Abstract:
본 발명의 일 실시 형태에 따른 반도체 발광소자는, 제1 도전형 반도체층, 활성층, 제2 도전형 반도체층을 구비하는 발광 구조물; 상기 발광 구조물 상에 구비되며, 상기 제1 도전형 반도체층 및 상기 제2 도전형 반도체층 상에 배치되는 제1 개구부를 구비하는 제1 절연층; 상기 제1 절연층 상에 구비되며, 상기 제1 개구부를 통해 상기 제1 도전형 반도체층 및 상기 제2 도전형 반도체층과 각각 전기적으로 접속되는 배리어 메탈층; 상기 배리어 메탈층 상에 구비되며, 상기 배리어 메탈층을 부분적으로 노출시키는 제2 개구부를 구비하는 제2 절연층; 및 상기 제2 개구부를 통해 부분적으로 노출되는 상기 배리어 메탈층 상에 구비되며, 상기 배리어 메탈층을 통해 상기 제1 도전형 반도체층 및 제2 도전형 반도체층과 각각 전기적으로 접속되는 전극을 포함하고, 상기 전극과 상기 발광 구조물 사이에는 상기 제1 및 제2 절연층 중 적어도 하나 및 상기 배리어 메탈층이 배치된다.
Abstract:
The present invention includes a method for forming a metal bonding layer that includes the steps of: forming a first bonding metal layer and a second bonding metal layer on one sides of a first object to be bonded and a second object to be bonded; arranging the second object to be bonded on the first object to be bonded in order for the first bonding metal layer and the second bonding metal layer to be in contact with each other; and forming an eutectic metal bonding layer by reacting the first bonding metal layer and the second bonding metal layer. At least one of the first bonding metal layer and the second bonding metal layer are formed to include a reaction delaying layer, which is made of metal or alloy for delaying the reaction between the first bonding metal layer and the second bonding metal layer.
Abstract:
PURPOSE: A composite substrate and a semiconductor light emitting device manufacturing method using the same are provided to stably grow a nitride semiconductor layer by controlling a thermal expansion coefficient of a first substrate equal to a thermal expansion coefficient of a semiconductor layer. CONSTITUTION: A composite substrate for a semiconductor light emitting device comprises a first substrate(110) and a second substrate(120). The first substrate comprises poly-crystal or amorphous materials. The second substrate formed on the first substrate comprises single crystal materials. A thermal expansion coefficient of the first substrate is controlled to make same as a thermal expansion coefficient of a semiconductor layer.
Abstract:
PURPOSE: A supporting wafer for a semiconductor light emitting device, a manufacturing method thereof, and a method for manufacturing a vertical semiconductor light emitting device are provided to form a metal oxide film on a side of a wafer, thereby protecting the supporting wafer from chemical materials. CONSTITUTION: A supporting wafer(110) is prepared. The supporting wafer is made of an alloy of a semiconductor material and metal. A metal oxide film(112) is formed on a side of the supporting wafer. The metal oxide film is formed by anodizing an alloy ingot of the semiconductor material and metal.
Abstract:
According to the present invention, a method for manufacturing a light emitting device package includes the steps of preparing a growth substrate having a plurality of light emitting devices formed on an upper surface thereof; preparing a first package substrate having a bonding pattern which is formed on an upper side thereof and corresponds to some of the light emitting devices; bonding the light emitting devices and the bonding pattern after placing an upper surface of the growth substrate and an upper surface of the first package substrate to face each other; separating the light emitting devices from the growth substrate; and packaging the light emitting devices bonded to the bonding pattern.
Abstract:
PURPOSE: A supporting wafer for a semiconductor light emitting device, a manufacturing method thereof, and the manufacturing method of a vertical structure semiconductor light emitting device using the same are provided to prevent the generation of a defect due to thermal expansion coefficient mismatch in bonding or the heat processing time by controlling a thermal expansion coefficient according to content of Si and metal. CONSTITUTION: A barrier layer(114) is composed of a semiconductor material and metal alloy. At least one side between upper side and lower side of the barrier layer is composed of chemically stable metal. The side(112) of a supporting wafer(110) is surface-treated so that a metallic component does not be exposed. A first conductivity type semiconductor layer, an active layer, and a second electrical conduction semiconductor layer are successively formed in the top of a substrate. The supporting wafer is welded on the second electrical conduction semiconductor layer.
Abstract:
PURPOSE: A semiconductor light emitting device and a manufacturing method thereof are provided to bend the boundary surface between a second electrode exposure area and a semiconductor laminate, thereby preventing lowering of the leakage feature of a light emitting device. CONSTITUTION: A semiconductor laminate comprises first and the second major surfaces which face each other. The semiconductor laminate includes a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer. A connecting fixture is connected from the second major surface to one side of the first conductive semiconductor layer. A first electrode layer is connected to one side of the first conductive semiconductor layer through the connection fixture. A second electrode layer is formed on the second major surface of the semiconductor laminate.