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公开(公告)号：KR101498947B1
公开(公告)日：2015-03-05
申请号：KR1020120124385
申请日：2012-11-05
Applicant: 한국표준과학연구원
IPC: C23C16/46 , C23C16/44 , H01L21/205
Abstract: 본 발명은 투시형 진공 가열 장치에 관한 것으로, 진공으로 형성되는 내부에 열매체가 충진되고 투명재질로 형성되는 제1 챔버와, 상기 제1 챔버 내측에 이격되게 삽입되고 진공으로 형성되는 내부에 시료가 충진되며 투명재질로 형성되는 제2 챔버 및 상기 제2 챔버를 가리지 않도록 상기 제1 챔버 외측 하부에 설치되고 열매체를 가열하는 히터를 포함함으로써, 내부에서 일어나는 화학기상증착 상태 및 증착 재료의 특성을 육안으로 확인할 수 있고, 열매체를 통해 히터의 열을 시료에 균일하게 전달할 수 있게 하여 화학기상증착이 균일하게 일어나도록 할 수 있는 것이다.
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公开(公告)号：KR101486279B1
公开(公告)日：2015-01-27
申请号：KR1020130056994
申请日：2013-05-21
Applicant: 한국표준과학연구원
CPC classification number: C23C14/243 , C23C14/12 , C23C14/26
Abstract: 본 발명은 증발 증착 장치를 제공한다. 이 증발 증착 장치는 연결통로를 통하여 증발물질을 제공하는 증발부, 복수의 구멍을 포함하고 구멍을 통하여 증발 물질을 진공 용기의 내부에 토출하는 분배부, 진공 용기의 개구부의 주위에 장착되고 진공 용기에서 돌출되도록 배치되고 증발부 및 분배부를 감싸는 유전체부, 증발부 및 분배부를 감싸고 증발부 및 분배부를 유도 가열하는 유도 코일, 및 유도 코일에 교류를 제공하는 교류 전원을 포함한다.
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公开(公告)号：KR101456542B1
公开(公告)日：2014-10-31
申请号：KR1020130051029
申请日：2013-05-07
Applicant: 한국표준과학연구원
IPC: G01N22/00 , H05H1/00 , H01L21/3065 , C23C16/50
CPC classification number: H05H1/0006 , G01N22/00 , H01L21/3065
Abstract: Provided is a microwave plasma diagnosis apparatus which includes a radiation probe radiating a microwave on a plasma after an outer wire and a dielectric layer are removed from a coaxial cable structure; a detection probe detecting the microwave transmitted through the plasma from the radiation probe after an outer wire and a dielectric layer are removed from a coaxial cable structure; an electromagnetic shielding unit surrounding the radiation probe and the detection probe, including an opened portion opened in the axial direction of the radiation probe, and having a mesh structure; and a spectrum analysis unit providing a variable microwave signal to the radiation probe and receiving and analyzing the variable microwave signal transmitted through the plasma from the detection probe.
Abstract translation: 本发明提供一种微波等离子体诊断装置，其包括在从同轴电缆结构除去外线和电介质层之后在等离子体上照射微波的辐射探头; 检测探针，在外线和电介质层从同轴电缆结构中去除之后，检测从辐射探针传输通过等离子体的微波; 围绕所述辐射探头和所述检测探头的电磁屏蔽单元，包括沿所述辐射探头的轴向开放的开口部分，并具有网状结构; 以及频谱分析单元，其向所述辐射探针提供可变微波信号，并且从所述检测探头接收和分析通过所述等离子体传输的可变微波信号。
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公开(公告)号：KR1020140057971A
公开(公告)日：2014-05-14
申请号：KR1020120124385
申请日：2012-11-05
Applicant: 한국표준과학연구원
IPC: C23C16/46 , C23C16/44 , H01L21/205
Abstract: The present invention relates to a transparent vacuum heating device comprising a first chamber having a heating medium filling the vacuous inside and formed of a transparent material; a second chamber inserted into the first chamber to be separated from the first chamber, having a sample filling the vacuous inside, and formed of a transparent material; and a heater installed at the external lower part of the first chamber not to cover the second chamber and heating the heating medium. Therefore, the present invention enables a user to check the state of chemical vapor deposition inside and the characteristics of a deposited material with the naked eye and makes the chemical vapor deposition uniform by making the heat of the heater transmitted uniformly to the sample via the heating medium.
Abstract translation: 透明真空加热装置技术领域本发明涉及一种透明真空加热装置，其特征在于，包括：第一室，其具有填充在所述真空内部并由透明材料形成的加热介质; 插入到所述第一室中以与所述第一室分离的第二室，具有填充所述空泡内部并由透明材料形成的样品; 以及安装在第一室的外部下部的加热器，不覆盖第二室并加热加热介质。 因此，本发明能够使用户能够通过肉眼检查内部的化学气相沉积的状态和沉积材料的特性，并且通过使加热器的热均匀地通过加热器向样品传播而使化学气相沉积均匀 中。
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公开(公告)号：KR101379701B1
公开(公告)日：2014-04-01
申请号：KR1020120136023
申请日：2012-11-28
Applicant: 한국표준과학연구원
IPC: H01L21/3065
CPC classification number: H01L21/31116 , H01J37/32357 , H01J37/32568 , H01L21/02049
Abstract: Provided are a substrate processing device and a substrate processing method. The substrate processing device includes a chamber; an indirect plasma source which is placed at the outside of the chamber and provides the chamber with activated ammonia and activated hydrogen fluoride; and a direct plasma source which provides a substrate in the chamber with ion energy. The direct plasma source includes multiple grounding electrodes arranged in a row in a first direction on a first plane, which is defined as a second direction vertical to the first direction vertically separated from a plane with the substrate; and power electrodes which are arranged in between the grounding electrodes, arranged in a row in the first direction, and generate plasma between neighboring grounding electrodes using power from an RF power source. The activated ammonia and hydrogen fluoride are supplied on the substrate via spaces between the power electrodes and grounding electrodes.
Abstract translation: 提供了基板处理装置和基板处理方法。 基板处理装置包括： 间接等离子体源，其被放置在室的外部，并且向室提供活化的氨和活化的氟化氢; 以及直接等离子体源，其在腔室中提供离子能量的基底。 直接等离子体源包括在第一平面上沿第一方向排成一行的多个接地电极，其被定义为垂直于与基板的平面垂直分离的第一方向的第二方向; 以及布置在接地电极之间的功率电极，其在第一方向上排成一列，并且使用来自RF电源的功率在相邻的接地电极之间产生等离子体。 活性氨和氟化氢通过电源电极和接地电极之间的空间在基板上提供。
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Patent Agency Ranking
公开(公告)号：KR1020140022489A
公开(公告)日：2014-02-25
申请号：KR1020120088126
申请日：2012-08-13
Applicant: 한국표준과학연구원
IPC: C23C16/26 , H01L21/205
Abstract: A graphene transfer method is provided. The graphene transfer method comprises: a step of annealing a grapheme thin film in a levitated state using an electromagnetic levitation method; and a step of transferring by making a substrate be in contact with the granphene thin film in a levitated state.
Abstract translation: 提供石墨烯转移方法。 石墨烯转移方法包括：使用电磁悬浮法使悬浮状态的图形薄膜退火的步骤; 以及通过使基板在悬浮状态下与该颗粒状薄膜接触的转印步骤。
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公开(公告)号：KR101365467B1
公开(公告)日：2014-02-24
申请号：KR1020120042746
申请日：2012-04-24
Applicant: 한국표준과학연구원
Abstract: 본 발명은 박막 증착 장치 및 박막 증착 방법을 제공한다. 이 박막 증착 장치는 진공 챔버, 진공 챔버 내부에 배치된 제1 유도 코일, 제1 유도 코일의 중심 영역에 배치된 부양 물질, 제1 유도 코일에 교류 전력을 제공하여 부양 물질을 부양하고 유도 가열하여 부양 물질을 증발시키는 제1 교류 전원, 제1 유도 코일과 수직으로 이격되어 배치된 제2 유도 코일, 제2 유도 코일의 중심 영역에 배치되고 기판을 포함하는 기판 구조체, 및 제2 유도 코일에 교류 전력을 제공하여 기판 구조체를 유도 가열하는 제2 교류 전원을 포함한다. 부양 물질에서 증발된 증기는 기판에 도달하여 박막을 형성한다.
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公开(公告)号：KR1020140007612A
公开(公告)日：2014-01-20
申请号：KR1020120074726
申请日：2012-07-09
Applicant: 한국표준과학연구원
CPC classification number: C23C14/00 , H01L51/0008 , H01L2924/12044 , Y02B20/36
Abstract: The present invention provides an electromagnetic levitation metal thin film deposition apparatus and a deposition method for an electromagnetic levitation metal thin film. The apparatus includes: a chamber exhausting air so as to prevent the generation of plasma; a dielectric tube mounted around a through hole formed in the chamber; an electromagnetic levitation coil surrounding the dielectric tube; an RF power providing RF electric power to the electromagnetic levitation coil; a substrate holder arranged in the chamber at the location lower than a plane surface on which the dielectric tube is arranged; and a substrate arranged on the substrate holder. The electromagnetic coil includes an upper electromagnetic levitation coil and a lower electromagnetic levitation coil continuously connected with each other. The direction of current flowing in the upper electromagnetic levitation coil and the direction of current flowing in the lower electromagnetic levitation coil are opposite to each other. The electromagnetic levitation coil levitates and heats a metal sample arranged in the dielectric tube using electromagnetic force. The metal sample evaporates and moves in the gravity direction and then forms a metal thin film on a substrate.
Abstract translation: 本发明提供一种用于电磁悬浮金属薄膜的电磁悬浮金属薄膜沉积装置和沉积方法。 该装置包括：排出空气的室，以防止产生等离子体; 安装在形成在所述室中的通孔周围的电介质管; 围绕电介质管的电磁悬浮线圈; 向所述电磁悬浮线圈提供RF电力的RF功率; 衬底保持器，其布置在所述腔室中的低于布置有所述电介质管的平面的位置处; 以及布置在基板保持器上的基板。 电磁线圈包括彼此连续连接的上部电磁悬浮线圈和下部电磁悬浮线圈。 在上部电磁悬浮线圈中流动的电流的方向和在下部电磁悬浮线圈中流动的电流的方向彼此相反。 电磁悬浮线圈使用电磁力悬浮并加热布置在电介质管中的金属样品。 金属样品蒸发并在重力方向移动，然后在基底上形成金属薄膜。
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公开(公告)号：KR1020130119723A
公开(公告)日：2013-11-01
申请号：KR1020120042746
申请日：2012-04-24
Applicant: 한국표준과학연구원
Abstract: The present invention provides a thin film deposition apparatus and a thin film deposition method. The thin film deposition apparatus comprises: a vacuum chamber; a first induction coil which is inside the vacuum chamber; a levitation material which is arranged in the center area of the first induction coil; a first alternating current power source for evaporating the levitation material by inductively heating and levitating the levitation material by providing an alternating current power for the first induction coil; a second induction coil which is arranged by being separated from the first induction coil perpendicularly; a substrate structure, which is arranged in the center area of the second induction coil, and which includes a substrate; and a second alternating current power source for heating the substrate structure by proving an alternating current power for the second induction coil. Vapor, which is evaporated from the levitation material, reaches the substrate, and forms a thin film.
Abstract translation: 本发明提供一种薄膜沉积设备和薄膜沉积方法。 薄膜沉积装置包括：真空室; 位于真空室内的第一感应线圈; 布置在第一感应线圈的中心区域的悬浮材料; 第一交流电源，用于通过为所述第一感应线圈提供交流电力感应加热和悬浮悬浮材料来蒸发悬浮材料; 第二感应线圈，其通过与第一感应线圈垂直地分离布置; 衬底结构，其布置在第二感应线圈的中心区域中，并且包括衬底; 以及第二交流电源，用于通过证明第二感应线圈的交流电力来加热衬底结构。 从悬浮材料蒸发的蒸气到达基板，形成薄膜。
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公开(公告)号：KR101310766B1
公开(公告)日：2013-09-25
申请号：KR1020120028687
申请日：2012-03-21
Applicant: 한국표준과학연구원
IPC: H05H1/00 , H01L21/205 , G01R29/08 , H05H1/46
CPC classification number: H01J37/32935 , H01J37/3211 , H01J37/32174 , H05H1/0018 , H05H1/46 , H05H2001/4667 , H05H2001/4682
Abstract: PURPOSE: A process monitoring method and a processing monitoring apparatus are provided to monitor a thickness of a sheath in real time while minimizing an influence on plasma. CONSTITUTION: A process monitoring apparatus (100) comprises a radiating antenna (112), a receiving antenna (114), a variable frequency generator (124), a penetrated wave processor (126), an assistant measuring unit (142) and a processor (128). The radiating antenna is inserted inside plasma and radiates electromagnetic waves. The receiving antenna is inserted inside plasma and receives the electromagnetic waves passing through the plasma. The variable frequency generator provides scanning frequency to the radiating antenna. The penetrated wave processor is connected to the receiving antenna and extracts a penetration coefficient by treating the penetrated waves passing through the plasma. The assistant measuring unit measures collision frequency. The processor obtains the thickness of sheath by using the collision frequency and transmission coefficient. The processor obtains cut-off angular frequency for the penetration coefficient according to frequency and obtains the thickness of sheath by applying the cut-off frequency and collision frequency to a circuit model which is modeled with plasma and sheath located between the radiating antenna and the receiving antenna. [Reference numerals] (AA) Plasma
Abstract translation: 目的：提供过程监测方法和处理监测装置，以实时监测护套的厚度，同时最小化对等离子体的影响。 构成：过程监控装置（100）包括辐射天线（112），接收天线（114），变频发生器（124），穿透波处理器（126），辅助测量单元（142）和处理器 （128）。 辐射天线插入等离子体内并辐射电磁波。 接收天线插入等离子体内，并接收通过等离子体的电磁波。 可变频发生器向辐射天线提供扫描频率。 穿透波处理器连接到接收天线，并通过处理通过等离子体的穿透波提取穿透系数。 辅助测量单元测量碰撞频率。 处理器通过使用碰撞频率和透射系数获得护套的厚度。 处理器根据频率获得穿透系数的截止角频率，并通过将截止频率和碰撞频率应用于由位于辐射天线和接收器之间的等离子体和护套建模的电路模型获得护套厚度 天线。 （标号）（AA）等离子体
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