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公开(公告)号：KR101117199B1
公开(公告)日：2012-03-07
申请号：KR1020090124537
申请日：2009-12-15
Applicant: 한국전기연구원
IPC: H01L21/68 , H01L21/027 , G03F7/20
CPC classification number: G03F7/70716 , G03F7/24 , G03F7/703 , G03F7/70725 , G03F7/70758 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/70841 , H01L21/68
Abstract: 본발명은자기부상원리로원통을부상하여비접촉으로회전및 축방향으로이송시키면서원통표면에직접나노미터크기의패턴을새길수 있는새로운형태의스테이지와원통표면에빛을조사하는광원을구현함으로써, 나노미터크기의오차로위치를능동제어할수 있는등 기계가공에의한오차및 외란을실시간적으로보정할수 있고, 결국대형크기의원통표면에나노미터크기의패턴을효율적으로가공할수 있는한편, 스테이지와조합되어광원과원통표면사이를부분적으로진공환경이유지되도록하는차동진공수단을구현함으로써, X선이나전자빔, 그리고극자외선(EUV)과같은광원을적용할수 있는원통형자기부상스테이지및 노광장치를제공한다.
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公开(公告)号：KR101264224B1
公开(公告)日：2013-05-14
申请号：KR1020100138525
申请日：2010-12-30
Applicant: 한국전기연구원
IPC: H01L21/68 , H01L21/02 , H01L21/027
CPC classification number: H02K7/09 , H02K16/00 , H02K21/12 , H02K41/031 , H02K2201/15 , H02K2201/18
Abstract: 본발명은원통형자기부상스테이지에관한것으로서, 원통의부상이이루어지는수직방향(상하방향), 직선이송방향이되는축방향, 그리고원통의회전방향과더불어, 원통단면상좌우방향이되는수평방향으로도원통의위치를정밀하게제어할수 있는원통형자기부상스테이지를제공하는데주된목적이있는것이다. 상기한목적을달성하기위해, 원통금형에일체로장착되고영구자석배열체를구비하여영구자석배열체와하기베이스부의전자석배열체간 상호작용에의한자기부상력, 자기회전력, 자기이송력에의해부상하여비접촉식으로회전및 직선이송이가능한원통이동부와; 전자석배열체를구비하고상기원통이동부의하측으로배치되어비접촉으로원통이동부를회전및 직선이송가능하게지지하는베이스부와; 상기원통이동부의측방으로배치되고전자석배열체를구비하여상기전자석배열체와원통이동부의영구자석배열체간 상호작용에의해발생하는수평이송력으로원통이동부및 원통금형의수평방향위치를제어하는수평자기부상보조부;를포함하여구성되는원통형자기부상스테이지가개시된다.
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公开(公告)号：KR1020110067790A
公开(公告)日：2011-06-22
申请号：KR1020090124537
申请日：2009-12-15
Applicant: 한국전기연구원
IPC: H01L21/68 , H01L21/027 , G03F7/20
CPC classification number: G03F7/70716 , G03F7/24 , G03F7/703 , G03F7/70725 , G03F7/70758 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/70841 , H01L21/68 , G03F7/709
Abstract: PURPOSE: A cylindrical magnetic levitation stage and a lithography are provided to efficiency process a pattern of a nano size on the surface of a cylinder by actively controlling the position of the device with error tolerance of several nano meters. CONSTITUTION: In a cylindrical magnetic levitation stage and a lithography, a rotation cylindrical driving unit and a liner transfer cylinder driving unit(13) support a cylindrical mold from both sides and is rotated or linearly moved through a magnetic levitation force and magnetic transfer force. a rotation cylindrical fixing unit and a liner transfer cylinder fixing unit are arranged under the rotation cylindrical driving unit and a liner transfer cylinder driving unit and supports the cylindrical driving unit with contactless. A magnet array and an electromagnetic array are mutually reacted to generate the magnetic levitation force and magnetic transfer force.
Abstract translation: 目的：提供圆柱形磁悬浮台和光刻技术，以通过主动控制具有几纳米误差的装置的位置来有效地处理气缸表面上的纳米尺寸图案。 构成：在圆柱形磁悬浮台和光刻中，旋转圆柱形驱动单元和衬垫传动滚筒驱动单元（13）从两侧支撑圆柱形模具，并通过磁悬浮力和磁力传递力旋转或线性移动。 旋转圆柱形固定单元和衬里传送圆筒固定单元布置在旋转圆柱形驱动单元和衬垫传送滚筒驱动单元的下面，并且支撑具有非接触式的圆柱形驱动单元。 磁体阵列和电磁阵列相互反应，产生磁悬浮力和磁力传递力。
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公开(公告)号：KR1020120076805A
公开(公告)日：2012-07-10
申请号：KR1020100138525
申请日：2010-12-30
Applicant: 한국전기연구원
IPC: H01L21/68 , H01L21/02 , H01L21/027
CPC classification number: H02K7/09 , H02K16/00 , H02K21/12 , H02K41/031 , H02K2201/15 , H02K2201/18 , H01L21/682 , G03F7/70716 , G03F7/70775 , G03F9/7003 , H01L21/02027 , H01L21/0274
Abstract: PURPOSE: A cylindrical magnetic levitation stage is provided to directly process a pattern of nanometer size on the cylinder surface of large size by actively controlling the location of a cylinder with an error of the nanometer size. CONSTITUTION: A cylinder movable unit is composed of a rotary cylinder movable unit(110b) and a linear transfer cylinder movable unit(110a). A base unit supports the cylinder movable unit which can be rotated without contact. The base unit comprises electromagnet arrangement bodies(122a, 123a, 122b, 123b). A horizontal magnetic levitation auxiliary unit(140) controls the horizontal direction location of a cylinder mold and the cylinder movable unit. The horizontal magnetic levitation auxiliary unit comprises an electromagnet arrangement body(141).
Abstract translation: 目的：提供圆柱形磁悬浮台，通过主动控制圆柱体的位置，以纳米尺寸的误差直接处理大尺寸圆柱体表面的纳米尺寸图案。 构成：缸体可动单元由旋转圆筒可动单元（110b）和直线传动滚筒活动单元（110a）构成。 基座单元支撑可旋转而不接触的气缸可动单元。 基座单元包括电磁铁排列体（122a，123a，122b，123b）。 水平磁悬浮辅助单元（140）控制气缸模具和气缸活动单元的水平方向位置。 水平磁悬浮辅助单元包括电磁体排列体（141）。
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