公开(公告)号：KR1020080032608A

公开(公告)日：2008-04-15

申请号：KR1020070101298

申请日：2007-10-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  나가따히로시 ,  시미즈다까요시 ,  우에다에이이찌 ,  기요나리다께히로 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  B05B1/005 ,  H01L21/67028 ,  H01L21/67248 ,  H01L21/68742

Abstract: A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.

Abstract translation: 提供了一种显影处理方法和显影处理装置，用于当恢复装置的显影过程时，通过将温度控制溶液喷射到至少一个辊来保持辊的温度低于环境温度，以减少辊的温度变化， 在该装置的连续显影处理被恢复之前。 一种显影处理方法，其中以这样的方式进行显影处理，即在暴露于光之后的目标基板在预定的时间间隔一个接一个地显现在包括多个辊（190）的传送通道（120）上 ），其特征在于，传送通道中的至少一个辊子由温度控制溶液持续或间歇地预定的时间间隔喷射，使辊保持其温度低于 在一组基板恢复连续显影处理之前的环境温度。