the L component descriptors to a single vector. The vector is LDA- or GDA converted by a second LDA or GDA conversion part(500). The similarity determining part calculates a cross-correlation between face descriptors of a query face images with face descriptors of the studied face images in the image DB.

Abstract translation: 目的：提供一种利用耦合组件描述符的人脸搜索方法及其装置，通过耦合分量描述符来实现单人脸描述符，从而减少数据处理量，实现精确搜索。 本发明提供了一种通过使用耦合组件描述符的人脸搜索设备，其包括级联LDA转换部件（10），相似性确定部件（20）以及用于存储研究人脸图像的图像DB（30）。 级联LDA转换部分具有用于输入脸部图像的图像输入部分（100）和用于参考眼睛，噪声或嘴巴将输入图像分成L分量的分量分割部分（200）。 在划分中，各个组件部分重叠以防止脸部特征的丢失。 通过第一LDA转换部分（300），L个分开的分量被LDA转换为各个分量描述符。 矢量合成部分（400）将L个分量描述符耦合到单个矢量。 该向量是由第二LDA或GDA转换部分（500）转换的LDA或GDA。 相似度确定部分计算查询脸部图像的脸部描述符与图像DB中的研究脸部图像的脸部描述符之间的互相关。

公开(公告)号：KR100425306B1

公开(公告)日：2004-03-30

申请号：KR1020010062947

申请日：2001-10-12

Applicant: 삼성전자주식회사

Inventor： 박성준 ,  조서현 ,  고상철 ,  민재식 ,  김경일 ,  박병하 ,  김태균 ,  정명송

IPC: B41J2/045

CPC classification number: B41J2/1603 ,  B41J2/14129 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1645

Abstract: A bubble-jet type ink-jet printhead has a structure in which a base plate, a barrier wall, and a nozzle plate are stacked. The base plate includes a substrate on which a recess is formed to a predetermined depth, an adiabatic layer formed on the substrate, a heater which is formed on the adiabatic layer and generates a thermal energy, and a passivation layer which is formed on the heater and passivates the heater. The barrier wall is stacked on the base plate, defines an ink chamber, which is disposed on the recess and has a recessed bottom surface, and defines an ink passage which communicates with the ink chamber. The nozzle plate is stacked on the barrier wall, has nozzles through which ink is ejected, and is formed at a location corresponding to a center of the ink chamber. Since a height of the barrier wall surrounding the ink chamber is reduced by the recess, delamination caused by ink soaked into the barrier wall can be prevented, and print performances such as a traveling property in a straight direction of ink droplets and ejection velocity of ink droplets, are improved.

Abstract translation: 气泡喷射式喷墨打印头具有其中基板，阻挡壁和喷嘴板堆叠的结构。 该基板包括：基板，其上形成预定深度的凹槽;绝热层，形成在基板上;加热器，形成在绝热层上并产生热能;以及钝化层，形成在加热器上 并钝化加热器。 阻挡壁堆叠在基板上，限定墨腔室，该墨腔室设置在凹槽中并具有凹入的底表面，并且限定与墨腔室连通的墨通道。 喷嘴板堆叠在阻挡壁上，具有通过其喷射墨的喷嘴，并形成在与墨室的中心相对应的位置处。 由于围绕墨水腔室的隔离壁的高度被凹槽减小，因此可以防止由浸入隔离壁中的墨水引起的分层，并且可以实现打印性能，例如墨滴的直线方向上的行进特性和墨水的喷射速度 液滴，都有所改善。

公开(公告)号：KR1020040017176A

公开(公告)日：2004-02-26

申请号：KR1020020049317

申请日：2002-08-20

Applicant: 삼성전자주식회사

Inventor： 조서현 ,  김윤기 ,  정명송 ,  김태균

IPC: B41J2/235

CPC classification number: B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642

Abstract: PURPOSE: A monolithic bubble ink jet printer head and a method for manufacturing the same are provided to prevent uniformity between cells from being lowered by integrally forming a nozzle with a chamber using a photoresist. CONSTITUTION: A monolithic bubble ink jet printer head(100) includes a substrate(101), a first ink feeding path(102), and a chamber/nozzle plate(109). The substrate(101) is formed with a heater(106) for heating ink and a first protective layer(105) for protecting the heater(106). The first ink feeding path(102) forms an ink feeding passage passing through the substrate(101). The chamber/nozzle plate(109) is formed on the first protective layer(105) by pattering a photoresist(108) through a photolithography process. The first protective layer(105) formed on the heater(106) includes silicon nitride, or silicon carbide.

Abstract translation: 目的：提供一种单片气泡喷墨打印机头及其制造方法，以通过使用光致抗蚀剂一体地形成具有腔室的喷嘴来防止电池之间的均匀性降低。 构成：单片式气泡喷墨打印头（100）包括基板（101），第一墨供给路径（102）和腔室/喷嘴板（109）。 基板（101）形成有用于加热墨的加热器（106）和用于保护加热器（106）的第一保护层（105）。 第一供墨路径（102）形成通过基板（101）的供墨通道。 室/喷嘴板（109）通过光刻工艺图案化光致抗蚀剂（108）而形成在第一保护层（105）上。 形成在加热器（106）上的第一保护层（105）包括氮化硅或碳化硅。

公开(公告)号：KR1020030084570A

公开(公告)日：2003-11-01

申请号：KR1020030006726

申请日：2003-02-04

Applicant: 삼성전자주식회사

Inventor： 김현우 ,  김태균 ,  황원준 ,  기석철

IPC: G06K9/00

Abstract: PURPOSE: A method and a device for recognizing a face using a component based face descriptor are provided to remarkably reduce the decrease of the face recognition due to a change of light or pose by applying the LDA(Linear Discrimination Analysis) to whole face, and applying the LDA to all face components after dividing the face components. CONSTITUTION: A component dividing part(420) divides an input face image into the face component images. A face descriptor generator(430) generates the face descriptors, which is a characteristic vector expressing each face component image, by using a conversion matrix matched with each face component. A registered face descriptor database(450) stores the registered face descriptor. A certification part(440) certifies the input face image by comparing the face descriptors of the face image inputted from the face descriptor generator(430) with the registered face descriptors, and respectively giving a constant weight matched with the face component to a comparison result of each face component.

Abstract translation: 目的：提供一种使用基于组件的面部描述符识别脸部的方法和装置，以通过将LDA（线性鉴别分析）应用于整个脸部来显着地减少由于光或姿势的变化引起的面部识别的减少，以及 在分割面部组件之后，将LDA应用于所有面部组件。 构成：分量分割部分（420）将输入面部图像划分为面部分量图像。 面部描述符生成器（430）通过使用与每个面部分量匹配的转换矩阵来生成表示每个面部成分图像的特征向量的面部描述符。 登记的面部描述符数据库（450）存储登记的面部描述符。 认证部件（440）通过将从面部描述符发生器（430）输入的面部图像的面部描述符与登记的面部描述符进行比较来证明输入面部图像，并且分别给予与面部分量匹配的恒定重量以进行比较结果 的每个面部组件。

公开(公告)号：KR100396559B1

公开(公告)日：2003-09-02

申请号：KR1020010068631

申请日：2001-11-05

Applicant: 삼성전자주식회사

Inventor： 김태균 ,  조서현 ,  정명송 ,  김경일 ,  박성준

IPC: B41J2/17

CPC classification number: B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2/1646 ,  G03F7/038 ,  G03F7/2022

Abstract: A method of manufacturing a monolithic ink-jet printhead includes a heating element which generates bubbles by heating ink is formed on a surface of the substrate, and a negative photoresist which is coated to a predetermined thickness on the substrate on which the heating element is formed. Next, a portion, which forms a sidewall of an ink passage forming wall surrounding an ink chamber and a restrictor, of the negative photoresist is flush exposed to light and cured using a first photomask in which patterns of the ink chamber and the restrictor of the ink passage are formed. Subsequently, a second portion which forms an upper wall of the ink passage forming wall of the negative photoresist is exposed to the light using a second photomask in which the pattern of a nozzle is formed, and the second portion is exposed to the light by only a predetermined thickness. Last, an uncured portion of the negative photoresist is dissolved and removed using solvent. An ink-jet printhead whose elements are monolithically formed by a simplified process using a single negative photoresist can be manufactured.

Abstract translation: 一种制造整体式喷墨打印头的方法包括通过加热油墨而在基底的表面上形成气泡的加热元件，以及在其上形成加热元件的基底上涂覆预定厚度的负性光致抗蚀剂 。 接下来，使用第一光掩模对形成围绕负光致抗蚀剂的墨室和限制器的墨通道形成壁的侧壁的部分齐平地曝光并固化，在该第一光掩模中，墨腔室和 墨通道被形成。 随后，形成负性光致抗蚀剂的墨通道形成壁的上壁的第二部分通过使用其中形成有喷嘴的图案的第二光掩模而暴露于光，并且第二部分仅通过仅暴露于光 预定的厚度。 最后，使用溶剂溶解并除去未固化的负性光刻胶部分。 可以制造其元件通过使用单一负性光致抗蚀剂的简化工艺单片形成的喷墨打印头。

公开(公告)号：KR1020030006539A

公开(公告)日：2003-01-23

申请号：KR1020010042351

申请日：2001-07-13

Applicant: 삼성전자주식회사

Inventor： 최정필 ,  김상룡 ,  홍영진 ,  최정일 ,  정기정 ,  박준호 ,  김현진 ,  김태균

IPC: H04N7/18

Abstract: PURPOSE: A digital monitoring system and the method thereof are provided to accurately photograph an intruder's face, and obtain the maximum image compression effect. CONSTITUTION: A method for digital monitoring includes the steps of photographing an image of a predetermined monitoring target area and converting the image into digital data(S10), detecting data related to a face area from the converted digital data(S20), selectively compressing the detected face area data and the total video data of the monitoring target area(S30), generating and storing a database from the selectively compressed data(S40), generating search interfaces(S50), calculating the importance of faces if the detected face areas are more than two(S60-S70), tracking and expansively photographing the face according to the importance(S80).

Abstract translation: 目的：提供数字监控系统及其方法，准确拍摄入侵者的脸部，获得最大的图像压缩效果。 构成：数字监视方法包括以下步骤：拍摄预定监视对象区域的图像并将图像转换为数字数据（S10），从转换的数字数据检测与脸部区域相关的数据（S20），选择性地压缩 检测到的面部区域数据和监视对象区域的总视频数据（S30），从选择压缩数据生成并存储数据库（S40），生成搜索界面（S50），如果检测到的面部区域为 两个以上（S60-S70），根据重要性跟踪和广泛拍摄面部（S80）。

公开(公告)号：KR1020020014070A

公开(公告)日：2002-02-25

申请号：KR1020000047145

申请日：2000-08-16

Applicant: 삼성전자주식회사

Inventor： 박승배 ,  정원영 ,  김태균 ,  박윤세

IPC: H01L21/324

Abstract: PURPOSE: An apparatus for fabricating a semiconductor including a wafer cooling apparatus is provided to reduce a wafer from being warped by a rapid temperature variation, by repeatedly performing a process for cooling an annealed wafer at a temperature from an annealing temperature to a cooling temperature and by ultimately reducing the temperature of the annealed wafer to a desired temperature. CONSTITUTION: A fabrication process fabricates a semiconductor device on the wafer at the first temperature condition. The first cooling apparatus reduces the temperature of a heated wafer to the second temperature lower than the first temperature. The second cooling apparatus reduces the temperature of the wafer to the third temperature lower than the second temperature.

Abstract translation: 目的：提供一种用于制造包括晶片冷却装置的半导体的装置，以通过在从退火温度至冷却温度的温度下重复执行用于冷却退火晶片的工艺来减少由快速温度变化而翘曲的晶片，以及 通过最终将退火的晶片的温度降低到期望的温度。 构成：制造工艺在第一温度条件下在晶片上制造半导体器件。 第一冷却装置将加热的晶片的温度降低到低于第一温度的第二温度。 第二冷却装置将晶片的温度降低到低于第二温度的第三温度。

公开(公告)号：KR1020010036507A

公开(公告)日：2001-05-07

申请号：KR1019990043538

申请日：1999-10-08

Applicant: 삼성전자주식회사

Inventor： 김태균

IPC: H01L21/306

Abstract: PURPOSE: An apparatus for wet-etching a wafer used in manufacturing a semiconductor is provided to eliminate the need for a wafer guide and to rapidly exhaust the wafer, by making the wafer soaked in buffered oxide etching(BOE) solution while the wafer is held by a robot. CONSTITUTION: A wafer is processed in a process chamber(300). A buffered oxide etching(BOE) solution supplying line(230) supplies BOE solution into the process chamber. A heat exchanger(250) controls the temperature of the process chamber, disposed in a lower portion of the process chamber. A robot guides the wafer into the process chamber, and continuously holds the wafer while the wafer is soaked in the BOE solution of the process chamber.

Abstract translation: 目的：提供一种用于湿式蚀刻用于制造半导体的晶片的设备，以便在晶片保持时通过使晶片浸泡在缓冲氧化物蚀刻（BOE）溶液中而消除对晶片引导件的需要并快速排出晶片 由机器人 构成：在处理室（300）中处理晶片。 缓冲氧化物蚀刻（BOE）溶液供应管线（230）将BOE溶液供应到处理室中。 热交换器（250）控制设置在处理室下部的处理室的温度。 机器人将晶片引导到处理室中，并且在将晶片浸泡在处理室的BOE溶液中的同时连续地保持晶片。