公开(公告)号：KR101552364B1

公开(公告)日：2015-09-10

申请号：KR1020100094884

申请日：2010-09-30

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 와까모또유끼히로 ,  다께꾸마다까시 ,  곤도오다이스께

IPC: B05D1/26 ,  H01L21/027 ,  G03F7/26

Abstract: 본발명의과제는프라이밍처리의신뢰성을보장하면서세정액의사용량을한층삭감하는것이다. 슬릿노즐(72)의토출구를프라이밍롤러(14)의정상부에대해평행하게대향시켜, 슬릿노즐(72)에일정량의레지스트액(R)을토출시켜, 그대로소정시간방치한다. 다음에, 프라이밍롤러(14)의회전을개시하여, 프라이밍롤러(14)의외주면상에레지스트액(R)을권취한다. 계속해서, 프라이밍롤러(14)의회전속도를한번에올려, 슬릿노즐(72)측과프라이밍롤러(14)측으로나뉘도록레지스트액(R)의액막을분리하고, 분리한후에도프라이밍롤러(14)의회전을그대로계속시켜, 프라이밍롤러(14) 상의레지스트액막(RM)을소정의대기용회전각위치에오게한다.

公开(公告)号：KR1020110044141A

公开(公告)日：2011-04-28

申请号：KR1020100094884

申请日：2010-09-30

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 와까모또유끼히로 ,  다께꾸마다까시 ,  곤도오다이스께

IPC: B05D1/26 ,  H01L21/027 ,  G03F7/26

CPC classification number: B05D1/265 ,  G03F7/16 ,  G03F7/2041 ,  G03F7/265 ,  G03F7/70341 ,  H01L21/0274

Abstract: PURPOSE: A priming method and a priming apparatus are provided to improve the reliability of a priming process by preventing the sagging phenomenon a coating liquid film on a priming roller. CONSTITUTION: Coating liquid(R) is discharged to a lit nozzle(72). A priming roller(14) is stopped and is maintained. The priming roller is rotated to wind a part of the coating liquid on the priming roller as a first coating liquid film. The first coating liquid film is reached to a first stand-by rotation angle, and the rotation of the priming roller is stopped. The first coating liquid film is naturally dried. The first coating liquid film is eliminated by a cleaning process.

Abstract translation: 目的：提供起动方法和起动装置，以通过防止起动辊上的涂覆液膜的下垂现象来提高起动过程的可靠性。 构成：将涂布液（R）排放到点燃的喷嘴（72）。 起动辊（14）停止并保持。 使起动辊旋转以将涂布液的一部分卷绕在起动辊上作为第一涂布液膜。 第一涂布液膜达到第一待机旋转角度，停止启动辊的旋转。 第一涂布液膜自然干燥。 通过清洗处理消除第一涂布液膜。

公开(公告)号：KR1020070093343A

公开(公告)日：2007-09-18

申请号：KR1020070023805

申请日：2007-03-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 다께꾸마다까시

IPC: H01L21/027 ,  B65G49/06 ,  G02F1/13 ,  G03F7/30

CPC classification number: H01L21/683 ,  B65G49/063 ,  G02F1/1303 ,  G03F7/3021

Abstract: A substrate processing apparatus, a substrate processing method, and a computer readable storage medium are provided to suppress a dropping effect of treatment solution from a substrate by absorbing and collecting efficiently the treatment solution. A substrate processing unit processes a substrate(G) by using a treatment solution. A transferring path(5) transfers the substrate while a processing target surface of the substrate is directed upwardly. A treatment solution supply unit(67) supplies the treatment solution onto the substrate. A treatment solution absorbing unit(65) absorbs the treatment solution from the substrate to be transferred through the transferring path. A chasm-shaped bend part is used for changing a tilt angle of a transferring direction in order to bend the substrate in the transferring path. The treatment solution supply unit supplies the treatment solution at a position higher than a position of the chasm-shaped bend part. The treatment solution absorbing unit absorbs the treatment solution at the position of the chasm-shaped bend part or a peripheral position of the chasm-shaped bend part.

Abstract translation: 提供了基板处理装置，基板处理方法和计算机可读取存储介质，以通过有效地吸收和收集处理溶液来抑制处理溶液从基板的滴落效应。 基板处理单元通过使用处理液处理基板（G）。 传送路径（5）在衬底的处理目标表面向上指向的同时传送衬底。 处理溶液供给单元（67）将处理溶液供给到基板上。 处理溶液吸收单元（65）从所述基板吸收待通过传送路径传送的处理溶液。 用于改变传送方向的倾斜角度的曲折形弯曲部分，以便在传送路径中弯曲基板。 处理溶液供应单元将处理溶液提供在高于裂缝形弯曲部位置的位置处。 处理溶液吸收单元在裂缝形弯曲部分的位置或者裂缝形弯曲部分的周边位置处吸收处理溶液。

公开(公告)号：KR101269758B1

公开(公告)日：2013-05-30

申请号：KR1020070023805

申请日：2007-03-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 다께꾸마다까시

IPC: H01L21/027 ,  B65G49/06 ,  G02F1/13 ,  G03F7/30

Abstract: 현상유닛(30)은, 기판(G)을, 그피처리면이상방을향한상태에서반송하는반송로(5)와, 반송로(5)를반송되는기판(G) 상에현상액을공급하는현상액공급기구와, 반송로(5)를반송되는기판(G) 상의현상액을흡인하는현상액흡인기구(65)를구비하고, 반송로(5)는통과시의기판(G)이곡측으로만곡또는굴곡하도록반송방향의경사각도를변경시키는골형굴곡부(P1)를갖고있고, 현상액공급기구는골형굴곡부(P1)보다도반송방향상류측에서현상액을공급하고, 현상액흡인기구(65)는골형굴곡부(P1) 위치또는골형굴곡부(P1) 근방위치에서현상액을흡인한다.

公开(公告)号：KR1020080077329A

公开(公告)日：2008-08-22

申请号：KR1020080014291

申请日：2008-02-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 다께꾸마다까시 ,  데라다다까시

IPC: H01L21/027

CPC classification number: H01L21/67115

Abstract: A substrate processing apparatus is provided to process evenly temperature distribution of substrates by removing reflective heats generated from a plate which is implemented at a higher portion of substrate carrying rollers. A substrate processing apparatus includes substrate carrying rollers(32), a ceiling unit(17), infrared lamps(1), and a light guide plate(4). The substrate carrying rollers carry substrates(G) to a horizontal direction. The ceiling unit is implemented in parallel with the substrate carrying rollers. The infrared lamps heat the substrates by radiating heats toward a bottom of the substrates. The light guide plate guides constantly direction of the heats radiated from the infrared lamps. The heats generated from the infrared lamps are radiated on the substrates by inducing vertically through the light guide plate.

Abstract translation: 提供了一种基板处理装置，用于通过去除由在基板承载辊的较高部分处实现的板产生的反射热来均匀地温度分布基板。 基板处理装置包括基板承载辊（32），天花板单元（17），红外灯（1）和导光板（4）。 基板承载辊将基板（G）沿水平方向承载。 天花板单元与基板承载辊平行地实现。 红外线灯通过向基板的底部辐射热量来加热基板。 导光板不断引导从红外灯辐射的热量的方向。 由红外线灯产生的热量通过导光板垂直地照射在基板上。