公开(公告)号：NL2024999A

公开(公告)日：2020-04-30

申请号：NL2024999

申请日：2020-02-26

Applicant: ASML NETHERLANDS BV

Inventor： ARNAUD HUBAUX ,  PATRICK WARNAAR ,  SCOTT ANDERSON MIDDLEBROOKS

IPC: G03F7/20

Abstract: A method of determining matching performance between tools used in semiconductor manufacture and associated tools is described. The method comprises obtaining a plurality of data sets related to a plurality of tools and at least one model configured to represent said data sets in a reduced space comprising a reduced dimensionality. A matching metric and/or matching correction is determined based on matching said reduced data sets in the reduced space.

公开(公告)号：NL2024627A

公开(公告)日：2020-01-31

申请号：NL2024627

申请日：2020-01-09

Applicant: ASML NETHERLANDS BV

Inventor： ARNAUD HUBAUX ,  JOHAN FRANCISCUS MARIA BECKERS ,  JOHAN GERTRUDIS CORNELIS KUNNEN ,  WILLEM RICHARD PONGERS ,  DYLAN JOHN DAVID DAVIES ,  AJINKYA RAVINDRA DAWARE ,  MAXIM PISARENCO ,  NICK KANT ,  FREDERIK EDUARD DE JONG ,  HENDRIK CORNELIS ANTON BORGER ,  CHUNG-HSUN LI ,  GEORGIOS TSIROGIANNIS ,  JUAN MANUEL GONZALEZ HUESCA ,  ANDRIY VASYLIOVICH HLOD

IPC: G03F7/20

Abstract: Described is a method and associated computer program and apparatuses for method for making a decision Within a manufacturing process. The method comprises obtaining scanner data relating to one or more parameters of a lithographic exposure step of the manufacturing process and applying a decision 5 model. The decision model outputs a value for each of one or more categorical indicators based on the scanner data, each categorical indicator being indicative of a quality of the manufacturing process. An action is decided upon (e. g., to inspect a substrate as a candidate for rework) based on a value of the categorical indicator. 10 Figure 4.