Abstract:
A jettable etchant composition includes 1 to 90 wt% active ingredient, and a remainder containing any combination of the following: 10 to 90 wt% solvent, 0 to 10 wt% reducing agents,
Abstract:
A jettable etchant composition includes 1 to 90 wt% active ingredient, and a remainder containing any combination of the following: 10 to 90 wt% solvent, 0 to 10 wt% reducing agents,
Abstract:
Materials for die attachment such as silver sintering films may include reinforcing, modifying particles for enhanced performance. Methods for die attachment may involve the of such materials.
Abstract:
Particles and particle films are provided. In certain examples, particles produced from a single phase process may be used to provide industrial scale synthesis of particles for use in devices such as printed wiring boards. The particles, in particular silver particles are produced by a process comprising, mixing a metal or a metal salt with a capping agent in a single phase solution; and adding a reducing agent to the single phase solution to produce capped nanoparticles.
Abstract:
Un método para producir una placa de circuito impreso que comprende: un sustrato; y al menos un patrón conductor de alta relación de aspecto dispuesto sobre el sustrato, caracterizado por que el patrón conductor de alta relación de aspecto tiene una altura que es al menos cinco veces mayor que la anchura, y por que el método comprende: imprimir un material conductor entre una separación definida de un soporte polimérico sobre el sustrato; imprimir el material de soporte polimérico sobre el soporte polimérico; imprimir material conductor adicional entre la separación definida del soporte polimérico; sinterizar el material conductor; y después de la sinterización, retirar el soporte polimérico para proporcionar el patrón conductor de alta relación de aspecto.
Abstract:
A sintering powder comprising:a particulate having a mean longest diameter of less than 10 microns, wherein at least some of the particles forming the particulate comprise a metal at least partially coated with a capping agent.
Abstract:
A silver film for die attachment in the field of microelectronics, wherein the silver film is a multilayer structure comprising a reinforcing silver foil layer between two layers of sinterable particles. Each layer of sinterable particles comprises a mixture of sinterable silver particles and reinforcing particles. The reinforcing particles comprise glass and/or carbon and/or graphite particles. A method for die attachment using a silver film.
Abstract:
A jettable etchant composition includes 1 to 90 wt % active ingredient, and a remainder containing any combination of the following: 10 to 90 wt % solvent, 0 to 10 wt % reducing agents,