Abstract:
PURPOSE: A laser etching apparatus and an aperture forming method using the same are provided to form a gap pattern on a rear passivation layer through a further simplified process using the laser etching technology in stead of photo etching technology in the manufacturing process of thin solar battery of high efficiency. CONSTITUTION: A stage part(160) supports the silicon substrate of solar battery formed with the rear passivation layer. A laser generator(110) generates the laser beam adjusted according to the passivation information. A beam forming unit(130) modifies the size and the shape of a spot of the laser beam according to the size and the shape of the aperture.
Abstract:
PURPOSE: A laser etching apparatus and an aperture forming method using the same are provided to form a gap pattern on a rear passivation layer through a further simplified process using the laser etching technology in stead of photo etching technology in the manufacturing process of thin solar battery of high efficiency. CONSTITUTION: A stage part(160) supports the silicon substrate of solar battery formed with the rear passivation layer. A laser generator(110) generates the laser beam adjusted according to the passivation information. A beam forming unit(130) modifies the size and the shape of a spot of the laser beam according to the size and the shape of the aperture. A projection unit(150) concentrates the laser beam scanned by the scanning unit and irradiates the laser beam.
Abstract:
PURPOSE: A laser etching apparatus and an aperture forming method using the same are provided to form the gap pattern on a rear passivation layer through a process simplified further using the laser etching technology in stead of photo etching technology in the process of manufacturing the thin solar battery of high efficiency. CONSTITUTION: A stage part(160) supports a silicon substrate of solar battery formed with the rear passivation layer. A laser beam generator(110) generates the laser beat adjusted according to the property of the silicon substrate. A bean forming unit(130) modifies the size and the shape of laser beam spot according to the size and the shape of the aperture.
Abstract:
태양전지 제조에 이용되는 레이저 식각장치 및 이를 이용한 공극 형성 방법에 관한 것이다. 본 발명의 일 측면에 따르면, 태양전지 제조 시 후면 패시베이션층에 공극을 형성하기 위한 레이저 식각장치에 있어서, 상기 후면 패시베이션층이 형성된 태양전지의 실리콘 기판을 거치하는 스테이지부와, 실리콘 기판의 특성에 따라 조정된 레이저 빔을 발진하는 레이저 발진부와, 공극의 크기와 모양에 따라 레이저 빔의 스폿의 크기와 모양을 변형하는 빔 형성부와, 하나 이상의 공극이 배열된 공극 패턴에 따라 레이저 빔이 공극의 위치에 조사되도록 스캔하는 스캔부와, 스캔부에 의해 스캔된 레이저 빔을 집광하여 조사하는 투영부를 포함하는 레이저 식각장치에 의하면, 고효율의 박형화된 태양전지를 제조하는 과정에서 사진 식각 기술 대신에 레이저 식각 기술을 이용하여 보다 단순화된 공정을 통해서 후면 패시베이션층에 공극 패턴을 형성� � 수 있다. 태양전지, 레이저, 식각, 패시베이션
Abstract:
PURPOSE: A device using polarized lights for measuring a 3D shape and thickness is provided to simultaneously obtain a surface shape and the thickness information of a target object by using the polarized lights. CONSTITUTION: A device(200) using polarized lights for measuring a 3D shape and thickness comprises a white light source(210), a first beam splitter(220), a linear polarizer(230), a second beam splitter(270), a mirror(280), and a spectroscope(290). The first beam splitter sorts white light incident from the white light source into reference lights and measurement lights, thereby irradiating the same respectively to a reference mirror(240) and a measurement object(260). The first beam splitter interferes in the reference and measurement lights, which are reflected by the reference mirror and measurement object, thereby generating coherent lights. The linear polarizer linear-polarizes the reference lights so that the reference lights have only first polarizing components. [Reference numerals] (AA,BB,DD,) Vertical polarization; (CC,FF) Horizontal polarization; (EE) Shape, thickness;
Abstract:
PURPOSE: A multilayer substrate manufacturing apparatus which simultaneously performing edge deletion and isolation processes and a manufacturing method thereof are provided to reduce tact time of entire processes by integrating isolation and edge deletion processes. CONSTITUTION: A support table(30) supports a multilayer substrate(50) transferred into an apparatus through a transport part(40). A P4 processing unit(10) performs an isolation process with respect to the multilayer substrate loaded on the support table. A P5 processing unit(20) performs an edge deletion process with respect to the multilayer substrate loaded on the support table. The transport part supports the lower part of both edge parts of the multilayer substrate. The transport part comprises a transfer roller(42) and a roller support(44) for supporting the transfer roller.
Abstract:
PURPOSE: A method for repairing a bus line of a liquid crystal panel and a device thereof are provided to precisely repair defects of a gate bus line or a data bus line on a non image area. CONSTITUTION: A laser processing unit(110) irradiates a laser beam wherein the laser beam has a feature which responds to a protective layer. The protective layer is formed on a damaged part of a bus line. The laser processing unit forms a recess area from which the protective layer is removed. A patterning unit(120) coats and hardens conductive ink in the recess area. The patterning unit generates a repair pattern.
Abstract:
여러 층이 적층된 다층기판에 대하여 복수 파장의 레이저빔을 조사하여 가공하는 레이저 가공장치에 있어서, 서로 다른 파장의 레이저빔을 조사하는 복수의 레이저광원과, 일차원 원형 빔 또는 사각형 빔을 조사하여 스테이지에 거치된 다층기판의 일부 층을 1차 가공하고, 1차 가공에 의해 노출된 영역에 일차원 원형 빔 또는 사각형 빔보다 작거나 큰 단면적을 가지는 레이저 빔을 조사하여 다층기판의 동일 지점에 대하여 나머지 층 전부 혹은 일부를 2차 가공하는 빔 조사부를 포함하는 레이저 가공장치가 제공된다. 이에 의하면, 다층기판 가공 중에 사용되는 서로 다른 파장을 가지는 복수의 레이저빔을 동축으로 입사시키는 구조를 가지며, 2회 이상의 반복동작이 요구되던 레이저 가공 과정을 1회로 단순화함으로써 가공시간을 단축시키는 것이 가능하다.
Abstract:
PURPOSE: A device for measuring a 3D shape and thickness is provided to improve anti-vibration properties when measuring the 3D shape or thickness as errors caused by mechanical movement are reduced. CONSTITUTION: A device(200) for measuring a 3D shape and thickness comprises a white light source(210), a wavelength variable device(220), a first beam splitter(230), a linear polarizer(240), a second beam splitter(280), first and second image acquisition units(290), and a data processing unit. The white light source emits white lights. The wavelength variable device splits the white light incident from the white light source into a plurality of short wavelength lights, and the short wavelength lights are successively emitted per each wavelength. The first beam splitter separates the short wavelength lights into reference lights and measurement light, irradiates the light to a reference mirror(250) and a measurement object(270), and interferes the reference lights and measurement light reflected by the reference mirror and the measurement object, thereby generating coherent lights.
Abstract:
PURPOSE: A multilayer substrate processing apparatus which uses a laser beam with a plurality of wavelengths and a multilayer substrate processing method are provided to convert a processing direction without the rotation of a laser processing part using a wavelength plate and a polarization optical system. CONSTITUTION: A transfer table(20) supports a loaded multilayer substrate. The transfer table is able to reciprocate along a first driving axis. A laser processing part(40) changes a polarization property of one laser beam among a plurality of laser beams according to the rotation of a wavelength plate. The laser processing part processes the multilayer substrate along an aligned processing axis. A gantry unit(30) reciprocates the laser processing part along a second driving axis.