公开(公告)号：WO2021047841A1

公开(公告)日：2021-03-18

申请号：PCT/EP2020/072473

申请日：2020-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： CUI, Yingchao ,  YAGUBIZADE, Hadi ,  WEI, Xiuhong ,  SLOTBOOM, Daan, Maurits ,  PARK, Jeonghyun ,  ROY, Sarathi ,  ZHANG, Yichen ,  KAMALI, Mohammad, Reza ,  KIM, Sang-Uk

IPC: G03F7/20

Abstract: A method for determining lithographic matching performance includes obtaining first monitoring data E1M, E3M, E4M from recurrent monitoring for stability control for the available EUV scanners EUV1, EUV3 and EUV4. For a DUV scanner, second monitoring data D2M, is similarly obtained from recurrent monitoring (DMW, MT, OV, SM) for stability control. The EUV monitoring data E1M, E3M, E4M are in a first layout. The DUV monitoring data D2M are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing 900, 1000 at least one of the first and second monitoring data into a common layout E1S, E3S, E4S, D2S to allow comparison 802 of the first and second monitoring data.

公开(公告)号：EP4071554A1

公开(公告)日：2022-10-12

申请号：EP21167479.1

申请日：2021-04-08

Applicant: ASML Netherlands B.V.

Inventor： KARA, Dogacan ,  WILDENBERG, Jochem Sebastiaan ,  DECKERS, David Frans Simon ,  YUDHISTIRA, Yasri ,  HILHORST, Gijs ,  CAICEDO FERNANDEZ, David Ricardo ,  SPIERING, Frans Reinier ,  KHO, Sinatra Canggih ,  BLOM, Herman Martin ,  KIM, Sang-Uk ,  KIM, Hyun Su

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method for modeling measurement data relating to a parameter of interest over at least two substrate portions of a substrate and associated apparatuses. The method comprises obtaining at least a first substrate portion model for describing the parameter of interest across one or more first substrate portions on the substrate and a second substrate portion model for describing the parameter of interest across one or more second substrate portions on the substrate; and performing steps 1 to 4 iteratively for each of said plurality of substrate portion models until a stopping criterion is met. These steps comprise 1. selecting a candidate basis function from a plurality of candidate basis functions; 2. updating the substrate portion model by adding the candidate basis function into the substrate portion model; 3. evaluating the updated substrate portion model using the measurement data; and 4. determining whether to include the basis function within the substrate portion model based on the evaluation.