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    METROLOGY MEASUREMENT METHOD
    2.
    发明申请
    METROLOGY MEASUREMENT METHOD 审中-公开

    公开(公告)号：WO2021180493A1

    公开(公告)日：2021-09-16

    申请号：PCT/EP2021/054953

    申请日：2021-02-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN WEPEREN, Ilse ,  NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan

    IPC: G03F7/20

    Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

    FREE ELECTRON LASER
    3.
    发明申请
    FREE ELECTRON LASER 审中-公开
    免费电子激光

    公开(公告)号：WO2015067467A1

    公开(公告)日：2015-05-14

    申请号：PCT/EP2014/072588

    申请日：2014-10-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

    IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

    CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

    Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

    Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

    METHODS AND APPARATUS FOR METROLOGY
    4.
    发明申请
    METHODS AND APPARATUS FOR METROLOGY 审中-公开

    公开(公告)号：WO2020126248A1

    公开(公告)日：2020-06-25

    申请号：PCT/EP2019/081565

    申请日：2019-11-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SMORENBURG, Petrus, Wilhelmus ,  MOSSAVAT, Seyed Iman ,  COENEN, Teis, Johan

    IPC: G03F7/20 ,  G01N23/20008 ,  G01N21/956

    Abstract: Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). A drive radiation source provides drive radiation to an interaction region which contains a medium for HHG generation. The radiation generated by HHG may comprise a plurality of soft X-ray (SXR) wavelengths. Different HHG generated wavelengths have a different divergence angles. The apparatus further comprises an optical system which focusses the different HHG wavelengths to different focal planes, because of the different divergence angles. The apparatus further comprises a substrate support for holding the substrate. One or more of the drive radiation source, interaction region, optical system and substrate support can control the position of the substrate relative to the plurality of focal planes of the HHG radiation.

    DETERMINING AN EDGE ROUGHNESS PARAMETER OF A PERIODIC STRUCTURE
    5.
    发明申请
    DETERMINING AN EDGE ROUGHNESS PARAMETER OF A PERIODIC STRUCTURE 审中-公开

    公开(公告)号：WO2019020291A1

    公开(公告)日：2019-01-31

    申请号：PCT/EP2018/066540

    申请日：2018-06-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： COENEN, Teis, Johan ,  ROOBOL, Sander, Bas ,  BIJLSMA, Sipke, Jacob

    IPC: G03F7/20

    Abstract: In a method of determining an edge roughness parameter of a periodic structure, the periodic structure is illuminated (602) in an inspection apparatus. The illumination radiation beam may comprise radiation with a wavelength in the range 1 nm to 100 nm. A scattering signal (604) is obtained from a radiation beam scattered from the periodic structure. The scattering signal comprises a scattering intensity signal that is obtained by detecting an image of a far-field diffraction pattern in the inspection apparatus. An edge roughness parameter, such as Lined Edge Roughness and/or Line Width Roughness is determined (606) based on a distribution of the scattering intensity signal around a non-specular diffraction order. This may be done for example using a peak broadening model.

    RADIATION SOURCE
    8.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2016023740A2

    公开(公告)日：2016-02-18

    申请号：PCT/EP2015/067159

    申请日：2015-07-27

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIKIPELOV, Andrey, Alexandrovich ,  COENEN, Teis, Johan ,  VAN HELVOORT, Jeroen, Johannes, Michiel ,  ENGELEN, Wouter, Joep ,  BRUSSAARD, Gerrit, Jacobus, Hendrik ,  POORTER, Gijsbertus, Geert ,  LOOPSTRA, Erik, Roelof

    IPC: H01S3/09

    CPC classification number: H01S3/0903 ,  H01S3/0071 ,  H01S3/0959 ,  H01S3/1024 ,  H01S3/11 ,  H01S3/1103

    Abstract: Passage through LINACs of electron bunches in their acceleration phase is co-ordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps:- for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is co-ordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

    Abstract translation: 在加速阶段通过电子束的LINAC通道在其减速阶段通过电子束的LINAC进行协调。 根据重复的电子束序列，每个连续的一对电子束在时间上由相应的束间隔隔开。 电子源提供电子束序列中的清除间隙，以允许在波动器处清除离子。 电子源根据清除间隙序列提供清除间隙，使得对于多个能量回收LINACS中的每一个以及基本上所有的清除间隙： - 对于通过加速度的LINAC的清除间隙的每次通过 相位或减速阶段，清除间隙与在减速阶段或加速阶段通过LINAC的另一个清除间隙进行协调，从而保持LINAC的能量回收操作。

    METROLOGY MEASUREMENT METHOD
    9.
    发明申请
    METROLOGY MEASUREMENT METHOD 审中-公开

    公开(公告)号：WO2021180540A1

    公开(公告)日：2021-09-16

    申请号：PCT/EP2021/055316

    申请日：2021-03-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN WEPEREN, Ilse ,  NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan

    IPC: G03F7/20

    Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

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