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1.
公开(公告)号:WO2019233738A1
公开(公告)日:2019-12-12
申请号:PCT/EP2019/062767
申请日:2019-05-17
Applicant: ASML NETHERLANDS B.V.
Inventor: TRIPODI, Lorenzo , WARNAAR, Patrick , GRZELA, Grzegorz , HAJIAHMADI, Mohammadreza , FARHADZADEH, Farzad , TINNEMANS, Patricius, Aloysius Jacobus , MIDDLEBROOKS, Scott, Anderson , KOOPMAN, Adrianus, Cornelis, Matheus , STAALS, Frank , PETERSON, Brennan , VAN OOSTEN, Anton, Bernhard
IPC: G03F7/20
Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
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2.
公开(公告)号:EP3579052A1
公开(公告)日:2019-12-11
申请号:EP18176718.7
申请日:2018-06-08
Applicant: ASML Netherlands B.V.
Inventor: TRIPODI, Lorenzo , HAJIAHMADI, Mohammadreza , FARHADZADEH, Farzad , TINNEMANS, Patricius Aloysius Jacobus , MIDDLEBROOKS, Scott Anderson , KOOPMAN, Adrianus Cornelis Matheus , STAALS, Frank , PETERSON, Brennan , VAN OOSTEN, Anton Bernhard
IPC: G03F7/20
Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
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