公开(公告)号：JPH0855785A

公开(公告)日：1996-02-27

申请号：JP6415895

申请日：1995-03-23

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  WATANABE YUTAKA

IPC: G03B27/72 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To get a technique for correction of transcription magnification suitable for scanning exposure by relatively scanning a mask and a wafter held in specified relation, with a beam, and inching the wafer and the mask relatively in scanning direction synchronously with the scanning. CONSTITUTION:Emitted light in the shape of a sheet beam being emitted from the luminous point 11 of synchrotron ring enters an X-ray mirror obliquely and is reflected there. The X-ray mirror 7 rotates at a specified speed, based on the command of a controller 6. The light 1 in the shape of a slit shifts at a specified speed accompanying the change of the glancing angle beta to the X-ray mirror 7 by rotation, and it scan the whole of the exposure region on a mask. Hereby, the transcription pattern of the X-ray mask 2 is projected on the wafer 3 where resist is applied, and it is exposed and transcribed. An X-ray mask 2 is fixed to a mask stage 4, and can shift in Y direction and Z direction. Moreover, a wafer 3 is fixed onto a wafer stage 5, and can shift in X direction and Z direction.

公开(公告)号：JPH07321007A

公开(公告)日：1995-12-08

申请号：JP10969694

申请日：1994-05-24

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  HARUMI KAZUYUKI ,  WATANABE YUTAKA

IPC: G03F7/20 ,  G03B27/32 ,  H01L21/027

Abstract: PURPOSE:To provide an aligner wherein uniform dose can be obtained all over the whole exposure region surface when the position of synchrotron radiation to a mirror is changed. CONSTITUTION:The aligner is provided with a mirror 2 which reflects synchrotron radiation 1, a mirror driving mechanism 3 which retains and vibrates the mirror 2, an X-ray position detector 5 which detects the beam position of the synchrotron radiation 1 entering the mirror 2, and an adjusting mechanism 7 which adjusts the average position of the mirror 2 to the synchrotron radiation 1 on the basis of the output of the detector 5. The mirror driving mechanism 3 and the X-ray position detector 5 are mounted on the same reference stand 4, and practically built in a body.

公开(公告)号：JPH0773831A

公开(公告)日：1995-03-17

申请号：JP16570293

申请日：1993-07-05

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  AMAMIYA MITSUAKI

IPC: H01J35/10 ,  H05G1/00 ,  H05G1/66

Abstract: PURPOSE:To make the measurement using X-ray having different energy simply and at a low cost. CONSTITUTION:A rotary anode 11 is divided into a plurality of regions 111, 112 about the circumference. and the regions are made from different substances (target substance), for example copper and chromium. A rotary encoder 13 is furnished to sense the rotational angle of this rotary anode 11, and a gate circuit 19 is controlled in accordance with the rotational angle, and the result from X-ray sensing is taken in according to the region on the rotary anode 11, i.e., the target substance constituting the region.

公开(公告)号：JPH06349713A

公开(公告)日：1994-12-22

申请号：JP14201693

申请日：1993-06-14

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  AMAMIYA MITSUAKI

IPC: G01T1/185 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To accurately measure the energy absorbed by a resist even if the spectrum of applied X ray changes. CONSTITUTION:An electrode 4 where a voltage is applied is laid out inside a closed ionization box and a gas containing an element composition (excluding hydrogen and helium) which is virtually equal to the resist exposed to X ray is filled. When X ray 1 enter from an incidence window 3, secondary electrons corresponding to X-ray intensity are generated and the X-ray intensity can be measured by measuring the ionization current of ionized gas. Since the wavelength dependency of detection sensitivity is equal to that of resist, use of the detector output for resist exposure improves the accuracy for controlling amount of exposure.

公开(公告)号：JPH05188149A

公开(公告)日：1993-07-30

申请号：JP2324392

申请日：1992-01-13

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  FUKUDA YOSHIAKI

IPC: G01T1/36 ,  H01L21/027

Abstract: PURPOSE:To facilitate the control of the exposure of X rays in an exposing region by estimating the wavelength of the X rays for exposing each point of the exposing region of a wafer by a simple method. CONSTITUTION:The waver stage of an exposing device of incident X rays is moved. An X-ray-intensity detector 1, which is held at the periphery of the wafer stage, is located at the specified position of a wafer exposing region. The intensity of the X rays 6 after the X rays are transmitted through a first filter 3 of the X-ray-intensity detector 1 is measured. Then, the wavelength of the incident X rays and the intensity of the X rays 6, which are transmitted through a second filter 4 having a thin film 4b whose relationship with the radiation absorbing coefficient is known, are measured. The radiation absorbing coefficient of the thin film 4b is computed based on the measured results, and the wavelength of the X rays is estimated.

公开(公告)号：JPH04221786A

公开(公告)日：1992-08-12

申请号：JP41271390

申请日：1990-12-21

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  AMAMIYA MITSUAKI

IPC: G01T1/29 ,  H05H13/04

Abstract: PURPOSE:To perform high-accurate detection of the beam position of synchrotron emission beam without the occurrence of deterioration of performance to a detector. CONSTITUTION:A beam position monitoring mechanism for synchrotron emission beam comprises a monocrystal 13 to effect Bragg reflect of X-rays, satisfying a given condition in synchrotron emission beams 11, by a surface paralleling a crystal surface and a beam position detector 12 one-dimensionally having position resolution, and formed in a manner to have detecting sensitivity only in an X-ray region, and receiving X-rays Bragg-reflected by means of the monocrystal.

公开(公告)号：JPH04145392A

公开(公告)日：1992-05-19

申请号：JP26834590

申请日：1990-10-08

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  MIYAKE AKIRA

IPC: G01T1/29 ,  H05H13/04

Abstract: PURPOSE:To detect the position of a synchrotron radiation beam with good position-detection accuracy by providing an incident plate having first and second triangular windows which are of the same dimensions and of the same shape, and are inverted up and down to each other, for transmitting the synchrotron radiation beam. CONSTITUTION:The synchrotron radiation beam that has been incident on an ion chamber 4 ionizes the Ar gas filled inside the ion chamber 4. Since the electrons caused by the ionization are attracted to first and second electrodes 61 and 62, electric currents 1a and 1b are produced between the first and the second electrodes 61 and 62, and the earth respectively. In this case, the currents 1a, 1b are proportional to the opening lengths La and Lb of the right-angled triangular windows 11, 12 for transmitting the synchrotron radiation beam, and the currents 1a and 1b are detected by two ammeters 71, 72 respectively, and the ratio of the difference between both currents (1a - 1b) to the sum of both currents (1a + 1b) is obtained. Thus, the beam position of the synchrotron radiation beam can be detected.

公开(公告)号：JPH0488621A

公开(公告)日：1992-03-23

申请号：JP20253190

申请日：1990-08-01

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  AMAMIYA MITSUAKI

IPC: G01B11/27 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to detect the amount of angular deviation and the direction of deviation of an incident light from the output intensity of the detector by a method wherein a detector and an incident-light controlling device, with which the amount of light impinging on the detector is controlled in accordance with the angle and direction of incidence of light. CONSTITUTION:An angular deviation detecting mechanism 33 is incorporated in the X-ray exposing device with which an exposing operation is conducted using a synchrotoron radiation light. An exposing operation is conducted using a radiation light 31. The radiation light 31 is made incident on an exposure chamber 39 through the intermediary of an X-ray transmitting window 32. The region of incidence of the radiation light 31 in the exposure chamber 39 is constituted in such a manner that the mask 35 and the wafer 36, which are held by air suction by a mask chuck 34 and a wafer chuck 40 respectively, are properly angled at the mask and the mask chuck and the wafer chuck. The chucks 34 and 40 are provided on a mask stage 37 and a wafer stage 38 respectively in a movable manner. As the exposure is performed by the light passing the center part of the mask 35, the amount of angular deviation between the incident light, such as angle-determining light, a radiation light 31 and the like, and the reference axis and the direction of angular deviation can be detected even when the exposing operation is being conducted.

公开(公告)号：JPH03135010A

公开(公告)日：1991-06-10

申请号：JP27187789

申请日：1989-10-20

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI ,  AMAMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To preponderantly control an essential part in an atmosphere of helium by a method wherein a supply port, a discharge port and a pressure detection port of helium are installed near an X-ray irradiation passage, from a light- shielding window to a wafer, through which X-rays are passed. CONSTITUTION:A wafer 15 is exposed, via a mask 13 in a stage-housing chamber 19, to X-rays from an X-ray source via a light-shielding window 6. The air inside the chamber 19 is replaced with helium of a required pressure; after that, helium is supplied to keep a purity of helium against a leak or the like of the air into a seal of the chamber 19; then, a pressure of the helium in an X-ray irradiation passage is controlled to be definite via a variable valve 10. A helium supply port 3, a helium discharge port 4 and a helium pressure inspection port 7 which are used to control the helium are installed near the X-ray irradiation passage from the window 6 to the wafer 15; an atmosphere of helium in an essential part is controlled preponderantly. Thereby, a high-accuracy exposure operation is executed. When a thin film is installed at the side of the X-ray source from the mask, it is possible to prevent a vibration of the mask by an air current of helium.

公开(公告)号：JPH0271188A

公开(公告)日：1990-03-09

申请号：JP22225188

申请日：1988-09-07

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  OZAWA KUNITAKA ,  EBINUMA RYUICHI ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G01T1/29 ,  G03F7/20 ,  G21K5/02 ,  G21K5/04 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To measure X-ray intensity with high accuracy even if synchrorotron radiation light (SOR) is used by measuring X-ray intensity after electrons for generating SOR is injected into an SOR ring. CONSTITUTION:When a shutter 7 is closed, electrons are supplied to an SOR ring 1 from an injector 10 and accelerated. Then, with an instruction from a CPU 16, an X-ray detector driving device 12 brings out, via an X-ray detector controller 14, an X-ray detector 6 into an exposed area to measure X-ray intensity. The measured X-ray intensity is sent to the CPU 16 via a signal processor 11. From the measurement result and an attenuation curve of the injected electrons, the X-ray intensity being exposed is calculated. This enables estimation of X-ray intensity during shot exposure from one or more measurements of X-ray intensity after orbit electron injection and the attenuation curve of the orbit electrons.