公开(公告)号：WO2011110467A3

公开(公告)日：2011-11-24

申请号：PCT/EP2011053171

申请日：2011-03-03

Applicant: ASML NETHERLANDS BV ,  IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI

Inventor： IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.

Abstract translation: 提供了用于从EUV辐射束的路径去除污染物粒子的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级 电压状态，并且作为电压状态的第二阶段，将DC电压提供给电极。

公开(公告)号：NL2010232A

公开(公告)日：2013-03-19

申请号：NL2010232

申请日：2013-02-01

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BANINE VADIM ,  IVANOV VLADIMIR ,  DIJKSMAN JOHAN ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005463A

公开(公告)日：2011-06-20

申请号：NL2005463

申请日：2010-10-06

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G01N21/94

Abstract: A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs. Thus by detecting the thermal radiation, it is possible to detect the presence of particles deposited on the mask. If particles are detected, the mask can be cleaned.

公开(公告)号：NL2005554A

公开(公告)日：2010-12-07

申请号：NL2005554

申请日：2010-10-21

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI

IPC: G03F7/20

公开(公告)号：NL2003152A1

公开(公告)日：2010-02-16

申请号：NL2003152

申请日：2009-07-08

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  BANINE VADIM ,  IVANOV VLADIMIR ,  LOOPSTRA ERIK

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：NL2012861A

公开(公告)日：2014-07-10

申请号：NL2012861

申请日：2014-05-22

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  IVANOV VLADIMIR ,  SEROGLAZOV PAVEL ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2002890A1

公开(公告)日：2009-12-17

申请号：NL2002890

申请日：2009-05-14

Applicant: ASML NETHERLANDS BV

Inventor： GLUSHKOV DENNIS ,  BANINE VADIM ,  IVANOV VLADIMIR ,  KOSHELEV KONSTANTIN ,  KRIVTSUN VLADIMIR ,  ZUKAKISHVILI GIVI ,  SIDELNIKOV YURII ,  YAKUSHEV OLEG

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005750A

公开(公告)日：2011-01-18

申请号：NL2005750

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  KOSHELEV KONSTANTIN ,  KRIVTSUN VLADIMIR ,  GLUSHKOV DENIS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005748A

公开(公告)日：2011-01-06

申请号：NL2005748

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  BRULS RICHARD ,  IVANOV VLADIMIR ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009372A

公开(公告)日：2013-04-02

申请号：NL2009372

申请日：2012-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  GREEVENBROEK HENDRIKUS ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS

IPC: G03F7/20

Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.