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公开(公告)号：WO2020136094A3
公开(公告)日：2020-07-02
申请号：PCT/EP2019/086459
申请日：2019-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： LUO, Ying , DONG, Zhonghua , YIN, Xuehui , DI, Long , DENG, Nianpei , FANG, Wei , PU, Lingling , FEI, Ruochong , ZHU, Bohang , LIU, Yu
IPC: H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
Abstract: A charged-particle beam system (300) is disclosed. The charged- particle beam system comprises a stage (201) configured to hold a sample (203) and is movable in at least one of X-Y-Z axes. The charged-particle beam system further comprises a position sensing system (350,340) to determine a lateral and vertical displacement of the stage, and a beam deflection controller (367) configured to apply a first signal to deflect a primary charged-particle beam (330) incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively. Further, a non-transitory computer readable medium is disclosed, comprising a set of instructions for causing an apparatus (300) to perform a method, the apparatus including a charged-particle source (310) to generate a primary charged-particle beam (314,330), the method comprising determining a lateral displacement of a stage (201), wherein the stage is movable in at least one of X-Y axes; and instructing a controller (367) to apply a first signal to deflect the primary charged-particle beam incident on a sample (203) to at least partly compensate for the lateral displacement
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2.发明申请
公开(公告)号：WO2023088623A1
公开(公告)日：2023-05-25
申请号：PCT/EP2022/078928
申请日：2022-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： JIN, Shengcheng , PU, Lingling , YU, Liangjiang
Abstract: Apparatuses, systems, and methods for providing beams for defect detection and defect location identification associated with a sample of charged particle beam systems. In some embodiments, a method may include obtaining an image of a sample; determining defect characteristics from the image; generating an updated image based on the determined defect characteristics and the image; and aligning the updated image with a reference image.
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3.发明申请
公开(公告)号：WO2023083559A1
公开(公告)日：2023-05-19
申请号：PCT/EP2022/078619
申请日：2022-10-14
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUBEN, Tim , PISARENCO, Maxim , HUISMAN, Thomas, Jarik , PU, Lingling , ZHOU, Jian , YU, Liangjiang , CHANG, Yi-Hsin , YEH, Yun- Ling
Abstract: Systems and methods for image analysis include obtaining a plurality of simulation images and a plurality of non-simulation images both associated with a sample under inspection, at least one of the plurality of simulation images being a simulation image of a location on the sample not imaged by any of the plurality of non-simulation images; and training an unsupervised domain adaptation technique using the plurality of simulation images and the plurality of non-simulation images as inputs to reduce a difference between first intensity gradients of the plurality of simulation images and second intensity gradients of the plurality of non-simulation images.
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公开(公告)号：WO2020136094A2
公开(公告)日：2020-07-02
申请号：PCT/EP2019/086459
申请日：2019-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： LUO, Ying , DONG, Zhonghua , YIN, Xuehui , DI, Long , DENG, Nianpei , FANG, Wei , PU, Lingling , FEI, Ruochong , ZHU, Bohang , LIU, Yu
IPC: H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 k Hz to 50 k Hz, and 50 k Hz to 200 k Hz, respectively.
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公开(公告)号：WO2023280489A1
公开(公告)日：2023-01-12
申请号：PCT/EP2022/065219
申请日：2022-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： LIANG, Haoyi , CHEN, Yani , YANG, Ming-Yang , YANG, Yang , HUANG, Xiaoxia , CHEN, Zhichao , YU, Liangjiang , WANG, Zhe , PU, Lingling
Abstract: Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a clustering technique, N first feature descriptor(s) for L first pixel(s) in the first image and M second feature descriptor(s) for L second pixel(s) in the second image, wherein each of the L first pixel(s) is co-located with one of the L second pixel(s), and L, M, and N are positive integers; determining K mapping probability between a first feature descriptor of the N first feature descriptor(s) and each of K second feature descriptor(s) of the M second feature descriptor(s), wherein K is a positive integer; and providing an output for determining whether there is existence of an abnormal pixel representing a candidate defect on the sample based on a determination that one of the K mapping probability does not exceed a threshold value.
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Patent Agency Ranking
公开(公告)号：WO2021224435A1
公开(公告)日：2021-11-11
申请号：PCT/EP2021/062087
申请日：2021-05-06
Applicant: ASML NETHERLANDS B.V.
Inventor： FANG, Wei , FEI, Ruochong , PU, Lingling , ZHOU, Wentian , YU, Liangjiang , WANG, Bo
Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.
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公开(公告)号：WO2020212107A1
公开(公告)日：2020-10-22
申请号：PCT/EP2020/058491
申请日：2020-03-26
Applicant: ASML NETHERLANDS B.V.
Inventor： FANG, Wei , PU, Lingling , CHEN, Zhichao , ZHANG, Haili , ZHANG, Pengcheng
IPC: G03F1/36 , G01N21/956 , G03F1/84 , G03F7/20
Abstract: Described herein is a method for determining corrections to features of a mask. The method includes obtaining (i) a pattern group for a design layout, and (ii) defect inspection data of a substrate imaged using the mask used in the patterning process for the design layout; determining, based on the defect inspection data, a defect map associated with the pattern group, wherein the defect map comprises locations of assist features having a relatively higher probability of being printed on the substrate compared to other patterns of the design layout; and determining, via simulating an optical proximity correction process using data associated with the defect map, corrections to the features of the mask.
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公开(公告)号：WO2020043525A1
公开(公告)日：2020-03-05
申请号：PCT/EP2019/072105
申请日：2019-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor： PU, Lingling , FANG, Wei , ZHAO, Nan , ZHOU, Wentian , WANG, Teng , XU, Ming
Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
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公开(公告)号：WO2023280487A1
公开(公告)日：2023-01-12
申请号：PCT/EP2022/065032
申请日：2022-06-02
Applicant: ASML NETHERLANDS B.V.
Inventor： LIANG, Haoyi , CHEN, Zhichao , PU, Lingling , CHANG, Fang-Cheng , YU, Liangjiang , WANG, Zhe
Abstract: An improved systems and methods for correcting distortion of an inspection image are disclosed. An improved method for correcting distortion of an inspection image comprises acquiring an inspection image, aligning a plurality of patches of the inspection image based on a reference image corresponding to the inspection image, evaluating, by a machine learning model, alignments between each patch of the plurality of patches and a corresponding patch of the reference image, determining local alignment results for the plurality of patches of the inspection image based on a reference image corresponding to the inspection image, determining an alignment model based on the local alignment results, and correcting a distortion of the inspection image based on the alignment model.
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10.发明申请
公开(公告)号：WO2022135938A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084837
申请日：2021-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Zhe , YU, Liangjiang , PU, Lingling
IPC: G06T7/00
Abstract: An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the generator model; and generating by the generator model, based on the defect-free inspection image, a predicted synthetic defect image with a predicted defect that accords with the defect attribute combination.
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