公开(公告)号：KR1020100131374A

公开(公告)日：2010-12-15

申请号：KR1020100052694

申请日：2010-06-04

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 와까모또유끼히로 ,  다시로게이 ,  우에다에이이찌

IPC: H01L21/027 ,  B05C5/02

CPC classification number: H01L21/0274 ,  B05C5/0204 ,  B05C5/0208 ,  G03F7/2041

Abstract: PURPOSE: A priming processing method and a priming processing device for forming the film of a processing solution are provided to prevent particle while reducing washing solution by operating a cleaning apparatus and a drying unit to wash/dry over the outer circumference of a priming roller. CONSTITUTION: The top of a priming roller(14) is parallel with the injection part of a slit nozzle(72) while having a certain gap between them. A certain amount of resist is discharged on the slit nozzle through a resist supply unit. The film of a coating solution on the outer circumference of a priming roller is dried to form a first dry film. A part of discharged coating solution is wound on the outer circumference of the priming roller. The film of the solution or the dry film which is attached on the outer circumference of the priming roller is removed through washing.

Abstract translation: 目的：提供一种用于形成处理溶液膜的起动处理方法和起动处理装置，以通过操作清洁装置和干燥单元来清洗/干燥在起动辊的外圆周上来减少洗涤液的颗粒。 构成：起动辊（14）的顶部与狭缝喷嘴（72）的注射部分平行，同时在它们之间具有一定的间隙。 一定量的抗蚀剂通过抗蚀剂供给单元在狭缝喷嘴上排出。 将底漆辊的外周上的涂布溶液的膜干燥以形成第一干膜。 排出的涂布溶液的一部分缠绕在起动辊的外周。 通过洗涤除去附着在起动辊的外周上的溶液或干膜。

公开(公告)号：KR1020080032608A

公开(公告)日：2008-04-15

申请号：KR1020070101298

申请日：2007-10-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  나가따히로시 ,  시미즈다까요시 ,  우에다에이이찌 ,  기요나리다께히로 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  B05B1/005 ,  H01L21/67028 ,  H01L21/67248 ,  H01L21/68742

Abstract: A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.

Abstract translation: 提供了一种显影处理方法和显影处理装置，用于当恢复装置的显影过程时，通过将温度控制溶液喷射到至少一个辊来保持辊的温度低于环境温度，以减少辊的温度变化， 在该装置的连续显影处理被恢复之前。 一种显影处理方法，其中以这样的方式进行显影处理，即在暴露于光之后的目标基板在预定的时间间隔一个接一个地显现在包括多个辊（190）的传送通道（120）上 ），其特征在于，传送通道中的至少一个辊子由温度控制溶液持续或间歇地预定的时间间隔喷射，使辊保持其温度低于 在一组基板恢复连续显影处理之前的环境温度。

公开(公告)号：KR101518522B1

公开(公告)日：2015-05-07

申请号：KR1020100052694

申请日：2010-06-04

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 와까모또유끼히로 ,  다시로게이 ,  우에다에이이찌

IPC: H01L21/027 ,  B05C5/02

Abstract: 본 발명의 과제는 프라이밍 처리의 신뢰성을 보장하면서 세정액의 사용량을 한층 삭감하는 것이다.
슬릿 노즐(72)의 토출구를 프라이밍 롤러(14)의 정상부에 대해 평행하게 대향시키고, 프라이밍 롤러(14)를 정지시킨 채로, 슬릿 노즐(72)에 일정량의 레지스트액(R)을 토출시킨다. 다음에, 프라이밍 롤러(14)의 회전을 개시하여, 프라이밍 롤러(14)의 외주면 상에 레지스트액(R)을 권취한다. 계속해서, 프라이밍 롤러(14)의 회전 속도를 한번에 올려, 슬릿 노즐(72)측과 프라이밍 롤러(14)측으로 나뉘도록 레지스트액(R)의 액막을 분리하고, 분리한 후에도 프라이밍 롤러(14)의 회전을 그대로 계속시켜, 레지스트 액막(RM
1 )을 자연 건조시킨다.

Abstract translation: 本发明的目的在于进一步减少所使用的清洁液的量，同时确保起动加工的可靠性。