公开(公告)号：KR1020110025121A

公开(公告)日：2011-03-09

申请号：KR1020100084777

申请日：2010-08-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야히로슌이찌 ,  사다데쯔야 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/2041 ,  G03F7/70975

Abstract: PURPOSE: A developing device and a developing method are provided to reduce non-uniformity in a developing process by setting a transfer speed of a substrate with a discharge timing of developers from a second development nozzle. CONSTITUTION: A first development nozzle coats developers from the front to the rear of a substrate transferred on a transfer path. A substrate information obtaining unit(20) obtains information about a substrate process. A second development nozzle(13) moves along the transfer path of the lower side of the first development nozzle. A nozzle moving unit moves the second development nozzle. A control unit(25) controls the driving of the nozzle moving unit and the second development nozzle.

Abstract translation: 目的：提供显影装置和显影方法，以通过从第二显影喷嘴设置显影剂的排出时间来设置基板的转印速度来减少显影过程中的不均匀性。 构成：第一个开发喷嘴将显影剂从传输路径上转移的基板的前面到后面涂覆。 基板信息获取单元（20）获得关于基板处理的信息。 第二显影喷嘴（13）沿着第一显影喷嘴的下侧的传送路径移动。 喷嘴移动单元移动第二显影喷嘴。 控制单元（25）控制喷嘴移动单元和第二显影喷嘴的驱动。

公开(公告)号：KR1020080032608A

公开(公告)日：2008-04-15

申请号：KR1020070101298

申请日：2007-10-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  나가따히로시 ,  시미즈다까요시 ,  우에다에이이찌 ,  기요나리다께히로 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  B05B1/005 ,  H01L21/67028 ,  H01L21/67248 ,  H01L21/68742

Abstract: A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.

Abstract translation: 提供了一种显影处理方法和显影处理装置，用于当恢复装置的显影过程时，通过将温度控制溶液喷射到至少一个辊来保持辊的温度低于环境温度，以减少辊的温度变化， 在该装置的连续显影处理被恢复之前。 一种显影处理方法，其中以这样的方式进行显影处理，即在暴露于光之后的目标基板在预定的时间间隔一个接一个地显现在包括多个辊（190）的传送通道（120）上 ），其特征在于，传送通道中的至少一个辊子由温度控制溶液持续或间歇地预定的时间间隔喷射，使辊保持其温度低于 在一组基板恢复连续显影处理之前的环境温度。