公开(公告)号：DE1514588C3

公开(公告)日：1973-11-29

申请号：DE1514588

申请日：1965-09-28

Applicant: SIEMENS AG, 1000 BERLIN U. 8000 MUENCHEN

Inventor： KEMPF, GERHARD, DIPL.-PHYS., 1000 BERLIN

IPC: H01J37/153 ,  H01J3/12

公开(公告)号：FR2177861A1

公开(公告)日：1973-11-09

申请号：FR7310298

申请日：1973-03-22

Applicant: PHILIPS NV

IPC: H01J37/15 ,  G05B19/07 ,  H01J37/141 ,  H01J37/24 ,  H01J37/26 ,  H01J37/302 ,  G05B19/04 ,  H01J3/12

公开(公告)号：CH542632A

公开(公告)日：1973-10-15

申请号：CH1252172

申请日：1972-08-24

Applicant: SIEMENS AG

Inventor： RICCARDO G DIPL-ING BENEDETTI

IPC: G21K1/093 ,  A61N5/10 ,  G21K5/04 ,  H01J33/00 ,  H05H7/00 ,  H01J3/12

公开(公告)号：NL7203932A

公开(公告)日：1973-09-26

申请号：NL7203932

申请日：1972-03-24

IPC: H01J37/15 ,  G05B19/07 ,  H01J37/141 ,  H01J37/24 ,  H01J37/26 ,  H01J37/302 ,  G05B19/04 ,  H01J3/12

公开(公告)号：DE1564357A1

公开(公告)日：1970-01-15

申请号：DE1564357

申请日：1966-10-01

Applicant: MANUF BLEGE DE LAMPES ET DE MA

Inventor： SCHAYES RAYMOND

IPC: G01J1/58 ,  G01T1/115 ,  H01J3/12

公开(公告)号：US09275817B2

公开(公告)日：2016-03-01

申请号：US13849496

申请日：2013-03-23

Applicant: Frederick Wight Martin

Inventor： Frederick Wight Martin

IPC: H01J37/145 ,  H01J3/22 ,  H01J37/141 ,  H01J37/153 ,  H01J3/12

CPC classification number: H01J3/22 ,  H01J3/12 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/31749

Abstract: An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

Abstract translation: 描述了用于探针形成颗粒光学柱的物镜，例如聚焦离子束设备，扫描电子显微镜和氦显微镜。 它包括两个交错（四极/八极）透镜和两个或三个辅助八极透镜，并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面（Cs）和彩色（Cc）像差。 规定包括网格孔径和位置敏感检测器的附加装置，以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

公开(公告)号：US09224577B2

公开(公告)日：2015-12-29

申请号：US13587598

申请日：2012-08-16

Applicant: Patrick Schiavone ,  Thiago Figueiro

Inventor： Patrick Schiavone ,  Thiago Figueiro

IPC: H01J37/31 ,  H01J37/317 ,  H01J3/12 ,  G03F7/20 ,  H01J37/22 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2061 ,  H01J3/12 ,  H01J37/222 ,  H01J2229/563 ,  H01J2237/226 ,  H01J2237/31769

Abstract: A method for projecting an electron beam, used notably in direct or indirect writing lithography and in electronic microscopy. Proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. For this, the convolution of a point spread function with the geometry of the target is conventionally used. At least one of the components of the point spread function has its maximum value not located on the center of the beam. Preferably, the maximum value is instead located on the backward scattering peak. Advantageously, the point spread function uses gamma distribution laws.

Abstract translation: 一种用于投射电子束的方法，特别用于直接或间接写入光刻和电子显微镜。 必须校正通过与靶相互作用的光束的电子的向前和向后散射产生的接近效应。 为此，通常使用点扩散函数与目标几何的卷积。 点扩散函数的至少一个分量的最大值不在波束的中心。 优选地，最大值代替地位于后向散射峰上。 有利地，点扩散函数使用伽马分布规律。

公开(公告)号：US08421039B2

公开(公告)日：2013-04-16

申请号：US13077329

申请日：2011-03-31

Applicant: Edward C. Eisner

Inventor： Edward C. Eisner

IPC: G21K5/10 ,  H01J3/12

CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

Abstract translation: 本发明涉及一种用于在离子束在工件的表面上扫描时改变离子束截面形状的方法和装置，以产生具有改进的离子束电流分布均匀性的时间平均离子束 。 在一个实施例中，离子束的横截面形状随着离子束移动穿过工件表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓（例如，沿着光束轮廓在不同位置处具有峰值），使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓（例如，减小与各个梁轮廓相关联的峰）。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

公开(公告)号：US06956218B1

公开(公告)日：2005-10-18

申请号：US10814919

申请日：2004-03-31

Applicant: David Douglas

Inventor： David Douglas

IPC: H01J3/12 ,  H05H7/00

CPC classification number: H05H7/00

Abstract: A method for controlling the momentum compaction in a beam of charged particles. The method includes a compaction-managed mirror bend achromat (CMMBA) that provides a beamline design that retains the large momentum acceptance of a conventional mirror bend achromat. The CMMBA also provides the ability to tailor the system momentum compaction spectrum as desired for specific applications. The CMMBA enables magnetostatic management of the longitudinal phase space in Energy Recovery Linacs (ERLs) thereby alleviating the need for harmonic linearization of the RF waveform.

Abstract translation: 一种用于控制带电粒子束中的动量压实的方法。 该方法包括压实管理的镜子弯曲消色差（CMMBA），其提供保留常规镜像弯曲消色差的大动量接受的光束线设计。 CMMBA还提供了根据特定应用需要定制系统动量压缩谱的能力。 CMMBA能够对能量回收线性编组（ERL）中的纵向相位空间进行静磁控制，从而减轻对RF波形的谐波线性化的需要。

公开(公告)号：US5637953A

公开(公告)日：1997-06-10

申请号：US589265

申请日：1996-01-22

Applicant: George Wakalopulos

Inventor： George Wakalopulos

IPC: H01J3/12 ,  H01J33/02 ,  H01J29/70 ,  H01J29/58

CPC classification number: H01J3/12 ,  H01J33/02

Abstract: An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens. The electron beam may be projected from the interior of an evacuated tube and may have a length that is not limited by the length of the filament.

Abstract translation: 电子束装置具有产生扇形电子束的阴极。 第一聚焦透镜包括在灯丝的相对侧上的第一和第二板。 最靠近正电荷的阳极的板的边缘是弧形的，使得随着各个电子垂直于带电板的边缘加速，光束随着灯丝的长度而增加。 第二聚焦透镜在第一聚焦透镜的相对侧上包括第三和第四平板。 第三和第四板中的每一个具有靠近带正电的阳极的弧形边缘。 第一和第二聚焦透镜的板在宽度方向上提供聚焦，同时限定长度方向上的增加。 优选地，细丝也是弯曲的。 在优选实施例中，第一聚焦透镜的板的曲率与第二聚焦透镜的平板形成共同的半径。 电子束可以从真空管的内部突出并且可以具有不受长丝长度限制的长度。