公开(公告)号：KR1020140001132A

公开(公告)日：2014-01-06

申请号：KR1020130072234

申请日：2013-06-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이시이다카유키 ,  사카모토다카히로 ,  기타노다카히로 ,  데라다쇼이치

IPC: B05C5/02 ,  B05C11/10 ,  B05D1/26

CPC classification number: B05C5/0258 ,  B05B1/044 ,  B05B12/081 ,  B05C5/0254 ,  H01L21/6715

Abstract: The present invention is for increasing film thickness uniformity. A coating device by an embodiment of the present invention includes a nozzle and a transfer unit. The nozzle includes a storage chamber for storing coating liquid and a flow path in a slit type connected to the storage chamber, and discharges the coating liquid through an outlet formed on the tip end of the flow path. The transfer unit relatively transfers the nozzle and a substrate along the surface of the substrate. The flow path on the nozzle has the flow resistance on the longitudinal center bigger than those on the longitudinal left and right ends.

Abstract translation: 本发明是为了提高膜厚均匀性。 通过本发明的实施方式的涂布装置包括喷嘴和转印单元。 喷嘴包括用于存储涂布液的储存室和连接到储存室的狭缝型流路，并且通过形成在流路前端的出口排出涂布液。 转印单元沿衬底的表面相对地转移喷嘴和衬底。 喷嘴上的流路在纵向中心的流动阻力大于纵向左右两端的流动阻力。

公开(公告)号：KR1020130132786A

公开(公告)日：2013-12-05

申请号：KR1020137011210

申请日：2011-10-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 히로시로고오키치 ,  니시다카노리 ,  데라다쇼이치 ,  기타노다카히로

IPC: H01L21/027

CPC classification number: B29C33/58 ,  B29C33/60 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0273

Abstract: The present invention is a method for modifying the surface of a substrate such that the adhesiveness between the surface of the substrate and an object to be bonded thereto is improved. The surface of the substrate is modified by supplying a surface modification solution such as a tertiary alcohol, an alkaline solution or a hydrogen peroxide solution to the surface of a substrate while irradiating the surface of the substrate with ultraviolet rays, and by imparting a large amount of hydroxyl groups to the surface of the substrate. The surface of the substrate begins to be irradiated with ultraviolet rays while the surface modification solution is being supplied.

公开(公告)号：KR1020110055404A

公开(公告)日：2011-05-25

申请号：KR1020100111944

申请日：2010-11-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 히로시로코우키치 ,  니시타카노리 ,  키타노타카히로 ,  데라다쇼이치

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/2041

Abstract: PURPOSE: A template processing method, program, computer recording medium, template processing device, and imprint system are provided to apply alcohol on a release agent of a template, thereby increasing the adhesive power between the surface of the template and the release agent. CONSTITUTION: A template is inserted into a transition unit of a processing station(A1). The surface of the template is cleaned(A2). A release agent is applied on the entire surface of the template(A3). A release agent on the template is dried by the rotation of the template(A4). Alcohol is applied on the release agent on the template(A5). Alcohol is eliminated from the template by the rotation of the template(A6). The template is carried to a template cassette by a template returning object(A7).

Abstract translation: 目的：提供模板处理方法，程序，计算机记录介质，模板处理装置和压印系统，以在模板的脱模剂上施加醇，从而增加模板表面和脱模剂之间的粘合力。 构成：将模板插入到处理站（A1）的过渡单元中。 模板的表面被清洁（A2）。 将脱模剂施加在模板（A3）的整个表面上。 模板上的脱模剂通过模板（A4）的旋转而被干燥。 将酒精施加在模板（A5）上的脱模剂上。 酒精通过模板（A6）的旋转从模板中消除。 模板通过模板返回对象（A7）传送到模板盒。

公开(公告)号：KR101842729B1

公开(公告)日：2018-03-27

申请号：KR1020130072234

申请日：2013-06-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이시이다카유키 ,  사카모토다카히로 ,  기타노다카히로 ,  데라다쇼이치

IPC: B05C5/02 ,  B05C11/10 ,  B05D1/26

CPC classification number: B05C5/0258 ,  B05B1/044 ,  B05B12/081 ,  B05C5/0254 ,  H01L21/6715

Abstract: 본발명은막 두께균일성을높이는것을목적으로한다. 실시형태에따른도포장치는, 노즐과, 이동기구를구비한다. 노즐은, 도포액이저류되는저류실과, 저류실에연통하는슬릿형의유로를구비하고, 유로의선단에형성되는토출구를통하여도포액을토출한다. 이동기구는, 노즐과기판을기판의표면을따라상대적으로이동시킨다. 그리고, 노즐에구비되는유로는, 길이방향중앙부에있어서의유로저항이길이방향양단부에있어서의유로저항보다크다.

Abstract translation: 本发明的目的是提高膜厚均匀性。 根据该实施例的包装包装包括喷嘴和移动机构。 喷嘴具有储存涂布液的储藏室和与储藏室连通的狭缝状的流路，并通过形成在流路的前端的喷出口喷出涂布液。 移动机构沿着基板的表面相对地移动喷嘴和基板。 设置在喷嘴中的流路的纵向中央部分中的流路阻力大于两个纵向端部处的流路阻力。

公开(公告)号：KR1020160075344A

公开(公告)日：2016-06-29

申请号：KR1020150179895

申请日：2015-12-16

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 요시다게이스케 ,  오오이시유조 ,  사사키게이스케 ,  데라다쇼이치

IPC: H01L21/263 ,  H01L21/324 ,  H01L21/66 ,  H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: 본발명의과제는에칭후에있어서의막 두께의균일성을높일수 있는장치및 방법을제공하는것이다. 에칭유닛(U3)은, 에칭대상의웨이퍼(W)를지지하고, 가열하는열판(40)과, 에칭용의에너지선을출사하는광원(60)과, 광원(60) 및열판(40) 사이에설치되어, 광원(60)으로부터웨이퍼(W)를향하는에너지선을투과시키는창부(P1)와, 웨이퍼(W)의부위마다의에칭량의차이를저감하도록, 창부(P1)의부위에따라창부(P1)로부터웨이퍼(W)로의에너지선의출사량을조절하는조절부(P2)를구비한다.

Abstract translation: 本发明涉及能够提高蚀刻后的膜厚均匀性的装置和方法。 蚀刻单元（U3）包括：加热板（40），其支撑并加热蚀刻目标晶片（W）; 输出用于蚀刻的能量射线的光源（60） 窗口部分（P1），安装在光源（60）和加热板（40）之间，并允许从光源（60）引导到晶片（W）的能量射线通过; 以及根据窗口部分（P1）的部分调整从窗口部分（P1）到晶片（W）的能量射线的输出量的调节部分（P2），以减少晶片的每个部分的蚀刻差异 （W）。