Abstract:
본 발명은 웨이퍼 상에 폴리머 스페이서가 포함된 접착제 패턴을 형성한다. 이어서, 상기 접착제 패턴이 형성된 웨이퍼를 소잉하여 개별 다이로 만드다. 다음에, 리드 프레임 아래에 개별 다이의 접착제 패턴을 열 압착에 의해 어태치하는 다이 어태치 공정을 수행하여 LOC 구조의 반도체 패키지를 제조한다. 이상과 같이, 본 발명은 폴리이미드 테이프를 사용하지 않고 폴리머 스페이서가 포함된 접착제 패턴을 이용하여 다이 어태치 공정을 수행하여 패시베이션 크랙 및 리프레시 특성이 개선된 LOC 구조의 반도체 패키지를 제조할 수 있다.
Abstract:
적층형 반도체 패키지를 인쇄회로기판에 실장할 때 사용되는 카트리지 및 이를 이용한 실장방법에 관해 개시한다. 이를 위해 본 발명은, 적층형 반도체 패키지를 인쇄회로기판 위에 실장할 때 사용되는 카트리지(cartridge) 본체와, 상기 카트리지 본체에서 반도체 패키지가 실장되는 영역에 형성된 개구부와, 상기 개구부의 가장자리에 형성되어 반도체 패키지의 적층형 실장을 가능케 하는 가이더(guider)와, 상기 카트리지 본체에 연결되어 형성되고, 상기 인쇄회로기판에 장착하는데 사용되는 장착수단을 구비하는 것을 특징으로 하는 적층형 반도체 패키지 실장시 사용되는 카트리지를 제공한다.
Abstract:
PURPOSE: A mold die for a WBGA(Wire Ball Grid Array) package and the WBGA package manufactured by using the same are provided to be capable of simply forming the first and second resin encapsulating part, easily controlling the height of the first resin encapsulating part, and preventing the damage of corner portions near to the back side of a semiconductor chip by simultaneously filling the first and second cavities using encapsulant and controlling the depth of the first cavity. CONSTITUTION: A mold die(190) is provided with a lower die(170) having the first cavities(172) corresponding to windows(122) and an upper die(180) having the second cavities(182) corresponding to a tape circuit board(120) located between semiconductor chips(110). At this time, the first and second resin encapsulating part are simultaneously formed by filling the first and second cavities of the molding die using liquid encapsulant.
Abstract:
PURPOSE: A thin wafer is provided to miniaturize the size of a single package and a stack package in which a plurality of semiconductor chips are stacked, by preventing a semiconductor substrate from being warped even when the thin wafer is reduced or expanded within a predetermined temperature scope and by minimizing the thickness of the semiconductor chip separated from the thin wafer. CONSTITUTION: An integrated circuit is formed on the front surface of a semiconductor substrate(110). A polyimide film(120) is coated on the front surface. A warpage correcting film is coated on the rear surface of the semiconductor substrate. The thermal expansion coefficient of the warpage correcting film corrects the degree of the warpage of the semiconductor substrate by using the difference of the thermal expansion coefficients between the polyimide film and the semiconductor substrate.
Abstract:
PURPOSE: A semiconductor chip, a manufacturing method thereof and a method of stacking the semiconductor chip are provided to cut a wafer with an etching and back-lap process instead of a sawing and back-lap process to reduce a thickness of the chip, and facilely electrically connect the chips when stacking the chips. CONSTITUTION: The device comprises a semiconductor substrate(120) having a desired thickness between an upper face and a lower face thereof; an internal metal wire(130) formed on an upper face of the semiconductor substrate and including an electrode pad(150); an insulation protecting film(140) formed on the upper face of the semiconductor substrate except the electrode pad; and an external metal wire(170) formed on the insulation protecting film. In the chip, the desired thickness is below 50 Um. A method of stacking the semiconductor chip comprises the steps of; preparing the plurality of semiconductor chips; bonding each chip on an upper face of other chip in order; and connecting each external metal wire at the side of the chip with a conductive interconnector.