公开(公告)号：WO2020126266A1

公开(公告)日：2020-06-25

申请号：PCT/EP2019/081887

申请日：2019-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： SOKOLOV, Sergei ,  TARABRIN, Sergey ,  CHENG, Su-Ting ,  KOOLEN, Armand, Eugene, Albert ,  EURLINGS, Markus, Franciscus, Antonius ,  SCHREEL, Koenraad, Remi, André, Maria

IPC: G03F7/20

Abstract: The disclosure relates to measuring a parameter of a patterning process. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.

公开(公告)号：WO2019086221A1

公开(公告)日：2019-05-09

申请号：PCT/EP2018/077598

申请日：2018-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： TARABRIN, Sergey ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20 ,  G01N21/956

Abstract: Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.

公开(公告)号：WO2022263231A1

公开(公告)日：2022-12-22

申请号：PCT/EP2022/065395

申请日：2022-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： TARABRIN, Sergey

IPC: G03F7/20 ,  G01N21/95 ,  G02B21/10 ,  G03H1/08

Abstract: Disclosed is a dark-field interferometric microscope and associated microscopy method. The microscope comprises an object branch being operable to propagate object radiation onto a sample and collect resultant scattered radiation from said sample and a reference branch being operable to propagate reference radiation. The object radiation and said reference radiation are mutually pointwise spatially coherent. A filter arrangement removes a zeroth order component from said scattered radiation to provide filtered scattered radiation; and a detection arrangement detects an interferometric image from interference of said filtered scattered radiation and reference radiation.

公开(公告)号：WO2020141049A1

公开(公告)日：2020-07-09

申请号：PCT/EP2019/084684

申请日：2019-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： REHMAN, Samee, Ur ,  TSIATMAS, Anagnostis ,  TARABRIN, Sergey ,  MC NAMARA, Elliott, Gerard ,  HINNEN, Paul, Christiaan

IPC: G03F7/20 ,  H01L21/66

Abstract: A method to calculate a model of a metrology process including receiving a multitude of SEM measurements of a parameter of a semiconductor process, receiving a multitude of optical measurements of the parameter of a semiconductor process, determining a model of a metrology process wherein the optical measurements of the parameter of semiconductor process are mapped to the SEM measurements of the parameter of the semiconductor process using a regression algorithm.

公开(公告)号：WO2019081211A1

公开(公告)日：2019-05-02

申请号：PCT/EP2018/077594

申请日：2018-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  PANDEY, Nitesh ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  TARABRIN, Sergey ,  BOS, Hilko, Dirk

IPC: G03F7/20 ,  G03F1/24

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.

公开(公告)号：WO2019048342A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/073413

申请日：2018-08-31

Applicant: ASML NETHERLANDS B.V.

Inventor： TARABRIN, Sergey

IPC: G03F7/20

Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.

公开(公告)号：WO2021005067A1

公开(公告)日：2021-01-14

申请号：PCT/EP2020/069139

申请日：2020-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： JAVAHERI, Narjes ,  VAN DER SCHAAR, Maurits ,  CHANG, Tieh-Ming ,  BOS, Hilko, Dirk ,  WARNAAR, Patrick ,  BAHRAMI, Samira ,  HAJIAHMADI, Mohammadreza ,  TARABRIN, Sergey ,  SEMKIV, Mykhailo

IPC: G03F7/20 ,  G01B11/06

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.

公开(公告)号：WO2019228746A1

公开(公告)日：2019-12-05

申请号：PCT/EP2019/061201

申请日：2019-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： LIAN, Jin ,  ZHOU, Zili ,  AKBULUT, Duygu ,  TARABRIN, Sergey

IPC: G03F7/20

Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.

公开(公告)号：WO2019201697A1

公开(公告)日：2019-10-24

申请号：PCT/EP2019/059049

申请日：2019-04-10

Applicant: ASML NETHERLANDS B.V.

Inventor： REHMAN, Samee, Ur ,  TSIATMAS, Anagnostis ,  TARABRIN, Sergey ,  VENSELAAR, Joannes, Jitse ,  MEDVEDYEVA, Mariya, Vyacheslavivna ,  ONOSE, Alexandru

IPC: G03F7/20

Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.

公开(公告)号：WO2018046227A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070376

申请日：2017-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： TARABRIN, Sergey ,  HASTINGS, Simon, Philip, Spencer ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20

Abstract: Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements.

Abstract translation: 公开了一种确定衬底上的目标的特性的方法以及相应的度量装置和计算机程序。 该方法包括从包括目标的第一图像中的第一图像像素和目标的第二图像中的第二图像像素的互补像素对确定多个强度不对称测量。 第一图像是从目标散射的第一辐射获得的，第二图像是从目标散射的第二辐射获得的，第一辐射和第二辐射包括互补的非零衍射级。 然后从所述多个强度不对称测量中确定目标的特性。