公开(公告)号：KR101448199B1

公开(公告)日：2014-10-08

申请号：KR1020130090248

申请日：2013-07-30

Applicant: 한국표준과학연구원

Inventor： 박인용 ,  안상정 ,  조복래 ,  한철수 ,  박창준 ,  김주황 ,  허인혜

IPC: H01J37/252 ,  H01L21/66

Abstract: The present invention relates to a method for cleaning a metal tip used as a probe for a scanning probe microscope or a source for a particle beam under ultra-high vacuum. Provided is the method for cleaning the metal tip which includes the steps of: a) maintaining vacuum with a pressure of 10^-7 mbar in a chamber including the metal tip; b) introducing nitrogen gas into the chamber; and c) applying a positive voltage to the metal tip in the chamber to which the nitrogen gas is introduced.

Abstract translation: 本发明涉及一种在超高真空下清洗用作扫描探针显微镜或粒子束源的金属尖端的方法。 提供了用于清洁金属尖端的方法，其包括以下步骤：a）在包括金属尖端的室中保持10 ^ -7毫巴的压力的真空; b）将氮气引入室内; 以及c）向导入氮气的室中的金属尖端施加正电压。