公开(公告)号：WO2021005067A1

公开(公告)日：2021-01-14

申请号：PCT/EP2020/069139

申请日：2020-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： JAVAHERI, Narjes ,  VAN DER SCHAAR, Maurits ,  CHANG, Tieh-Ming ,  BOS, Hilko, Dirk ,  WARNAAR, Patrick ,  BAHRAMI, Samira ,  HAJIAHMADI, Mohammadreza ,  TARABRIN, Sergey ,  SEMKIV, Mykhailo

IPC: G03F7/20 ,  G01B11/06

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.