公开(公告)号：KR1020090030231A

公开(公告)日：2009-03-24

申请号：KR1020080091448

申请日：2008-09-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이께다후미히꼬 ,  나가따히로시

IPC: H01L21/02

Abstract: A normal pressure drying device is provided to form an appropriate solidified layer on the surface of a liquid film without a decompression drying method. A coating and developing processing system(10) are installed within a clean room, a processing station(P/S)(16) is arranged transversely at the central part of coating and developing processing system. A cassette station(C/S)(14) and an interface station(I/F)(18) are arranged both end part of the cassette station in the longitudinal direction. The cassette station includes a cassette stage(20) and a delivering apparatus(22). A delivering apparatus has a transfer arm(22a) supporting a substrate(G) by one unit. An import unit(IN PASS)(24), a cleaning processing unit(26), a first thermal processor(28), a coating process part(30) and the second thermal processor(32) are arranged in a row to an upstream along the first horizontal processing bath.

Abstract translation: 提供常压干燥装置以在液膜的表面上形成适当的固化层而无需减压干燥方法。 涂料和显影处理系统（10）安装在洁净室内，处理站（P / S）（16）横向布置在涂层和显影处理系统的中心部分。 磁带站（C / S）（14）和接口站（I / F）（18）沿长度方向布置在磁带站的两个端部。 盒式录像带包括盒级（20）和传送装置（22）。 输送装置具有通过一个单元支撑基板（G）的转移臂（22a）。 导入单元（IN PASS）（24），清洁处理单元（26），第一热处理器（28），涂覆处理部分（30）和第二热处理器（32） 沿着第一个卧式加工浴。

公开(公告)号：KR1020090031271A

公开(公告)日：2009-03-25

申请号：KR1020080091858

申请日：2008-09-19

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이께다후미히꼬 ,  나가따히로시

IPC: G03F7/38 ,  G02F1/13 ,  H01L21/027 ,  H01L21/68

CPC classification number: H01L21/67034

Abstract: A normal pressure drying device is provided to improve the quality of or a coating film and to prevent the generation of uneven drying, by forming an appropriate solidified layer on the surface of a liquid film by not using a Vacuum drying method. A normal pressure drying device comprises a horizontal progress return part of a substrate coated with the processing liquid including solvent; and a drying part which dries with cooling the coating film of the processing liquid on the substrate under the atmosphere of room temperature or more higher temperature, to the temperature lower than the room temperature. A substrate processing apparatus includes an atmospheric drying apparatus(46), a coating unit and a baking unit(48).

Abstract translation: 通过不使用真空干燥法在液膜的表面形成适当的固化层，提供常压干燥装置，以提高涂膜的质量或防止产生不均匀干燥。 常压干燥装置包括涂覆有包括溶剂的处理液的基材的水平进退返回部分; 以及在室温或更高温度的气氛下将基板上的处理液的涂膜冷却至低于室温的干燥部的干燥部。 基板处理装置包括大气干燥装置（46），涂布单元和烘焙单元（48）。

公开(公告)号：KR1020080032608A

公开(公告)日：2008-04-15

申请号：KR1020070101298

申请日：2007-10-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  나가따히로시 ,  시미즈다까요시 ,  우에다에이이찌 ,  기요나리다께히로 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  B05B1/005 ,  H01L21/67028 ,  H01L21/67248 ,  H01L21/68742

Abstract: A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.

Abstract translation: 提供了一种显影处理方法和显影处理装置，用于当恢复装置的显影过程时，通过将温度控制溶液喷射到至少一个辊来保持辊的温度低于环境温度，以减少辊的温度变化， 在该装置的连续显影处理被恢复之前。 一种显影处理方法，其中以这样的方式进行显影处理，即在暴露于光之后的目标基板在预定的时间间隔一个接一个地显现在包括多个辊（190）的传送通道（120）上 ），其特征在于，传送通道中的至少一个辊子由温度控制溶液持续或间歇地预定的时间间隔喷射，使辊保持其温度低于 在一组基板恢复连续显影处理之前的环境温度。