Abstract:
Embodiments of the present invention provide a substrate support assembly including an electrostatic chuck with enhanced heat resistance. In one embodiment, an electrostatic chuck includes a support base, an electrode assembly having interleaved electrode fingers formed therein, and an encapsulating member disposed on the electrode assembly, wherein the encapsulating member is fabricated from one of a ceramic material or glass.
Abstract:
본 발명은 알루미늄, 동, 황동, 강판, 스테인리스, 마그네슘 합금 등과 같은 금속 소재의 기판과 접착층 및 동박판 회로층 구조로 이루어진 메탈 인쇄회로기판에 있어서, 동박판 회로층에 접하는 금속기판의 면에 세라믹 코팅층 또는 피막층/세라믹 코팅층인 열 계면층(Thermal interface layer)을 형성시킨 것을 특징으로 하는 열 계면층을 갖는 메탈 인쇄회로기판에 관한 것으로, 열 계면층(Thermal interface layer)에 의해 메탈 인쇄회로기판 자체로부터 발산하는 열을 전도받아 외부로 열을 방열하는 방열효과와 내전압성이 우수한 것이 장점이다. 또한 본 발명은 인체에 무해한 세라믹 코팅층 또는 피막층/세라믹 코팅층인 열 계면층을 형성시킴으로써, 방열효과와 내전압성이 우수할 뿐만 아니라, 특히 현재 유럽연합(EU)에서 입법화시켜 시행하고 있는 유해물질 제한지침(RoHS, Restriction of Hazardous Substances Directive)에서 유해한 화합물에 대한 규제대상을 향후 더욱 확대하더라도 대처할 수 있도록 한 친환경적 특성을 갖는 메탈 인쇄회로기판으로 그 수요가 점차 확대될 것으로 기대된다.
Abstract:
A method including forming a ceramic material directly on a sheet of a first conductive material; forming a second conductive material on the ceramic material; and sintering the ceramic material. A method including forming a ceramic material directly on a sheet of a first conductive material; forming a second conductive material on the ceramic material so that the ceramic material is disposed between the first conductive material and the second conductive material; thermal processing at a temperature sufficient to sinter the ceramic material and form a film of the second conductive material; and coating an exposed surface of at least one of the first conduct material and the second conductive material with a different conductive material. An apparatus including first and second electrodes; and a ceramic material between the first electrode and the second electrode, wherein the ceramic material is sintered directly on one of the first and second electrode.
Abstract:
The present invention relates to a method for manufacturing a circuit board including the steps of preparing a substrate containing silicon at least at a surface, applying a paste (4) containing aluminum particles onto the substrate, forming a conductor layer (5) on the substrate by firing the substrate to which the paste (4) has been applied, forming a resist film (6) having a specific pattern on the conductor layer (5), and removing with an etchant, the conductor layer (5) in a portion where the resist film (6) has not been formed, the etchant containing fluoride ions and metal ions of a metal M of which standard electrode potential is higher in value than a standard electrode potential of aluminum, and to a circuit board which can be manufactured with such a method.