公开(公告)号：WO2022135923A1

公开(公告)日：2022-06-30

申请号：PCT/EP2021/084702

申请日：2021-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： PISARENCO, Maxim ,  BATISTAKIS, Chrysostomos ,  MIDDLEBROOKS, Scott, Anderson

IPC: G03F7/20 ,  G06N3/08 ,  G06N3/02 ,  G06N20/00

Abstract: A method for training a machine learning model includes obtaining a set of unpaired after-development (AD) images and after-etch (AE) images associated with a substrate. Each AD image in the set is obtained at a location on the substrate that is different from the location at which any of the AE images is obtained. The method further includes training the machine learning model to generate a predicted AE image based on the AD images and the AE images, wherein the predicted AE image corresponds to a location from which an input AD image of the AD images is obtained.

公开(公告)号：WO2017102264A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/078445

申请日：2016-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott, Anderson ,  ADAM, Omer, Abubaker, Omer ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  MEGENS, Henricus, Johannes, Lambertus ,  DEN BOEF, Arie, Jeffrey

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70508 ,  G03F7/70633

Abstract: Disclosed herein is a method and a computer program product that relates to lithographic apparatuses and processes, and more particularly to a method and computer program to inspect substrates produced by the lithographic apparatuses and processes. The method and/or computer program product comprise: determining, using a computer, contributions from independent sources from results measured from a lithography process or a substrate processed by the lithography process; wherein the results are measured using a plurality of different substrate measurement recipes.

Abstract translation: 本文公开了涉及光刻设备和工艺的方法和计算机程序产品，并且更具体地涉及检查由光刻设备和工艺产生的衬底的方法和计算机程序。 所述方法和/或计算机程序产品包括：使用计算机确定来自由光刻工艺或由所述光刻工艺处理的衬底测量的结果的独立源的贡献; 其中使用多个不同的基板测量配方测量结果。

公开(公告)号：WO2023041488A1

公开(公告)日：2023-03-23

申请号：PCT/EP2022/075299

申请日：2022-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： NOOT, Marc, Johannes ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  MIDDLEBROOKS, Scott, Anderson ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20

Abstract: Disclosed herein is a method to determine a metrology contribution from statistically independent sources comprising providing a plurality of contributions from statistically independent sources obtained at a plurality of measurement settings, determining a metrology contribution from the said contributions wherein the metrology contribution is the contribution having least dependence as a function of said measurement settings.

公开(公告)号：WO2023001479A1

公开(公告)日：2023-01-26

申请号：PCT/EP2022/067094

申请日：2022-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  VERSCHUREN, Coen, Adrianus

IPC: G06T11/00 ,  G06T5/00

Abstract: Disclosed herein is a non-transitory computer readable medium that has stored therein a computer program, wherein the computer program comprises code that, when executed by a computer system, instructs the computer system to perform a method for generating synthetic distorted images, the method comprising: obtaining an input set that comprises a plurality of distorted images; determining, using a model, distortion modes of the distorted images in the input set; generating a plurality of different combinations of the distortion modes; generating, for each one of the plurality of combinations of the distortion modes, a synthetic distorted image in dependence on the combination; and including each of the synthetic distorted images in an output set.

公开(公告)号：WO2015018625A1

公开(公告)日：2015-02-12

申请号：PCT/EP2014/065461

申请日：2014-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott, Anderson ,  GEYPEN, Niels ,  SMILDE, Hendrik, Jan, Hidde ,  STRAAIJER, Alexander ,  VAN DER SCHAAR, Maurits ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria

IPC: G03F7/20

CPC classification number: G03F7/70633

Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.

Abstract translation: 公开了一种测量光刻工艺参数的方法和相关检验装置。 该方法包括使用多个不同的照明条件在衬底上测量至少两个目标结构，所述目标结构具有故意的覆盖偏移; 为每个目标结构获得表示总体不对称性的不对称测量，其包括由于（i）故意覆盖偏移引起的贡献，（ii）在形成目标结构期间的覆盖误差和（iii）任何特征不对称性。 对不对称测量数据进行回归分析，通过将线性回归模型拟合到针对另一目标结构的不对称测量的一个目标结构的不对称测量的平面表示，线性回归模型不一定通过平面表示的原点拟合 。 然后可以从线性回归模型描述的梯度确定覆盖误差。

公开(公告)号：WO2010034427A2

公开(公告)日：2010-04-01

申请号：PCT/EP2009/006715

申请日：2009-09-17

Applicant: ASML NETHERLANDS B.V. ,  MOS, Everhardus, Cornelis ,  VAN DER SCHAAR, Maurits ,  MIDDLEBROOKS, Scott, Anderson

Inventor： MOS, Everhardus, Cornelis ,  VAN DER SCHAAR, Maurits ,  MIDDLEBROOKS, Scott, Anderson

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70525

Abstract: A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

Abstract translation: 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。 在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。 计算装置表示由一对正交基函数计算的瞳孔平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。

公开(公告)号：WO2022128373A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/082756

申请日：2021-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： HOUBEN, Tim ,  HUISMAN, Thomas, Jarik ,  PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  BATISTAKIS, Chrysostomos ,  CAO, Yu

IPC: G06T7/593

Abstract: Described herein are system, method, and apparatus for determining three-dimensional (3D) information of a structure of a patterned substrate. The 3D information can be determined using one or more model configured to generate 3D information (e.g., depth information) using only a single image of a patterned substrate. In a method, the model is trained by obtaining a pair of stereo images of a structure of a patterned substrate. The model generates, using a first image of the pair of stereo images as input, disparity data between the first image and a second image, the disparity data being indicative of depth information associated with the first image. The disparity data is combined with the second image to generate a reconstructed image corresponding to the first image. Further, one or more model parameters are adjusted based on the disparity data, the reconstructed image, and the first image.

公开(公告)号：WO2021043551A1

公开(公告)日：2021-03-11

申请号：PCT/EP2020/072593

申请日：2020-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  VERSCHUREN, Coen, Adrianus

IPC: G06N3/04 ,  G06N3/08 ,  G06N7/00

Abstract: A method for increasing certainty in parameterized model predictions is described. The method comprises clustering dimensional data in a latent space associated with a parameterized model into clusters. Different clusters correspond to different portions of a given input. The method comprises predicting, with the parameterized model, an output based on the dimensional data in the latent space. The method comprises transforming, with the parameterized model, the dimensional data in the latent space into a recovered version of the given input that corresponds to one or more of the clusters. In some embodiments, the method comprises determining which clusters correspond to predicted outputs with higher variance, and making the parameterized model more descriptive by adding to the dimensionality of the latent space, and/or training the parameterized model with more diverse training data associated with one or more of the determined clusters or parts of clusters associated with the higher variance.

公开(公告)号：WO2020200993A1

公开(公告)日：2020-10-08

申请号：PCT/EP2020/058488

申请日：2020-03-26

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott, Anderson ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim ,  HUNSCHE, Stefan

IPC: G03F7/20 ,  G06N3/02 ,  G06N3/08 ,  G06N3/04 ,  G06N20/00

Abstract: Described herein is a method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set comprising (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function comprises a relationship between the predicted substrate image and the metrology data.

公开(公告)号：WO2020109074A1

公开(公告)日：2020-06-04

申请号：PCT/EP2019/081774

申请日：2019-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim

IPC: G06N3/04 ,  G06N3/08 ,  G03F1/36 ,  G03F7/20

Abstract: Described herein is a method for quantifying uncertainty in parameterized (e.g., machine learning) model predictions. The method comprises causing a parameterized model to predict multiple posterior distributions from the parameterized model for a given input. The multiple posterior distributions comprise a distribution of distributions. The method comprises determining a variability of the predicted multiple posterior distributions for the given input by sampling from the distribution of distributions; and using the determined variability in the predicted multiple posterior distributions to quantify uncertainty in the parameterized model predictions. The parameterized model comprises encoder-decoder architecture. The method comprises using the determined variability in the predicted multiple posterior distributions to adjust the parameterized model to decrease the uncertainty of the parameterized model for predicting wafer geometry, overlay, and/or other information as part of a semiconductor manufacturing process.