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公开(公告)号：WO2021037827A1
公开(公告)日：2021-03-04
申请号：PCT/EP2020/073704
申请日：2020-08-25
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Yixiang , LIU, Shibing , CAO, Shanhui , QIU, Kangsheng , DOU, Juying , LUO, Ying , LI, Yinglong , LI, Qiang , VAN DER WILK, Ronald , VAN DER TOORN, Jan-Gerard, Cornelis
IPC: H01J37/317 , H01J37/20 , H01L21/683
Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
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公开(公告)号：WO2021156387A1
公开(公告)日：2021-08-12
申请号：PCT/EP2021/052705
申请日：2021-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： FU, Chenxi , DI, Long , KUINDERSMA, Lucas , TSENG, Kuo-Feng , HEMPENIUS, Peter, Paul , LIU, Yu , LUO, Ying
IPC: H01J41/12 , F16L23/032
Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.
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公开(公告)号：WO2023083573A1
公开(公告)日：2023-05-19
申请号：PCT/EP2022/079037
申请日：2022-10-19
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Shaoqian , HEMPENIUS, Peter, Paul , LUO, Ying , ALJANAIDEH, Omar
Abstract: Systems, apparatuses, and methods for reducing vibration of a chamber may include obtaining predefined motion data associated with a transferring device stiffly coupled to a chamber; determining movement of the transferring device based on the predefined motion data before the transferring device moves; determining, based on the movement, a first force to be applied to the chamber caused by the movement; and causing a support device of the chamber to apply a second force to the chamber to counteract the first force when the transferring device moves.
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Patent Agency Ranking4.发明申请
公开(公告)号：WO2021185939A1
公开(公告)日：2021-09-23
申请号：PCT/EP2021/056890
申请日：2021-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Yixiang , LIU, Shibing , LUO, Ying
IPC: H01J37/20 , H01L21/683
Abstract: An electrostatic chuck control system configured to be utilized during an inspection process of a wafer, the electrostatic chuck control system comprising an electrostatic chuck of a stage configured to be undocked during the inspection process, wherein the electrostatic chuck comprises a plurality of components configured to influence an interaction between the wafer and the electrostatic chuck during the inspection process, a first sensor configured to generate measurement data between at least some of the plurality of components and the wafer, and a controller including circuitry configured to receive the measurement data to determine characteristics of the wafer relative to the electrostatic chuck and to generate adjustment data to enable adjusting, while the stage is undocked, at least some of the plurality of components based on the determined characteristics.
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公开(公告)号：WO2020136094A2
公开(公告)日：2020-07-02
申请号：PCT/EP2019/086459
申请日：2019-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： LUO, Ying , DONG, Zhonghua , YIN, Xuehui , DI, Long , DENG, Nianpei , FANG, Wei , PU, Lingling , FEI, Ruochong , ZHU, Bohang , LIU, Yu
IPC: H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 k Hz to 50 k Hz, and 50 k Hz to 200 k Hz, respectively.
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公开(公告)号：WO2020126963A1
公开(公告)日：2020-06-25
申请号：PCT/EP2019/085233
申请日：2019-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER TOORN, Jan-Gerard, Cornelis , HUINCK, Jeroen, Gertruda, Antonius , SEVERT, Han, Willem, Hendrik , KOOIKER, Allard, Eelco , RONDE, Michaël, Johannes, Christiaan , WELLINK, Arno, Maria , LIU, Shibing , LUO, Ying , WANG, Yixiang , CHEN, Chia-Yao , ZHU, Bohang , VAN SOEST, Jurgen
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：WO2020136094A3
公开(公告)日：2020-07-02
申请号：PCT/EP2019/086459
申请日：2019-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： LUO, Ying , DONG, Zhonghua , YIN, Xuehui , DI, Long , DENG, Nianpei , FANG, Wei , PU, Lingling , FEI, Ruochong , ZHU, Bohang , LIU, Yu
IPC: H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
Abstract: A charged-particle beam system (300) is disclosed. The charged- particle beam system comprises a stage (201) configured to hold a sample (203) and is movable in at least one of X-Y-Z axes. The charged-particle beam system further comprises a position sensing system (350,340) to determine a lateral and vertical displacement of the stage, and a beam deflection controller (367) configured to apply a first signal to deflect a primary charged-particle beam (330) incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively. Further, a non-transitory computer readable medium is disclosed, comprising a set of instructions for causing an apparatus (300) to perform a method, the apparatus including a charged-particle source (310) to generate a primary charged-particle beam (314,330), the method comprising determining a lateral displacement of a stage (201), wherein the stage is movable in at least one of X-Y axes; and instructing a controller (367) to apply a first signal to deflect the primary charged-particle beam incident on a sample (203) to at least partly compensate for the lateral displacement
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公开(公告)号：EP3899665A1
公开(公告)日：2021-10-27
申请号：EP19828649.4
申请日：2019-12-16
Applicant: ASML Netherlands B.V.
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