Abstract:
본 발명은 뉴로모픽 장치에 관한 것으로, 각각은 뉴런의 주소를 고유적으로 가지는 복수의 뉴런들을 포함하는 뉴런 블록부, 각각은 시냅스 주소를 고유적으로 가지는 복수의 시냅스들을 포함하는 시냅스 블록부 및 상기 시냅스 주소 중 제1 시냅스 주소를 기초로 분할되고, 각각은 상기 시냅스 주소 중 제2 시냅스 주소를 기초로 인덱싱되며 프리시냅틱 뉴런과 포스트시냅틱 뉴런의 주소들로 구성된 전후 뉴런 엘리먼트를 포함하는 복수의 병렬 LUT 모듈들을 포함하는 토폴로지 블록부를 포함한다.
Abstract:
PURPOSE: A method for a thin film growth is provided to improve the mobility of a carrier and a light scattering effect by improving a surface particle size and surface roughness of a thin film. CONSTITUTION: In a device, nuclei of the crystal grains having the various crystal growth direction are formed on the top of a substrate. First crystal particles having a first crystal growth direction(100) are preferentially grown up in order to form a first texture. Second crystal particles having a second crystal growth direction(111) are preferentially grown up in order to form a second texture. The area of surface of the second crystal particle is bigger than that of the first crystal particle.
Abstract:
PURPOSE: An optical recording medium having a super-resolution structure for improvement of reproduction stability and low band noise characteristic are provided to prevent degradation of reproduction characteristic resulting from the diffusion of gas which forms a bubble recording mark. CONSTITUTION: An optical recording medium having a super-resolution structure comprises a plurality of layers formed on the top of a substrate, including a recorded layer(308) and a super-resolution layer(318). The recorded layer contains a material whose decomposition temperature is higher than regeneration temperature and does not form a bubble recording mark in recording. The super-resolution layer is composed of chalcogenide semiconductor material containing one or more selected from nitrogen(N), oxygen(O), carbon(C) and boron(B).
Abstract:
A super-resolution material and a high density optical information storage medium using the same are provided to include at least one selected from a group consisting of a semiconductor material, nitrogen, oxygen, carbon, and boron. A super-resolution material for playing and recording optical information includes more than one selected from a group consisting of a semiconductor material by which light is absorbed in a wavelength range of incident light so that light transmission is increased according to heat, nitrogen, oxygen, carbon, and boron.
Abstract:
PURPOSE: A color image sensor is provided to reduce the size of a pixel by composing the pixel with one optical diode. CONSTITUTION: A photosensitive device(100) includes a lower electrode, an upper electrode, and a chalcogenide material. The chalcogenide material is located between the lower electrode and the upper electrode. Image sensing circuits(200,300,410,420,510,520) measure the strength or wavelength of incident light based on an electric property value generated in the photosensitive device.
Abstract:
PURPOSE: A micro-actuator with large displacement and high operation speed and a manufacturing method thereof are provided to prevent the chemical reaction between a substrate and phase change films by forming a buffer between the substrate and phase change films. CONSTITUTION: In a micro-actuator with large displacement and high operation speed and a manufacturing method thereof, a substrate(10) is prepared. A buffer film is deposited in a substrate through a sputtering and evaporation deposition. A phase change film(30) is deposited the buffer layer(20) by using sputtering or the evaporation deposition on A protective insulating film(40) is evaporated on the phase change film. A current pulse supply unit supplies thermal energy to induce the phase change of the phase change film.
Abstract:
본 발명은 고밀도 광 정보 재생 및 기록용 초해상 재료에 관한 것으로서, 입사광의 파장 영역에서 광의 흡수 및 가열에 따라 광 투과도가 증가하는 특성을 갖는 반도체 물질, 및 질소, 산소, 탄소 및 붕소 중에서 선택되는 1종 이상의 원소를 포함하는 본 발명에 따른 초해상 재료는 작은 결정립의 안정한 미세조직을 가지며 열전도도가 작아서 레이저 파워의 감소와 함께 높은 신호대 잡음비, 그리고 반복 재생 또는 기록에 대한 내구특성의 향상이 기대되어 하나 또는 그 이상의 정보저장층을 갖는 재생전용형 또는 한번쓰기형 또는 되쓰기형 광 정보저장매체에 효과적으로 적용할 수 있다. 광디스크, 초해상, 반도체, 칼코지나이드(chalcogenide), 열전도도
Abstract:
According to the present invention, provided is a method for manufacturing an ovonic threshold switching device with an N-doped chalcogenide material and the ovonic threshold switching device manufactured thereby. The method for manufacturing the ovonic threshold switching device with the N-doped chalcogenide material includes the steps of forming an insulation layer on a substrate; forming a first electrode on the insulation layer; forming a chalcogenide material including N, Ge, and Se on the first electrode; and forming a second electrode on the chalcogenide material.