Abstract:
PURPOSE: An apparatus of inputting and verifying of a recipe parameter of a scanning electron microscope and an inputting and verifying method using the same are provided to reduce a processing time for input and verification by utilizing a personal computer using a spreadsheet and a macro method. CONSTITUTION: A personal computer(260) includes a spreadsheet program and a macro for converting a spreadsheet to a predetermined file requested from a workstation(210) of a scanning electron microscope(220) or converting the converted file to the spreadsheet. The workstation of the scanning electron microscope is used for receiving a recipe from the personal computer to control a mechanical part of the scanning electron microscope.
Abstract:
PURPOSE: A method and a device for generating a secret key in communication are provided to improve the security of a communication device by using the data, which are received with solving the encode of the encoded data by using the common secret value in a receiving side. CONSTITUTION: In the method and the device for generating the secret key in communication, a few stages are included. In the first stage, a device sends the own common key to the other device. In the second stage, the first middle secret value is generated by using the common key and is sent to the called device. In the third stage, the second middle secret value is generated by using the first middle secret value and the own personal key and is sent to the called device. And the secret value of the called device is generated by using the first middle secret value and the common key. In the fourth stage, the secret value of the called device is generated by using the first middle secret value and the personal key.
Abstract:
A method for measuring a specimen surface is provided to maximize production yield by reducing weight of distorted information corresponding to an upper surface of a pattern relative to information corresponding to both side walls of the pattern. A method for measuring a specimen surface(200) comprises the steps of: allowing first incident light(201) to be incident into the specimen formed with an arbitrary pattern in a first direction(S1); detecting first diffraction light(202) diffracted in the specimen to be incident by the first incident light(S2); allowing second incident light(203) in a second direction opposite to the first direction to be incident into the specimen; detecting second diffraction light(204) diffracted in the specimen(S3); and comparing information corresponding to the first diffraction light and the second diffraction light respectively with each other, and judging if both side walls of the pattern are parallel to each other in the first direction and the second direction when the information is the same or similar(S4).
Abstract:
A method of detecting defects in a silicon substrate and an apparatus for performing the same are provided to identify grating defects of a silicon wafer by using a light emitting image of fluorescent materials. A silicon wafer(W) is loaded on a chuck(110) within a process chamber(100). An edge part of the silicon wafer is coated by using fluorescent materials having different coating characteristics at a defective grating part and a normal grating part of the silicon wafer. A light emitting image of a silicon wafer edge part is obtained by irradiating light onto the silicon wafer edge part coated with the fluorescent materials. A grating defect of the silicon wafer edge part is detected by identifying a coating state of the fluorescent materials of the light emitting image.
Abstract:
A method for adjusting a focal point of a scanning electron microscope is provided to accurately detect a size of a pattern formed on a subject by obtaining an accurate image of the subject. A scanning electron microscope includes a stage(10) for a subject(30), an inspection member, and an auto-focusing member. The inspection member includes a lens assembly(22), a detector(24), and an ADC(Analog Digital Converter)(26). The lens assembly includes an electron gun, a focusing lens, a deflection coil, an objective lens, and an auxiliary coil. The detector detects secondary electrons, which are generated by a surface reaction due to accelerated electrons on a surface of the subject. The ADC converts the signal from the detector into a digital signal.
Abstract:
PURPOSE: A transfer apparatus used for manufacturing a semiconductor device is provided to be capable of considerably improving the abrasion state of a pad and easily replacing the pad with another. CONSTITUTION: A transfer apparatus used for manufacturing a semiconductor device includes a transfer part(10) having a pad(12). At this time, the pad contacts the backside of a substrate. The pad is made of predetermined rubber, wherein the predetermined rubber is mixed with soft silicon. Preferably, the soft silicon has a Shore hardness of 20-30 degrees. Preferably, at least three pads are installed at the transfer part and the outer diameter of each pad exceeds 3 π. Preferably, the pad is screw-connected with the transfer part, so that the pad is easily replaced with another.
Abstract:
본 발명은 통신에서 비밀키를 생성하는 방법 및 그 장치를 개시한다. 본 발명에 의하면, 통신하는 양 측에서 각각 공개키를 상대에게 전송하고, 상대의 공개키를 이용하여 중간 비밀값을 소정의 방법으로 계산하고, 이 중간 비밀값들을 서로 교환하며, 이 중간 비밀값과 자신의 개인 키를 이용하여 공동으로 사용되는 비밀값을 생성함으로 해서, 공동의 비밀값을 이용해서 통신에 전송하는 데이터를 암호화하고 수신한 측에서는 상기의 공동의 비밀값을 이용해서 암호화된 데이터의 암호를 풀어 수신한 데이터를 사용하게 되어 통신 장치의 보안성이 대폭 향상될 수 있으며, 이를 위한 과정이 상당히 단순하여 통신 장치에 대한 부담도 작게 된다.