公开(公告)号：WO2019115426A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/084100

申请日：2018-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LA FONTAINE, Bruno ,  VAN OOSTEN, Anton, Bernhard ,  CHEONG, Lin, Lee ,  GENIN, Maxime, Philippe, Frederic

IPC: G06F17/18 ,  G03F7/20 ,  G03F9/00 ,  G01N21/95 ,  H01L21/66 ,  G06K9/62

Abstract: A method including: obtaining a value of a characteristic of a physical item instance of a physical system or object, using a non-probabilistic model; obtaining an attribute of a distribution of a residue of the non-probabilistic model with respect to an ensemble of physical item instances that is based on an attribute of a distribution of a residue of the non-probabilistic model with respect to at least one physical item instance corresponding to at least one physical item type of the ensemble; determining an attribute of a distribution of the characteristic based on the attribute of the distribution of the residue with respect to an ensemble of physical item instances and on the value of the characteristic of the physical item instance; and determining a probability that the physical item instance is out of specification, based on the attribute of the distribution of the characteristic.

公开(公告)号：WO2019011604A1

公开(公告)日：2019-01-17

申请号：PCT/EP2018/066394

申请日：2018-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEONG, Lin, Lee ,  LA FONTAINE, Bruno ,  KEA, Marc, Jurian ,  YUDHISTIRA, Yasri ,  GENIN, Maxime, Philippe, Frederic

IPC: G03F7/20

Abstract: A method including obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based on the verified values and the computed values; and obtaining an attribute of a distribution of the residue based on the values of the residue. Also disclosed herein are methods of computing a probability of defects on a substrate produced by the device manufacturing process, and of obtaining an attribute of a distribution of the residue of a non-probabilistic model.

公开(公告)号：WO2017194281A1

公开(公告)日：2017-11-16

申请号：PCT/EP2017/059328

申请日：2017-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： SU, Jing ,  ZOU, Yi ,  LIN, Chenxi ,  HUNSCHE, Stefan ,  JOCHEMSEN, Marinus ,  LU, Yen-Wen ,  CHEONG, Lin, Lee

IPC: G03F7/20 ,  G06K9/00 ,  G06F17/50

Abstract: Disclosed herein are various methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the characteristics under that process condition, whether that hot spot is defective; obtaining characteristics of each of the process conditions; obtaining characteristics of each of the hot spots; and training a machine learning model using a training set comprising the characteristics of one of the process conditions, the characteristics of one of the hot spots, and whether that hot spot is defective under that process condition.

Abstract translation: 这里公开了使用机器学习模型从设计布局识别热点或预测设计布局中的模式是否有缺陷的各种方法。 本文公开的示例方法包括分别在设备制造过程中的多个过程条件下分别获得热点性能的特征组; 基于在该处理条件下的特性，针对每个处理条件确定每个热点的热点是否有缺陷; 获得每个工艺条件的特性; 获得每个热点的特征; 并且使用训练集训练机器学习模型，所述训练集包括过程条件之一的特征，其中一个热点的特征以及在该过程条件下该热点是否有缺陷。

公开(公告)号：WO2017080729A1

公开(公告)日：2017-05-18

申请号：PCT/EP2016/074017

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEONG, Lin, Lee ,  HUANG, Wenjin ,  LA FONTAINE, Bruno

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70625

Abstract: A method including: determining a value of a characteristic of a patterning process or a product thereof, at a current value of a processing parameter; determining whether a termination criterion is met by the value of the characteristic; if the termination criterion is not met, determining, by a computer, a new value of the processing parameter from the current value of the processing parameter and a prior value of the processing parameter, and setting the current value to the new value and repeating the determining steps; and if the termination criterion is met, providing the current value of the processing parameter as an approximation of a value of the processing parameter at which the characteristic has a target value.

Abstract translation: 一种方法，包括：在处理参数的当前值处确定图案化处理或其产品的特性的值; 确定特征值是否满足终止标准; 如果不满足终止标准，则由计算机从处理参数的当前值和处理参数的先前值确定处理参数的新值，并且将当前值设置为新值并且重复 确定步骤; 并且如果满足终止标准，则提供处理参数的当前值作为特征具有目标值的处理参数的值的近似值。