FLUID TREATMENT SYSTEM COMPRISING ELONGATE RADIATION SOURCE ASSEMBLIES
    83.
    发明公开
    FLUID TREATMENT SYSTEM COMPRISING ELONGATE RADIATION SOURCE ASSEMBLIES 审中-公开
    FLÜSSIGKEITSBEHANDLUNGSSYSTEMMITLÄNGLICHENSTRAHLUNGSQUELLE-BAUTEILEN

    公开(公告)号:EP3111963A1

    公开(公告)日:2017-01-04

    申请号:EP16180245.9

    申请日:2005-03-14

    Abstract: The present invention relates to a fluid treatment system, more particularly an ultraviolet radiation water treatment system, comprising: an inlet (112); an outlet (124); and a fluid treatment zone (120) disposed between the inlet and the outlet. The fluid treatment zone has disposed therein: (i) a first bank (126) of elongate radiation source assemblies having a first longitudinal axis, and (ii) a second bank (128) of elongate radiation source assemblies having a second longitudinal axis. The first longitudinal axis and the second longitudinal axis are non-parallel to each other and oblique to a direction of fluid flow through the fluid treatment zone. The present fluid treatment system has a number of advantages including: it can treat large volumes of fluid (e.g., wastewater, drinking water or the like); it requires a relatively small "footprint"; it results in a relatively lower coefficient of drag resulting in an improved hydraulic pressure loss/gradient over the length of the fluid treatment system; and it results in relatively lower (or no) forced oscillation of the radiation sources thereby obviating or mitigating of breakage of the radiation source and/or protective sleeve (if present).

    Abstract translation: 本发明涉及一种流体处理系统,更具体地说涉及一种紫外线辐射水处理系统,包括:入口(112); 出口(124); 和设置在入口和出口之间的流体处理区(120)。 流体处理区设置在其中:(i)具有第一纵向轴线的细长辐射源组件的第一堤岸(126)和(ii)具有第二纵向轴线的细长辐射源组件的第二堤岸(128)。 第一纵向轴线和第二纵向轴线彼此不平行并且倾斜于流过流体处理区域的流体流动方向。 本流体处理系统具有许多优点,包括:它可以处理大量流体(例如,废水,饮用水等); 它需要相对较小的“足迹”; 它导致相对较低的阻力系数导致在流体处理系统的长度上改善的液压损失/梯度; 并且其导致辐射源的相对较低(或不)强制振荡,从而消除或减轻辐射源和/或保护套筒(如果存在)的断裂。

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    89.
    发明授权
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 有权
    清洗装置,以投资于流体的处理

    公开(公告)号:EP1210296B1

    公开(公告)日:2005-04-06

    申请号:EP00952819.1

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

Patent Agency Ranking