公开(公告)号：WO2011036248A1

公开(公告)日：2011-03-31

申请号：PCT/EP2010/064140

申请日：2010-09-24

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  CYMER, INC. ,  PARTLO, William N.

Inventor： LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  PARTLO, William N.

IPC: G03F7/20 ,  C01B3/50 ,  G21K1/06

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV lithographic apparatus (100) comprises a source collector apparatus (SO) in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma (210) emitting the radiation. The source collector apparatus (SO) includes a chamber (310) in fluid communication with a guide way (320) external to the chamber (310). A pump (BPS) for circulating buffer gas is part of the guide way (320), and provides a closed loop buffer gas flow (222). The gas flowing through the guide way (302) traverses a gas decomposer (TD1) wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path (222).

Abstract translation: EUV光刻设备（100）包括源极收集器（SO），其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体（210）。 源收集器装置（SO）包括与室（310）外部的引导方式（320）流体连通的室（310）。 用于循环缓冲气体的泵（BPS）是引导方式（320）的一部分，并且提供闭环缓冲气体流（222）。 流过引导方式（302）的气体穿过其中分解燃料和缓冲气体材料的化合物的气体分解器（TD1），使得分解的缓冲气体材料可以反馈回闭环流动路径（222）。

公开(公告)号：WO2010028899A1

公开(公告)日：2010-03-18

申请号：PCT/EP2009/059337

申请日：2009-07-21

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  LABETSKI, Dzmitry

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  LABETSKI, Dzmitry

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003

Abstract: A radiation source (SO) is configured to generate extreme ultraviolet radiation. The radiation source (SO) includes a plasma formation site (2) located at a position in which a fuel will be contacted by a beam of radiation (5) to form a plasma, an outlet (16) configured to allow gas to exit the radiation source (SO), and a contamination trap (23) at least partially- located inside the outlet (16). The contamination trap is configured to trap (23) debris particles that are generated with the formation of the plasma.

Abstract translation: 辐射源（SO）被配置为产生极紫外辐射。 辐射源（SO）包括位于燃料将被辐射束（5）接触以形成等离子体的位置的等离子体形成位置（2），被配置为允许气体离开 辐射源（SO）和至少部分地位于出口（16）内部的污染物捕集器（23）。 污染阱被配置成捕获（23）形成等离子体时产生的碎屑颗粒。

公开(公告)号：WO2012119672A1

公开(公告)日：2012-09-13

申请号：PCT/EP2011/073537

申请日：2011-12-21

Applicant: ASML Netherlands B.V. ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  MOORS, Roel ,  VAN SCHOOT, Jan ,  SWINKELS, Gerardus ,  YAKUNIN, Andrei ,  VAN DIJSSELDONK, Antonius ,  DE BOEIJ, Wilhelmus

Inventor： BANINE, Vadim ,  LOOPSTRA, Erik ,  MOORS, Roel ,  VAN SCHOOT, Jan ,  SWINKELS, Gerardus ,  YAKUNIN, Andrei ,  VAN DIJSSELDONK, Antonius ,  DE BOEIJ, Wilhelmus

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract translation: 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：WO2011098169A1

公开(公告)日：2011-08-18

申请号：PCT/EP2010/069192

申请日：2010-12-08

Applicant: ASML NETHERLANDS B.V. ,  KEMPEN, Antonius ,  BRULS, Richard ,  LOOPSTRA, Erik ,  MOORS, Roel ,  SWINKELS, Gerardus ,  MESTROM, Wilbert

Inventor： KEMPEN, Antonius ,  BRULS, Richard ,  LOOPSTRA, Erik ,  MOORS, Roel ,  SWINKELS, Gerardus ,  MESTROM, Wilbert

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  B08B3/08 ,  G03F7/70033 ,  G03F7/708 ,  G03F7/70916 ,  G03F7/70925

Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H 2 O, H 2 O 2 , O 2 , NH 3 or NO x , is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.

Abstract translation: 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。

公开(公告)号：WO2011082891A1

公开(公告)日：2011-07-14

申请号：PCT/EP2010/068421

申请日：2010-11-29

Applicant: ASML NETHERLANDS B.V. ,  MESTROM, Wilbert ,  LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik

Inventor： MESTROM, Wilbert ,  LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik

IPC: H05G2/00

CPC classification number: H05G2/001 ,  H05G2/006

Abstract: An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.

Abstract translation: EUV辐射源包括配置成向等离子体形成位置供应燃料的燃料供应。 燃料供给包括喷射燃料液滴的喷嘴，和配置成加速燃料液滴的液滴加速器。 EUV辐射源包括被配置为照射由等离子​​体形成位置处的燃料供应供应的燃料的激光辐射源。

公开(公告)号：WO2014090480A1

公开(公告)日：2014-06-19

申请号：PCT/EP2013/072927

申请日：2013-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： MESTROM, Wilbert ,  LABETSKI, Dzmitry ,  SWINKELS, Gerardus

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: Disclosed is a radiation source configured to generate a beam of EUV radiation by excitation of a fuel. The radiation source comprises a gas stream generation module which preconditions a droplet of the fuel by application of a high velocity gas stream to the droplet. Also disclosed is a lithographic apparatus comprising such a radiation source.

Abstract translation: 公开了一种被配置为通过激发燃料而产生EUV辐射束的辐射源。 辐射源包括气流发生模块，其通过向液滴施加高速气流来预处理燃料液滴。 还公开了包括这种辐射源的光刻设备。

公开(公告)号：WO2013023710A1

公开(公告)日：2013-02-21

申请号：PCT/EP2011/072633

申请日：2011-12-13

Applicant: ASML NETHERLANDS B.V. ,  KEMPEN, Antonius ,  LOOPSTRA, Erik ,  WAGNER, Christian ,  TEGENBOSCH, Henricus ,  SWINKELS, Gerardus

Inventor： KEMPEN, Antonius ,  LOOPSTRA, Erik ,  WAGNER, Christian ,  TEGENBOSCH, Henricus ,  SWINKELS, Gerardus

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation source includes: a nozzle configured to direct a stream of fuel droplets (30) along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location, the catch including: a container (40) configured to contain a fluid (42); a driver (44) configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.

Abstract translation: 辐射源包括：喷嘴，其构造成沿着轨迹朝向等离子体形成位置引导燃料液滴流（30）; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块，所述挡块包括：构造成容纳流体（42）的容器（40）; 构造成驱动流体的驱动器（44），以使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

公开(公告)号：WO2012031841A1

公开(公告)日：2012-03-15

申请号：PCT/EP2011/063443

申请日：2011-08-04

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  STAMM, Uwe

Inventor： LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  STAMM, Uwe

IPC: H01S3/00 ,  G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  B23K26/0643 ,  G03F7/70025 ,  G03F7/70191 ,  G03F7/7055 ,  H01S3/0071 ,  H01S3/2308 ,  H05G2/001 ,  H05G2/008

Abstract: An EUV radiation generation apparatus includes a laser (300) configured to generate pulses (205) of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector (305) and a radially positioned reflector (306). The rotatably mounted reflector and the laser are synchronized such that a reflective surface (307,308) of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location (313) and cause a radiation emitting plasma to be generated via vaporization of a droplet (313a) of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation (316) reflected from the plasma formation location.

Abstract translation: EUV辐射发生装置包括被配置为产生激光辐射的脉冲（205）的激光器（300）和包括可旋转地安装的反射器（305）和径向定位的反射器（306）的光学隔离装置。 可旋转地安装的反射器和激光器被同步，使得当光隔离装置接收到激光辐射的脉冲以允许激光辐射的脉冲时，可旋转地安装的反射器的反射表面（307,308）与径向定位的反射器光学连通 传递到等离子体形成位置（313）并且通过燃料材料的液滴（313a）的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光隔离设备接收从等离子体形成位置反射的辐射（316）时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。

公开(公告)号：WO2014161698A1

公开(公告)日：2014-10-09

申请号：PCT/EP2014/054221

申请日：2014-03-05

Applicant: ASML NETHERLANDS B.V.

Inventor： KLEEMANS, Niek ,  GLUSHKOV, Denis ,  HULTERMANS, Ronald ,  RENKENS, Benedictus ,  SWINKELS, Gerardus ,  VERSPEEK, Christiaan

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/008

Abstract: A source collector apparatus for use in a lithographic apparatus comprises a fuel droplet generator (4) configured in use to generate a stream of fuel droplets (6) directed from an outlet of the fuel droplet generator towards a plasma formation location (7). In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (A) (eg hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, detection apparatus may be provided as part of a shroud (5) to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

Abstract translation: 用于光刻设备的源极收集器装置包括燃料液滴发生器（4），其被配置用于产生从燃料液滴发生器的出口朝向等离子体形成位置（7）引导的燃料液滴流（6）。 为了防止液滴卫星干扰等离子体形成，提供气体供应，其在使用中提供将任何液滴卫星偏离燃料液滴流的气体（A）（例如氢气）流。 另外，检测装置可以被提供作为护罩（5）的一部分，以确定出现燃料液滴聚结的点，从而提供卫星液滴存在于燃料液滴流中的可能性的指示。

公开(公告)号：WO2013143733A1

公开(公告)日：2013-10-03

申请号：PCT/EP2013/052342

申请日：2013-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： MESTROM, Wilbert ,  SWINKELS, Gerardus

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/001 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/0318 ,  Y10T137/794

Abstract: A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir (40) for retaining a volume of fuel (42), a nozzle (32), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement (44) which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.

Abstract translation: 公开了用于EUV辐射源的燃料供应。 燃料供应包括用于保持一定体积的燃料（42）的储存器（40），与储存器流体连接的喷嘴（32），并且构造成沿着等离子体形成位置的轨迹引导燃料流;以及 燃料污染控制装置（44），其将污染颗粒与燃料分离。 污染控制装置包括至少一个声学滤波器。 声学滤波器可以将声驻波应用于燃料。 还公开了一种控制这种燃料供应中的污染物的方法。