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公开(公告)号：KR101842729B1
公开(公告)日：2018-03-27
申请号：KR1020130072234
申请日：2013-06-24
Applicant: 도쿄엘렉트론가부시키가이샤
CPC classification number: B05C5/0258 , B05B1/044 , B05B12/081 , B05C5/0254 , H01L21/6715
Abstract: 본발명은막 두께균일성을높이는것을목적으로한다. 실시형태에따른도포장치는, 노즐과, 이동기구를구비한다. 노즐은, 도포액이저류되는저류실과, 저류실에연통하는슬릿형의유로를구비하고, 유로의선단에형성되는토출구를통하여도포액을토출한다. 이동기구는, 노즐과기판을기판의표면을따라상대적으로이동시킨다. 그리고, 노즐에구비되는유로는, 길이방향중앙부에있어서의유로저항이길이방향양단부에있어서의유로저항보다크다.
Abstract translation: 本发明的目的是提高膜厚均匀性。 根据该实施例的包装包装包括喷嘴和移动机构。 喷嘴具有储存涂布液的储藏室和与储藏室连通的狭缝状的流路，并通过形成在流路的前端的喷出口喷出涂布液。 移动机构沿着基板的表面相对地移动喷嘴和基板。 设置在喷嘴中的流路的纵向中央部分中的流路阻力大于两个纵向端部处的流路阻力。
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公开(公告)号：KR1020130111345A
公开(公告)日：2013-10-10
申请号：KR1020130031291
申请日：2013-03-25
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: PURPOSE: A method and apparatus for injecting an electrolyte are provided to prevent moisture from being mixed by circulating the electrolyte in a first closed loop. CONSTITUTION: Two ports (12,14) are formed in a cell container (10) and are connected to an electrolyte storing space. A buffer tank (24) temporarily stores an electrolyte. A first closed loop is formed in lines (26,28). The electrolyte is circulated in the first closed loop. [Reference numerals] (10) Cell container; (18) Fuzzy unit; (20) Vacuum unit; (22) Controller; (32) Solution amount change monitoring unit; (34) Air bubble monitoring unit; (38,40,50,52) Direction switching valve; (AA,BB) Towards a controller (22)
Abstract translation: 目的：提供一种用于注入电解质的方法和装置，以通过在第一闭环中循环电解质来防止水分混合。 构成：在电池容器（10）中形成两个端口（12,14），并连接到电解液存储空间。 缓冲罐（24）暂时存储电解液。 线（26,28）中形成第一闭环。 电解质在第一闭环中循环。 （附图标记）（10）电池容器; （18）模糊单位; （20）真空机组; （22）控制器; （32）解决量变化监测单位; （34）气泡监测装置; （38,40,50,52）方向转向阀; （AA，BB）朝向控制器（22）
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Patent Agency Ranking
公开(公告)号：KR1020140001132A
公开(公告)日：2014-01-06
申请号：KR1020130072234
申请日：2013-06-24
Applicant: 도쿄엘렉트론가부시키가이샤
CPC classification number: B05C5/0258 , B05B1/044 , B05B12/081 , B05C5/0254 , H01L21/6715
Abstract: The present invention is for increasing film thickness uniformity. A coating device by an embodiment of the present invention includes a nozzle and a transfer unit. The nozzle includes a storage chamber for storing coating liquid and a flow path in a slit type connected to the storage chamber, and discharges the coating liquid through an outlet formed on the tip end of the flow path. The transfer unit relatively transfers the nozzle and a substrate along the surface of the substrate. The flow path on the nozzle has the flow resistance on the longitudinal center bigger than those on the longitudinal left and right ends.
Abstract translation: 本发明是为了提高膜厚均匀性。 通过本发明的实施方式的涂布装置包括喷嘴和转印单元。 喷嘴包括用于存储涂布液的储存室和连接到储存室的狭缝型流路，并且通过形成在流路前端的出口排出涂布液。 转印单元沿衬底的表面相对地转移喷嘴和衬底。 喷嘴上的流路在纵向中心的流动阻力大于纵向左右两端的流动阻力。
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公开(公告)号：KR100732806B1
公开(公告)日：2007-06-27
申请号：KR1020000061183
申请日：2000-10-18
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: G02F1/13
Abstract: 가열처리장치는, 그 위 또는 그 위쪽에 피처리 기판이 재치되어, 피처리 기판을 가열하는 열판과, 열판의 위쪽에 규정되는 피처리 기판을 가열처리하는 가열처리공간을 둘러쌀 수 있도록 설치된 둘러싸는 부재와, 상기 둘러싸는 부재에 의해 가열처리공간을 둘러쌀 경우에, 열판의 주위를 대략 밀폐하는 밀폐기구와, 가열처리 공간에 있어서 바깥둘레로부터 중앙을 향한 기류를 형성하는 기류형성수단을 구비한다. 이러한 구성에 의하면, 레지스트 승화물 등이 고이기 어렵고, 피처리 기판의 온도분포가 불안정하게 되는 것을 방지할 수 있고, 피처리 기판의 온도를 고정밀도로 제어할 수 있다.
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公开(公告)号：KR1020010060154A
公开(公告)日：2001-07-06
申请号：KR1020000061183
申请日：2000-10-18
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: G02F1/13
Abstract: PURPOSE: A heat processing apparatus in which a resist sublimate or the like is difficult to stay is provided to prevent the temperature distribution of a processed substrate from becoming unstable, and to control the temperature of the processed substrate with high accuracy. CONSTITUTION: This heat processing apparatus is provided with a hot plate on or above which the processed substrate is loaded and that heats the processed substrate, a surrounding member provided so as to surround the heat processing space in which the heat processing substrate located above the hot plate is heat-processed, a sealing mechanism that almost seals the circumference of the surrounding member when the heat processing space is surrounded by the surrounding member, and an air current forming means that forms an air current from the outside circumference toward the center in the heat processing space.
Abstract translation: 目的：提供难以停留抗蚀剂升华等的热处理装置，以防止处理基板的温度分布变得不稳定，并且以高精度控制处理基板的温度。 构成：该热处理装置在其上或上方设置有加热基板的加热板，并加热经处理的基板，周围部件设置成围绕热处理空间，热处理基板位于热处理基板的上方 板被加热处理，当热处理空间被周围构件包围时，密封机构几乎密封周围构件的周缘;以及气流形成装置，其从外周朝向中心形成气流 热处理空间。
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公开(公告)号：KR101555717B1
公开(公告)日：2015-09-25
申请号：KR1020100001746
申请日：2010-01-08
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B65G49/06 , H01L21/027 , H01L21/677 , H01L21/306
Abstract: 기판의둘레가장자리부에형성된처리막을제거하는기판처리장치에있어서, 기판단위의처리시간을단축하고, 처리막형성의스루풋을향상하는동시에, 생산수율의저하를억제한다. 기판(G)을기판반송로를따라서평류로반송하는기판반송수단(21)과, 상기기판반송수단에의해제 1 반송방향으로반송되는상기기판(G)의, 반송방향을따른양측가장자리부의처리막을제거하는제 1 제거수단(5b)과, 상기제 1 제거수단에의해상기양측가장자리부의처리막이제거된기판의반송방향을, 상기제 1 반송방향에직교하는제 2 반송방향으로전환하는반송방향전환수단(7)과, 상기기판반송수단에의해제 2 반송방향으로반송되는상기기판(G)의, 반송방향을따른양측가장자리부의처리막을제거하는제 2 제거수단(6b)을구비한다.
Abstract translation: 本发明提供一种基板处理装置，该基板处理装置用于除去在基板周边部形成的处理膜，缩短每个基板的处理时间，提高处理膜形成的处理量，抑制生产率的下降。 （21），其用于沿着基板传送路径以剥离流动方式传送基板（G）;以及基板传送机构（21），其用于传送基板 用于去除处理膜的第一去除装置（5b）以及第二去除装置，用于通过第一去除装置在用于在与第一输送方向正交的第二输送方向上切换衬底的输送方向上去除在两个侧边缘部分上的处理膜 以及第二去除装置（6b），用于沿着输送方向去除沿释放2输送方向输送到基板输送装置的基板（G）的两侧边缘上的处理膜。
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公开(公告)号：KR1020100089746A
公开(公告)日：2010-08-12
申请号：KR1020100001746
申请日：2010-01-08
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B65G49/06 , H01L21/027 , H01L21/677 , H01L21/306
CPC classification number: G03F7/422 , B65G49/061 , G03F7/70733 , G03F7/70908 , G03F7/70933 , H01L21/67706
Abstract: PURPOSE: A device and a method for processing a substrate are provided to improve a throughput and a production yield and to reduce time required for processing a substrate. CONSTITUTION: A device for processing a substrate comprises a substrate returning unit(21) and a first eliminating unit(5). The substrate returning unit eliminates a film formed in the edge of a substrate(G) and returns the substrate. The first eliminating unit eliminates register films on both edges of the substrate and is composed of an alignment unit(5a) and a processing unit(5b). The alignment unit aligns the returned substrate. The processing unit supplies a register solvent to both edges of the substrate and eliminates the register films.
Abstract translation: 目的：提供一种用于处理基底的装置和方法，以提高生产量和产量，并减少加工基材所需的时间。 构成：用于处理衬底的器件包括衬底返回单元（21）和第一消除单元（5）。 基板返回单元消除在基板（G）的边缘形成的膜并使基板返回。 第一消除单元消除基板的两个边缘上的寄存器膜，并且由对准单元（5a）和处理单元（5b）组成。 对准单元对准返回的基板。 处理单元向衬底的两个边缘提供寄存器溶剂，并且消除了寄存器膜。
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