지향성 광 추출 장치 및 이를 포함한 광 인터커넥션 시스템
    5.
    发明公开
    지향성 광 추출 장치 및 이를 포함한 광 인터커넥션 시스템 审中-实审
    输出方向光和互连系统的装置

    公开(公告)号:KR1020150050093A

    公开(公告)日:2015-05-08

    申请号:KR1020130131503

    申请日:2013-10-31

    Abstract: 지향성광 추출장치및 이를포함한광 인터커넥션시스템이개시된다. 개시된지향성광 추출장치는, 광을방출하는발광구조물과, 상기발광구조물상에구비된것으로, 상기광을공진시키는광 공급부및 상기광 공급부로부터나온광이지향성을갖도록반사시키는광 반사부를포함하는광학안테나층을포함하고, 상기광 공급부는상기광학안테나층을관통하는슬롯형상을가진다.

    Abstract translation: 公开了一种定向光提取装置和包括该定向光提取装置的光互连系统。 所公开的定向光提取装置包括发光的发光结构; 包括在所述发光结构中并且使所述光的共振的光供给单元; 以及光天线层,其包括反射从所述光供给单元发射的光以具有所述光的方向性的光反射单元。 光供给单元具有穿过光天线层的槽形状。

    반도체 소자의 제조에서 전하축적 방지방법
    6.
    发明公开
    반도체 소자의 제조에서 전하축적 방지방법 审中-实审
    防止半导体器件制造中的电荷累积的方法

    公开(公告)号:KR1020140025158A

    公开(公告)日:2014-03-04

    申请号:KR1020120091469

    申请日:2012-08-21

    Abstract: Disclosed is a method for preventing charge accumulation in a semiconductor device manufacturing process. According to one embodiment of the present invention, the method for preventing charge accumulation includes the steps of: forming a material layer on a substrate and patterning (processing) the material layer; and forming a graphene layer on the upper part or the lower part of the material layer before the material layer is patterned. The substrate can be an insulating substrate. Also, the substrate can be a laminate with a multi-layered structure.

    Abstract translation: 公开了一种在半导体器件制造工艺中防止电荷累积的方法。 根据本发明的一个实施例,用于防止电荷累积的方法包括以下步骤:在衬底上形成材料层并构图(加工)材料层; 以及在材料层被图案化之前在材料层的上部或下部形成石墨烯层。 衬底可以是绝缘衬底。 此外,基板可以是具有多层结构的层叠体。

    그래핀 전사 방법 및 이를 이용한 소자의 제조방법
    7.
    发明公开
    그래핀 전사 방법 및 이를 이용한 소자의 제조방법 审中-实审
    传送石墨的方法和使用该方法制造装置的方法

    公开(公告)号:KR1020130132105A

    公开(公告)日:2013-12-04

    申请号:KR1020120056230

    申请日:2012-05-25

    CPC classification number: C01B32/194 B01J19/123

    Abstract: Disclosed are a method of transferring graphene and a method of manufacturing a device using the same. The method for transferring graphene is able to comprise a step of transferring graphene formed on a first substrate to a second substrate by using a cheap protective material. The protective material is able to include a material such as polystyrene or polystyrene-based material. A protective layer is able to be manufactured by spraying a mixture of a solvent and polystyrene on the graphene. The solvent has the boiling point of more than about 150°C. An etching solution having the surface tension of more than 32 dyne/cm is able to be used when the protective layer is removed after graphene transfer. The method of transferring graphene is able to additionally comprise a step of process the surface of the second substrate with ultraviolet rays when the graphene is transferred. The surface of the second substrate processed with the ultraviolet rays is able to have hydrophilicity.

    Abstract translation: 公开了转移石墨烯的方法和使用其制造器件的方法。 用于转移石墨烯的方法能够包括通过使用便宜的保护材料将形成在第一衬底上的石墨烯转移到第二衬底的步骤。 保护材料能够包括诸如聚苯乙烯或聚苯乙烯的材料的材料。 能够通过在石墨烯上喷涂溶剂和聚苯乙烯的混合物来制造保护层。 溶剂的沸点高于约150℃。 当石墨烯转移后保护层被去除时,可以使用表面张力大于32达因/厘米的蚀刻溶液。 转移石墨烯的方法能够另外包括当石墨烯转移时用紫外线处理第二基板的表面的步骤。 用紫外线处理的第二基板的表面能够具有亲水性。

    표면 플라즈몬 레이저
    8.
    发明公开
    표면 플라즈몬 레이저 审中-实审
    表面等离子体激光

    公开(公告)号:KR1020130030217A

    公开(公告)日:2013-03-26

    申请号:KR1020120101625

    申请日:2012-09-13

    CPC classification number: H01S5/1046 H01S3/1302 H01S3/169 H01S4/00

    Abstract: PURPOSE: A surface plasmon laser is provided to output a small laser beam exceeding a diffraction limit of a laser. CONSTITUTION: A surface plasmon laser(10) includes a metal layer(20), a gain medium layer(30), and a deformed part. The gain medium layer is placed on the metal layer and includes a circular structure part. The circular structure part generates a whispering gallery mode. The whispering gallery mode enables surface plasmon light generated by surface plasmon resonance on an interface with the metal layer along a circle. The deformed part outputs a part of a laser beam generated from the circular structure part of the gain medium layer.

    Abstract translation: 目的:提供表面等离激元激光器来输出超过激光衍射极限的小激光束。 构成:表面等离子体激元(10)包括金属层(20),增益介质层(30)和变形部分。 增益介质层被放置在金属层上并且包括圆形结构部分。 圆形结构部分产生一个耳语画廊模式。 耳语画廊模式使得通过表面等离子体共振产生的表面等离激元光在与金属层的界面上沿着圆形。 变形部分输出从增益介质层的圆形结构部分产生的激光束的一部分。

    전도성 섬유 및 그의 용도
    9.
    发明公开
    전도성 섬유 및 그의 용도 有权
    电磁纤维及其用途

    公开(公告)号:KR1020110095660A

    公开(公告)日:2011-08-25

    申请号:KR1020100015252

    申请日:2010-02-19

    Abstract: PURPOSE: A conductive fiber and a use of the same are provided to include a fiber complex body which includes the conductive fiber, thereby increasing internal stress. CONSTITUTION: A conductive fiber and a use of the same include a conductive polymer, an elastic polymer, and a carbon nano tube. The carbon nano tube(2) is fixed in the conductive polymer, elastic polymer(1), or carbon nano tube. A fiber has a double layer structure of a shell and core. A composition material includes the conductive polymer, elastic polymer, carbon nano tube, and an ionic liquid. The fiber is manufactured by emitting the composition material.

    Abstract translation: 目的:提供导电纤维及其用途,包括包含导电纤维的纤维复合体,从而增加内应力。 构成:导电纤维及其用途包括导电聚合物,弹性聚合物和碳纳米管。 碳纳米管(2)固定在导电聚合物,弹性聚合物(1)或碳纳米管中。 纤维具有壳和芯的双层结构。 组合物材料包括导电聚合物,弹性聚合物,碳纳米管和离子液体。 纤维通过发射组合物材料制造。

    탄소나노튜브 소자 어레이의 제조방법
    10.
    发明公开
    탄소나노튜브 소자 어레이의 제조방법 有权
    制备碳纳米管装置阵列的方法

    公开(公告)号:KR1020100123144A

    公开(公告)日:2010-11-24

    申请号:KR1020090042192

    申请日:2009-05-14

    Abstract: PURPOSE: A manufacturing method of a carbon nano tube element is provided to form carbon nanotubes in a desired location by using a photolithography process. CONSTITUTION: An oxide layer(120) is formed on a substrate(110). A plurality of catalyst patterns are formed on the oxide layer. The catalyst patterns are formed by a photolithography process. A plurality of firsts and second electrodes(151,152) are formed by the photolithography process.

    Abstract translation: 目的:提供碳纳米管元件的制造方法,以通过使用光刻工艺在所需位置形成碳纳米管。 构成:在衬底(110)上形成氧化物层(120)。 在氧化物层上形成多个催化剂图案。 催化剂图案通过光刻工艺形成。 通过光刻工艺形成多个第一和第二电极(151,152)。

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