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公开(公告)号：KR1020140050936A
公开(公告)日：2014-04-30
申请号：KR1020120117361
申请日：2012-10-22
Applicant: 삼성전자주식회사
Abstract: The present invention provides a photomask and a manufacturing method of the same. The photomask can minimize the change of CD on a light shielding pattern by not damaging the light shielding pattern in a washing process using ammonia water using an etching prevention film covering a side wall of the light shielding pattern. The photomask comprises: a transparent substrate; the light shielding pattern located on the transparent substrate, and at least containing molybdenum and silicon; and the etching prevention film covering at least the side surface of the light shielding pattern.
Abstract translation: 本发明提供一种光掩模及其制造方法。 光掩模可以通过使用覆盖遮光图案的侧壁的防蚀膜在使用氨水的洗涤过程中不损害遮光图案来最小化遮光图案上的CD的变化。 光掩模包括：透明基板; 所述遮光图案位于所述透明基板上，并且至少含有钼和硅; 以及至少覆盖遮光图案的侧面的防蚀膜。
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公开(公告)号：KR1020140065766A
公开(公告)日：2014-05-30
申请号：KR1020120132421
申请日：2012-11-21
Applicant: 삼성전자주식회사
Inventor： 오종근
IPC: G06Q50/30
CPC classification number: G06F17/30194 , G06F17/30893
Abstract: The present invention relates to a device and a method for providing a content upload service among different sites and, more specifically, to a device and a method for filing content posted in a web page of a site to be uploaded in other sites. A device for providing a service according to the present invention comprises: a communication unit for communicating with an external device through a network; and a file generation unit for generating a service file of the web page content provided from the outside. A method for providing a service according to the present invention includes the steps of: receiving a user′s personal web page from a first site server for providing the user′s personal web page; generating a service file for the personal web page received from the first site server; and uploading the generated service file in a second site server for providing the personal web page operated by the user.
Abstract translation: 本发明涉及一种用于在不同站点之间提供内容上传服务的装置和方法，更具体地说，涉及一种用于归档在要上传到其他站点的站点的网页中的内容的装置和方法。 根据本发明的用于提供服务的设备包括：通信单元，用于通过网络与外部设备进行通信; 以及文件生成单元，用于生成从外部提供的网页内容的服务文件。 根据本发明的用于提供服务的方法包括以下步骤：从第一站点服务器接收用户的个人网页以提供用户的个人网页; 生成从第一站点服务器接收的个人网页的服务文件; 以及将生成的服务文件上传到第二站点服务器中，以提供由用户操作的个人网页。
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公开(公告)号：KR1020110132660A
公开(公告)日：2011-12-09
申请号：KR1020100052109
申请日：2010-06-03
Applicant: 삼성전자주식회사 , 서울대학교산학협력단
IPC: H01L21/304
CPC classification number: B08B3/12 , G03F1/82 , H01L21/02057 , H01L21/67057
Abstract: PURPOSE: A megasonic cleaning method and device are provided to improve a surface washing effect by creating micro-cavities with high power which is offered from a bubbling creating part and to prevent the generation of faults in a pattern which is formed in a substrate. CONSTITUTION: A cleaning object is loaded(S10). A micro cavity for washing the cleaning object is created(S12). Micro cavities which have stable vibration by the cleaning object are only transferred to a loaded space(S14). Micro cavities which have unstable vibration are destroyed or eliminated when the cleaning object is transferred to the loaded space. Second power for maintaining the vibration of the micro cavity is provided(S16). The surface of the cleaning object is washed using micro cavities of the stable vibration(S18).
Abstract translation: 目的：提供一种兆声波清洗方法和装置，通过产生从发泡产生部分提供的高功率的微腔，并防止在衬底中形成的图案中产生缺陷，从而提高表面洗涤效果。 构成：加载清洁对象（S10）。 产生用于清洗清洁物体的微腔（S12）。 通过清洁对象具有稳定振动的微腔仅被传送到加载空间（S14）。 当清洁对象被传送到装载的空间时，具有不稳定振动的微腔被破坏或消除。 提供了维持微腔振动的第二功率（S16）。 使用稳定振动的微腔清洗清洁对象的表面（S18）。
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Patent Agency Ranking
公开(公告)号：KR1020150004619A
公开(公告)日：2015-01-13
申请号：KR1020130077847
申请日：2013-07-03
Applicant: 삼성전자주식회사
IPC: H01L21/027 , G03F1/20
CPC classification number: G03F1/48 , G03F1/54 , H01L21/0274 , G03F1/14 , G03F1/20 , G03F1/76 , G03F1/80
Abstract: 포토 마스크가 제공된다. 포토 마스크는, 투명 기판, 상기 기판 상에 형성된 마스크 패턴 및 상기 마스크 패턴의 양 측벽을 덮는 보호막 패턴을 포함하되, 상기 보호막 패턴의 상면은 노출된다.
Abstract translation: 本发明涉及具有提高产品可靠性的光掩模及其制造方法。 根据本发明的光掩模包括：透明基板; 掩模图案 以及覆盖掩模图案的两个侧壁的保护膜图案。 保护膜图案包括第一区域和第二区域。 第一区域比第二区域更靠近透明基板设置，第一区域的宽度可以比第二区域的宽度宽。
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公开(公告)号：KR1020120081654A
公开(公告)日：2012-07-20
申请号：KR1020100126890
申请日：2010-12-13
Applicant: 삼성전자주식회사
IPC: G03F1/76 , H01L21/027
CPC classification number: B82Y10/00 , G03F1/46 , G03F1/48 , G03F1/50 , G03F1/54 , G03F1/68 , G03F1/80 , G03F1/76 , H01L21/0274 , H01L21/0337
Abstract: PURPOSE: A photo-mask and a method for manufacturing the same are provided to improve the reliability of a semiconductor device manufacturing process by being repeatedly used without the line width change of patterns. CONSTITUTION: A method for manufacturing a photo-mask includes the following: a light shielding pattern(115) and a reflection preventive film pattern(125) are successively stacked on a transparent substrate(100). The light shielding pattern is based on at least one of chrome(Cr), aluminum(Al), rubidium(Ru), tantalum(Ta), tantalum boron oxide(TaBO), and tantalum boron nitride(TaBN). The sidewall of the light shielding pattern is oxidized and nitrided to form a protective film pattern(135) based on plasma treatment. The plasma treatment uses oxygen gas and nitrogen gas as reactive gas. The mixed ratio of the oxygen gas and the nitrogen gas is in a range between 5 and 8. The temperature of a chamber for the plasma treatment is kept in a range between 200 and 400 degrees Celsius.
Abstract translation: 目的：提供一种光掩模及其制造方法，以通过在没有图案的线宽变化的情况下重复使用来提高半导体器件制造工艺的可靠性。 构成：用于制造光掩模的方法包括以下：在透明基板（100）上依次层叠遮光图案（115）和防反射膜图案（125）。 遮光图案基于铬（Cr），铝（Al），铷（Ru），钽（Ta），钽氧化硼（TaBO）和钽氮化硼（TaBN）中的至少一种。 基于等离子体处理，遮光图案的侧壁被氧化并氮化以形成保护膜图案（135）。 等离子体处理使用氧气和氮气作为反应气体。 氧气和氮气的混合比在5和8之间。用于等离子体处理的室的温度保持在200和400摄氏度之间的范围内。
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公开(公告)号：KR101679721B1
公开(公告)日：2016-11-28
申请号：KR1020100126890
申请日：2010-12-13
Applicant: 삼성전자주식회사
IPC: G03F1/76 , H01L21/027
CPC classification number: B82Y10/00 , G03F1/46 , G03F1/48 , G03F1/50 , G03F1/54 , G03F1/68 , G03F1/80
Abstract: 투명기판상에순차적으로적층된차광막패턴과반사방지막패턴을형성한다. 차광막패턴의측벽을산화(oxidation) 및질화(nitridation)시킴으로써보호막패턴을형성한다. 보호막패턴을형성함으로써포토마스크제조공정에서사용되는산성용액에의해포토마스크패턴의선폭이감소되는것을방지할수 있다.
Abstract translation: 在制造光掩模图案的方法中，在透明基板上依次形成遮光层图案和抗反射层图案。 在遮光层图案的侧壁上进行氧化和氮化处理，以在遮光层图案的横向部分上形成保护层图案。
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公开(公告)号：KR101639635B1
公开(公告)日：2016-07-25
申请号：KR1020100052109
申请日：2010-06-03
Applicant: 삼성전자주식회사 , 서울대학교산학협력단
IPC: H01L21/304
CPC classification number: B08B3/12 , G03F1/82 , H01L21/02057 , H01L21/67057
Abstract: 메가소닉세정하는방법으로, 세정대상체와구분되는공간에서, 메가소닉에의해세정액을기전시켜마이크로공동들을생성시킨다. 생성된마이크로공동들중에서, 안정적인진동의마이크로공동들만을세정대상체가로딩된공간으로이동시킨다. 또한, 상기안정적인진동의마이크로공동들을이용하여상기세정대상체의표면을세정한다. 상기방법에의하면, 세정대상체내의패턴의손상을방지하면서세정대상체표면의파티클을효과적으로제거할수 있다.
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