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公开(公告)号：KR1020100131374A
公开(公告)日：2010-12-15
申请号：KR1020100052694
申请日：2010-06-04
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , B05C5/02
CPC classification number: H01L21/0274 , B05C5/0204 , B05C5/0208 , G03F7/2041
Abstract: PURPOSE: A priming processing method and a priming processing device for forming the film of a processing solution are provided to prevent particle while reducing washing solution by operating a cleaning apparatus and a drying unit to wash/dry over the outer circumference of a priming roller. CONSTITUTION: The top of a priming roller(14) is parallel with the injection part of a slit nozzle(72) while having a certain gap between them. A certain amount of resist is discharged on the slit nozzle through a resist supply unit. The film of a coating solution on the outer circumference of a priming roller is dried to form a first dry film. A part of discharged coating solution is wound on the outer circumference of the priming roller. The film of the solution or the dry film which is attached on the outer circumference of the priming roller is removed through washing.
Abstract translation: 目的：提供一种用于形成处理溶液膜的起动处理方法和起动处理装置，以通过操作清洁装置和干燥单元来清洗/干燥在起动辊的外圆周上来减少洗涤液的颗粒。 构成：起动辊（14）的顶部与狭缝喷嘴（72）的注射部分平行，同时在它们之间具有一定的间隙。 一定量的抗蚀剂通过抗蚀剂供给单元在狭缝喷嘴上排出。 将底漆辊的外周上的涂布溶液的膜干燥以形成第一干膜。 排出的涂布溶液的一部分缠绕在起动辊的外周。 通过洗涤除去附着在起动辊的外周上的溶液或干膜。
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公开(公告)号：KR1020110044141A
公开(公告)日：2011-04-28
申请号：KR1020100094884
申请日：2010-09-30
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B05D1/26 , H01L21/027 , G03F7/26
CPC classification number: B05D1/265 , G03F7/16 , G03F7/2041 , G03F7/265 , G03F7/70341 , H01L21/0274
Abstract: PURPOSE: A priming method and a priming apparatus are provided to improve the reliability of a priming process by preventing the sagging phenomenon a coating liquid film on a priming roller. CONSTITUTION: Coating liquid(R) is discharged to a lit nozzle(72). A priming roller(14) is stopped and is maintained. The priming roller is rotated to wind a part of the coating liquid on the priming roller as a first coating liquid film. The first coating liquid film is reached to a first stand-by rotation angle, and the rotation of the priming roller is stopped. The first coating liquid film is naturally dried. The first coating liquid film is eliminated by a cleaning process.
Abstract translation: 目的：提供起动方法和起动装置，以通过防止起动辊上的涂覆液膜的下垂现象来提高起动过程的可靠性。 构成：将涂布液（R）排放到点燃的喷嘴（72）。 起动辊（14）停止并保持。 使起动辊旋转以将涂布液的一部分卷绕在起动辊上作为第一涂布液膜。 第一涂布液膜达到第一待机旋转角度，停止启动辊的旋转。 第一涂布液膜自然干燥。 通过清洗处理消除第一涂布液膜。
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公开(公告)号：KR101346887B1
公开(公告)日：2013-12-31
申请号：KR1020070005581
申请日：2007-01-18
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: 도포 주사의 종반에서 그때까지 레지스트 노즐의 하부 측면(78b)에 부착 또는 추종해 온 메니스커스의 레지스트액 융기부(RQ)를, 주사 속도를 순간적으로 상승(급가속)에 의해 레지스트 노즐(78)로부터 분리시키고, 바람직하게는 보증 영역 경계(L
X ) 부근에 치운다. 그리고, 주사 종료 직후에 기판(G) 상에서 레지스트 노즐(78)에 색백을 행하게 함으로써 도포 주사 종단부의 여분의 레지스트액을 제거하고, 그때에 색백의 영향을 상기 치운 레지스트액 융기부(RQ)에서 상쇄함으로써, 보증 영역(E
S ) 내의 레지스트막 두께가 설정치 또한 허용 범위 이하가 되는 것을 방지한다.
도포 장치, 레지스트 노즐, 흡착 패드, 에어 실린더, 캐비티, 전동 모터-
公开(公告)号：KR1020070077089A
公开(公告)日：2007-07-25
申请号：KR1020070005581
申请日：2007-01-18
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: A coating method, a coating apparatus, and a memory medium are provided to improve a film thickness control and coating quality by sucking back a treatment liquid on a substrate through a nozzle located at an injection termination position. A substrate supporter(76) supports a substrate(G) to be processed, horizontally. A long-shaped nozzle(78) injects a treatment liquid onto an upper surface of the substrate with a minute gap spaced away therefrom. A treatment liquid source supplies the treatment liquid to the nozzle. An injection unit moves the nozzle in a horizontal direction with respect to the substrate. An elevation unit elevates the nozzle in vertical direction with respect to the substrate. A controller controls the injection unit to position the nozzle at a preset injection termination position. The controller controls the nozzle positioned at the preset injection termination position to suck-back the treatment liquid residing on the substrate with a preset amount.
Abstract translation: 提供涂布方法，涂布装置和记录介质以通过通过位于注射终止位置的喷嘴将基板上的处理液吸回来来提高膜厚控制和涂布质量。 衬底支撑件（76）水平地支撑待加工的衬底（G）。 长形喷嘴（78）将处理液体以与之间隔开的微小间隙向衬底的上表面喷射。 处理液体源将处理液体供应到喷嘴。 喷射单元相对于基板沿水平方向移动喷嘴。 升降单元相对于基板沿垂直方向提升喷嘴。 控制器控制注射单元以将喷嘴定位在预设的注射终止位置。 控制器控制位于预设注射终止位置的喷嘴，以预设的量吸回驻留在基底上的处理液体。
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Patent Agency Ranking
公开(公告)号：KR1020070024411A
公开(公告)日：2007-03-02
申请号：KR1020060080830
申请日：2006-08-25
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/00 , H01L21/027
CPC classification number: H01L21/67178 , B05D1/42 , B05D3/0254 , B05D3/12 , H01L21/67092 , H01L21/67184 , H01L21/6719 , H01L21/67207 , G03F7/168 , G03F7/70716 , H01L21/67098 , H01L21/6715
Abstract: A substrate processing apparatus is provided to sufficiently planarize the upper surface of a deposition layer by intermittently pressing the upper surface of the deposition layer by a pressure member. A retaining support member(121) retains and supports a substrate(W) in a process receptacle(120). A heating member(122) heats the substrate supported by the retaining support member. A pressure member whose lower surface is flat presses the upper surface of a substrate deposition layer downward. A control part(150) controls the operation of the heating member and the pressure member in a manner that the upper surface of the substrate deposition layer heated by the heating member is intermittently pressed by the pressure member. An exhaust part(143) exhausts the atmosphere of the process receptacle. A decompression apparatus decompress the process receptacle.
Abstract translation: 提供了一种衬底处理装置，通过用压力构件间歇地压制沉积层的上表面来使沉积层的上表面充分平坦化。 保持支撑构件（121）保持并支撑处理容器（120）中的衬底（W）。 加热构件（122）加热由保持支撑构件支撑的基板。 下表面平坦的压力部件向下压基板沉积层的上表面。 控制部分（150）以加热部件加热的基板沉积层的上表面被压力部件间歇地按压的方式控制加热部件和加压部件的操作。 排气部分（143）排出处理容器的气氛。 减压装置解压过程容器。
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公开(公告)号：KR101552364B1
公开(公告)日：2015-09-10
申请号：KR1020100094884
申请日：2010-09-30
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B05D1/26 , H01L21/027 , G03F7/26
Abstract: 본발명의과제는프라이밍처리의신뢰성을보장하면서세정액의사용량을한층삭감하는것이다. 슬릿노즐(72)의토출구를프라이밍롤러(14)의정상부에대해평행하게대향시켜, 슬릿노즐(72)에일정량의레지스트액(R)을토출시켜, 그대로소정시간방치한다. 다음에, 프라이밍롤러(14)의회전을개시하여, 프라이밍롤러(14)의외주면상에레지스트액(R)을권취한다. 계속해서, 프라이밍롤러(14)의회전속도를한번에올려, 슬릿노즐(72)측과프라이밍롤러(14)측으로나뉘도록레지스트액(R)의액막을분리하고, 분리한후에도프라이밍롤러(14)의회전을그대로계속시켜, 프라이밍롤러(14) 상의레지스트액막(RM)을소정의대기용회전각위치에오게한다.
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公开(公告)号：KR101518522B1
公开(公告)日：2015-05-07
申请号：KR1020100052694
申请日：2010-06-04
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , B05C5/02
Abstract: 본 발명의 과제는 프라이밍 처리의 신뢰성을 보장하면서 세정액의 사용량을 한층 삭감하는 것이다.
슬릿 노즐(72)의 토출구를 프라이밍 롤러(14)의 정상부에 대해 평행하게 대향시키고, 프라이밍 롤러(14)를 정지시킨 채로, 슬릿 노즐(72)에 일정량의 레지스트액(R)을 토출시킨다. 다음에, 프라이밍 롤러(14)의 회전을 개시하여, 프라이밍 롤러(14)의 외주면 상에 레지스트액(R)을 권취한다. 계속해서, 프라이밍 롤러(14)의 회전 속도를 한번에 올려, 슬릿 노즐(72)측과 프라이밍 롤러(14)측으로 나뉘도록 레지스트액(R)의 액막을 분리하고, 분리한 후에도 프라이밍 롤러(14)의 회전을 그대로 계속시켜, 레지스트 액막(RM
1 )을 자연 건조시킨다.Abstract translation: 本发明的目的在于进一步减少所使用的清洁液的量，同时确保起动加工的可靠性。
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公开(公告)号：KR1020120012757A
公开(公告)日：2012-02-10
申请号：KR1020110070214
申请日：2011-07-15
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: PURPOSE: A coating apparatus and a method for priming a nozzle are provided to uniformly discharge a treating solution from a nozzle outlet of a slit form when the treating solution is applied to a substrate and to reducing the amount of a washing solution required for priming a nozzle. CONSTITUTION: A coating apparatus includes a nozzle and a priming treating unit(20). The nozzle discharges a treating solution through an outlet. The priming treating unit standardizes the treating solution by being attached on the tip end of the nozzle. The treating solution forms a coating film on a substrate. The priming treating unit includes a priming roller(23), a treating solution absorbing member(24), and a moving unit(29). The treating solution absorbing unit is expanded along the priming roller and absorbs the treating solution. The moving unit moves the longitudinal side of the treating solution absorbing member with respect to the roller side of the priming roller.
Abstract translation: 目的：提供一种涂布装置和喷嘴喷射方法，以将治疗溶液施加到基底上时将来自狭缝形式的喷嘴出口的处理溶液均匀地排出，并且减少了引发喷雾所需的洗涤溶液的量 喷嘴。 构成：涂覆装置包括喷嘴和起泡处理单元（20）。 喷嘴通过出口排出处理溶液。 起动处理单元通过附接在喷嘴的尖端来标准化处理溶液。 处理溶液在基材上形成涂膜。 起动处理单元包括起动辊（23），处理溶液吸收构件（24）和移动单元（29）。 处理溶液吸收单元沿着起动辊膨胀并吸收处理溶液。 移动单元使处理溶液吸收构件的纵向侧相对于起动辊的辊侧移动。
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公开(公告)号：KR101080487B1
公开(公告)日：2011-11-04
申请号：KR1020060080830
申请日：2006-08-25
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/00 , H01L21/027
CPC classification number: H01L21/67178 , B05D1/42 , B05D3/0254 , B05D3/12 , H01L21/67092 , H01L21/67184 , H01L21/6719 , H01L21/67207
Abstract: 본발명에있어서는, 예를들어평탄화장치의처리용기내에히터가내장된보유지지대가설치된다. 보유지지대의상방에는하면이평탄하게형성된압박판이배치된다. 압박판은상하방향으로이동가능하고, 보유지지대상에하강하여기판상의레지스트막을상방으로부터압박할수 있다. 보유지지대상의기판을히터에의해소정의온도로가열하여, 레지스트막을건조시키는동안에, 압박판에의해레지스트막의상면을단속적으로압박하여평탄화한다. 본발명에따르면기판상에도포된도포막을충분히평탄화하여건조시킬수 있다.
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