公开(公告)号：JP4392204B2

公开(公告)日：2009-12-24

申请号：JP2003208905

申请日：2003-08-26

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03B8/04 ,  C03C4/08 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/04

公开(公告)号：JP4458963B2

公开(公告)日：2010-04-28

申请号：JP2004201253

申请日：2004-07-08

Applicant: 東ソ−・エスジ−エム株式会社

Inventor： 秀春 堀越

IPC: C03B8/00 ,  C03B8/02 ,  C03B20/00

CPC classification number: C03B19/12 ,  C03B32/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for efficiently producing doped silica glass in which a dopant element exists uniformly and which has excellent uniformity. SOLUTION: The doped silica glass is produced by vitrifying a silica glass precursor, obtained by incorporating the dopant element into silica, by heating it by the irradiation with electromagnetic waves. The doped silica glass contains no aggregated particle of the dopant element, having a particle diameter of ≥1 μm. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP4213413B2

公开(公告)日：2009-01-21

申请号：JP2002186599

申请日：2002-06-26

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06 ,  G03F1/60 ,  H01L21/027

CPC classification number: C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  Y02P40/57

Abstract: PROBLEM TO BE SOLVED: To provide a low cost synthetic quartz glass for vacuum ultraviolet light which has excellent homogeneity and is manufactured using existing general equipment without carrying out excessive and needless modification of a quartz glass synthesized by the soot method (VAD method) using a glass forming raw material such as SiCl 4 and a manufacturing method of the same and a mask substrate for vacuum ultraviolet light using the same. SOLUTION: The synthetic quartz glass for vacuum ultraviolet light has ≥70% transmissivity per 10 mm thickness in 163 mm wave length, the difference (refractive index distribution) of ≤5×10 -6 per 10 mm thickness between the maximum refractive index and the minimum refractive index in a region of 200 mm diameter and ≤5 nm/cm birefringence. The manufacturing method of the same and the mask substrate for vacuum ultraviolet light using the same are provided. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP4470054B2

公开(公告)日：2010-06-02

申请号：JP2003208904

申请日：2003-08-26

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03B8/04 ,  C03C4/08 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06

CPC classification number: C03B19/1461 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57

公开(公告)号：JP4166456B2

公开(公告)日：2008-10-15

申请号：JP2001308420

申请日：2001-10-04

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03C4/08 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G02B1/00 ,  G03F1/60

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2207/36 ,  Y02P40/57

Abstract: PROBLEM TO BE SOLVED: To provide synthetic quartz glass for vacuum UV light which has excellent durability to irradiation with vacuum UV light, a method for manufacturing the same, and a mask substrate for the vacuum UV light using the same. SOLUTION: The synthetic quartz glass for the vacuum UV light characterized in that the internal transmittance to the vacuum UV light of a wavelength 157 nm is >=50% per 1 cm and the ratio of lowering of the internal transmittance is shots of the vacuum UV light of the wavelength 157 nm at an energy density of 0.1 mJ/cm , and the method for manufacturing the same and the mask substrate for the vacuum UV light using the same are used.

公开(公告)号：JP5646292B2

公开(公告)日：2014-12-24

申请号：JP2010254649

申请日：2010-11-15

Applicant: 東ソ−・エスジ−エム株式会社

Inventor： 英昭 岡田 ,  英昭 岡田 ,  堀越　秀春 ,  秀春 堀越

IPC: C03B11/00 ,  C03B20/00

CPC classification number: C03B19/1469

公开(公告)号：JP5529369B2

公开(公告)日：2014-06-25

申请号：JP2007235031

申请日：2007-09-11

Applicant: 東ソー株式会社 ,  東ソ−・エスジ−エム株式会社

Inventor： 一喜 新井 ,  努 高畑 ,  眞吉 橋本 ,  雅人 内田 ,  修輔 山田 ,  美徳 原田 ,  秀春 堀越

IPC: C03B20/00

CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

公开(公告)号：JP4213412B2

公开(公告)日：2009-01-21

申请号：JP2002186598

申请日：2002-06-26

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60 ,  H01L21/027

CPC classification number: C03C3/06 ,  C03C2201/08 ,  C03C2201/23

公开(公告)号：JP4093393B2

公开(公告)日：2008-06-04

申请号：JP2001308421

申请日：2001-10-04

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03C4/08 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G02B1/00 ,  G03F1/60 ,  H01L21/027

CPC classification number: C03C3/06 ,  C03C4/085

Abstract: PROBLEM TO BE SOLVED: To provide synthetic quartz glass for vacuum UV light which has excellent homogeneity to irradiation with vacuum UV light and is excellent in the durability to the irradiation with the vacuum UV light, a method for manufacturing the same and a mask substrate for the vacuum UV light using the same. SOLUTION: The highly homogeneous synthetic quartz glass for the vacuum UV light characterized in that the internal transmittance to the vacuum UV light of a wavelength 157 nm is >=60% per 1 cm; the difference between the maximum refractive index and minimum refractive index in a region of 200 mm diameter is per 1 cm; a birefringence quantity is shots of the vacuum UV light of the wavelength 157 nm at an energy density of 10 mJ/cm is and the change in the birefringence quantity is