公开(公告)号：WO2018141503A1

公开(公告)日：2018-08-09

申请号：PCT/EP2018/050344

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： URBANCZYK, Adam, Jan ,  VAN DER LAAN, Hans ,  DA COSTA ASSAFRAO, Alberto ,  TSENG, Chien-Hung ,  CHEN, Jay, Jianhui

IPC: G03F7/20 ,  G01N21/47 ,  H01L21/66 ,  G01N21/956

Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing (1020) measured target response spectral sequence data (1010) relating to the measurement response of actual targets (1000) to equivalent reference target response sequence data (1030) relating to a measurement response of the targets as designed; and performing (1040) a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining (1050) stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.

公开(公告)号：WO2021099037A1

公开(公告)日：2021-05-27

申请号：PCT/EP2020/078986

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN HINSBERG, Michel, Alphons, Theodorus ,  DOWNES, James, Robert ,  VERDURMEN, Erwin, Josef, Maria ,  KLINKHAMER, Jacob Fredrik Friso ,  WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  URBANCZYK, Adam, Jan ,  VISSER, Lucas, Jan, Joppe

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method comprising: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; determining the input based on the parameter data and on the lens model data.

公开(公告)号：WO2023072526A1

公开(公告)日：2023-05-04

申请号：PCT/EP2022/077282

申请日：2022-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BASTANI, Vahid ,  KNOPS, Raoul, Maarten, Simon ,  THEEUWES, Thomas ,  URBANCZYK, Adam, Jan ,  WILDENBERG, Jochem, Sebastiaan ,  VAN WIJK, Robert Jan

IPC: G03F7/20

Abstract: 2021P00202WO 19 Confidential ABSTRACT Disclosed is a method of determining a performance parameter distribution and/or associated quantile function. The method comprises obtaining a quantile function prediction model operable to predict a quantile value for a substrate position and given quantile probability such that the predicted quantile values vary monotonically as a function of quantile probability and using the trained quantile 5 function prediction model to predict quantile values for a plurality of different quantile probabilities for one or more locations on the substrate.

公开(公告)号：WO2018099690A1

公开(公告)日：2018-06-07

申请号：PCT/EP2017/078288

申请日：2017-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN HAREN, Richard, Johannes, Franciscus ,  CALADO, Victor, Emanuel ,  VAN DIJK, Leon, Paul ,  WERKMAN, Roy ,  MOS, Everhardus, Cornelis ,  WILDENBERG, Jochem, Sebastiaan ,  JOCHEMSEN, Marinus ,  RAJASEKHARAN, Bijoy ,  JENSEN, Erik ,  URBANCZYK, Adam, Jan

IPC: G03F7/20 ,  H01L21/30 ,  H01L21/67 ,  H01L21/66

Abstract: A method to change an etch parameter of a substrate etching process, the method comprising: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.

公开(公告)号：EP4174577A1

公开(公告)日：2023-05-03

申请号：EP21205825.9

申请日：2021-11-01

Applicant: ASML Netherlands B.V.

Inventor： BASTANI, Vahid ,  KNOPS, Raoul, Maarten, Simon ,  THEEUWES, Thomas ,  URBANCZYK, Adam, Jan ,  WILDENBERG, Jochem, Sebastiaan ,  VAN WIJK, Robert Jan

IPC: G03F7/20

Abstract: Disclosed is a method of determining a performance parameter distribution and/or associated quantile function. The method comprises obtaining a quantile function prediction model operable to predict a quantile value for a substrate position and given quantile probability such that the predicted quantile values vary monotonically as a function of quantile probability and using the trained quantile function prediction model to predict quantile values for a plurality of different quantile probabilities for one or more substrate positions.

公开(公告)号：EP4427097A1

公开(公告)日：2024-09-11

申请号：EP22790548.6

申请日：2022-09-30

Applicant: ASML Netherlands B.V.

Inventor： BASTANI, Vahid ,  KNOPS, Raoul, Maarten, Simon ,  THEEUWES, Thomas ,  URBANCZYK, Adam, Jan ,  WILDENBERG, Jochem, Sebastiaan ,  VAN WIJK, Robert Jan

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70625