온도 계측 장치, 기판 처리 장치 및 온도 계측 방법
    2.
    发明公开
    온도 계측 장치, 기판 처리 장치 및 온도 계측 방법 无效
    温度测量装置,基板加工装置和温度测量方法

    公开(公告)号:KR1020130007447A

    公开(公告)日:2013-01-18

    申请号:KR1020120067059

    申请日:2012-06-22

    CPC classification number: G01J5/0007 G01J2005/583

    Abstract: PURPOSE: A temperature measuring device, a substrate processing device, and a temperature measuring method are provided to properly measure the temperature of a measurement object by using optical interference. CONSTITUTION: A temperature measuring device(1) measures the temperature of a measurement object having a first major surface and a second major surface. The temperature measuring device comprises a data input member(16), a peak interval calculating member(17), an optical path length calculating member(20), and a temperature calculating member(21). The peak interval calculating member calculates a peak interval of spectrum. The optical path length calculating member calculates the length of an optical path from the first major surface to the second major surface on a basis of the peak interval. The temperature calculating member calculates the temperature of the measurement object on a basis of the length of the optical path. [Reference numerals] (1) Temperature measuring device; (141) Light dispersion device; (142) Light receiving unit; (16) Data input member; (17) Peak interval calculating member; (18) Peak frequency detecting member; (19) Frequency difference calculating member; (20) Optical path length calculating member; (21) Temperature calculating member; (22) Temperature correcting member

    Abstract translation: 目的:提供温度测量装置,基板处理装置和温度测量方法,以通过使用光学干涉来适当地测量测量对象的温度。 构成:温度测量装置(1)测量具有第一主表面和第二主表面的测量对象的温度。 温度测量装置包括数据输入部件(16),峰值间隔计算部件(17),光程长度计算部件(20)和温度计算部件(21)。 峰值间隔计算部件计算频谱的峰值间隔。 光路长度计算部件基于峰值间隔计算从第一主表面到第二主表面的光路的长度。 温度计算部件基于光路的长度计算测量对象的温度。 (附图标记)(1)温度测量装置; (141)光分散装置; (142)光接收单元; (16)数据输入成员; (17)峰值间隔计算部件; (18)峰值频率检测部件; (19)频率差计算部件; (20)光路长度计算部件; (21)温度计算部件; (22)温度校正部件

    플라즈마 처리 장치의 상부 전극 구조, 플라즈마 처리 장치 및 플라즈마 처리 장치의 운용 방법
    3.
    发明公开
    플라즈마 처리 장치의 상부 전극 구조, 플라즈마 처리 장치 및 플라즈마 처리 장치의 운용 방법 审中-实审
    用于等离子体处理装置的上电极结构等离子体处理装置和用于等离子体处理装置的操作方法

    公开(公告)号:KR1020170004964A

    公开(公告)日:2017-01-11

    申请号:KR1020167028274

    申请日:2015-04-28

    Abstract: 상부전극구조는제 1 플레이트, 제 2 플레이트및 정전흡착부를구비한다. 제 1 플레이트는동심형상으로마련된제 1 영역, 제 2 영역및 제 3 영역을가지고, 이들영역의각각에는복수의가스토출구가형성되어있다. 정전흡착부는제 1 플레이트와제 2 플레이트의사이에개재되어, 제 1 플레이트를흡착한다. 정전흡착부는제 1 ~ 제 3 영역용의제 1 ~ 제 3 히터를가진다. 정전흡착부와제 2 플레이트는제 1 ~ 제 3 영역으로가스를공급하는제 1 공급경로, 제 2 공급경로및 제 3 공급경로를제공한다. 정전흡착부에는제 1 가스확산실, 제 2 가스확산실및 제 3 가스확산실이형성되어있다.

    Abstract translation: 上电极结构包括第一板,第二板和静电吸引单元。 第一板具有同心配置的第一区域,第二区域和第三区域。 每个区域设置有多个气体排出口。 静电吸引单元设置在第一板和第二板之间,并且被配置为吸引第一板。 静电吸引单元配备有用于第一至第三区域的第一至第三加热器。 静电吸引单元和第二板提供分别向第一至第三区域供应气体的第一供应路径,第二供应路径和第三供应路径。 在静电吸引单元中形成第一气体扩散空间,第二气体扩散空间和第三气体扩散空间。

    온도 계측 시스템, 기판 처리 장치 및 온도 계측 방법
    4.
    发明公开
    온도 계측 시스템, 기판 처리 장치 및 온도 계측 방법 审中-实审
    温度测量系统,基板加工设备和温度测量方法

    公开(公告)号:KR1020130007451A

    公开(公告)日:2013-01-18

    申请号:KR1020120067411

    申请日:2012-06-22

    Abstract: PURPOSE: A temperature measuring system, a substrate processing device, and a temperature measuring method are provided to properly measure temperature by using optical interference. CONSTITUTION: A temperature measuring system(1) comprises a light source(10), a spectroscope(14), light transmitting tools(11,12), an optical path length calculating unit, and a temperature calculating unit. The light source has frequencies penetrating a measurement object. The spectroscope measures intensity dispersion caused by the frequencies and wavelengths. The light transmitting tools are connected to the light source and spectroscope, projects measurement lights to a first major surface of the measurement object, and simultaneously projects reflected lights from the first major surface and a second major surface to the spectroscope. The optical path length calculating unit performs a Fourier-transform interference intensity dispersion, which is the intensity dispersion of the reflected lights from the first and second major surfaces, thereby calculating the length of the optical path. The temperature calculating unit calculates the temperature of the measurement object on a basis of a relation of the length of the optical path calculated by the optical path length calculating unit, the length of the optical path and the temperature of the measurement object. [Reference numerals] (10) Light source; (14) Spectroscope

    Abstract translation: 目的:提供温度测量系统,基板处理装置和温度测量方法,以通过使用光学干涉来适当地测量温度。 构成:温度测量系统(1)包括光源(10),分光镜(14),光传输工具(11,12),光路长度计算单元和温度计算单元。 光源具有穿透测量对象的频率。 分光仪测量由频率和波长引起的强度色散。 光传输工具连接到光源和分光镜,将测量光投射到测量对象的第一主表面,同时将来自第一主表面的反射光和第二主表面投影到分光镜。 光路长度计算单元执行作为来自第一和第二主表面的反射光的强度色散的傅里叶变换干涉强度色散,由此计算光路的长度。 温度计算单元基于由光程长度计算单元计算的光路的长度,光路的长度和测量对象的温度之间的关系来计算测量对象的温度。 (附图标记)(10)光源; (14)分光镜

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