公开(公告)号：NL2024788A

公开(公告)日：2020-09-01

申请号：NL2024788

申请日：2020-01-30

Applicant: ASML NETHERLANDS BV

Inventor： NICK KANT ,  MARTIJN CORNELIS SCHAAFSMA

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical 5 component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.

公开(公告)号：NL2024627A

公开(公告)日：2020-01-31

申请号：NL2024627

申请日：2020-01-09

Applicant: ASML NETHERLANDS BV

Inventor： ARNAUD HUBAUX ,  JOHAN FRANCISCUS MARIA BECKERS ,  JOHAN GERTRUDIS CORNELIS KUNNEN ,  WILLEM RICHARD PONGERS ,  DYLAN JOHN DAVID DAVIES ,  AJINKYA RAVINDRA DAWARE ,  MAXIM PISARENCO ,  NICK KANT ,  FREDERIK EDUARD DE JONG ,  HENDRIK CORNELIS ANTON BORGER ,  CHUNG-HSUN LI ,  GEORGIOS TSIROGIANNIS ,  JUAN MANUEL GONZALEZ HUESCA ,  ANDRIY VASYLIOVICH HLOD

IPC: G03F7/20

Abstract: Described is a method and associated computer program and apparatuses for method for making a decision Within a manufacturing process. The method comprises obtaining scanner data relating to one or more parameters of a lithographic exposure step of the manufacturing process and applying a decision 5 model. The decision model outputs a value for each of one or more categorical indicators based on the scanner data, each categorical indicator being indicative of a quality of the manufacturing process. An action is decided upon (e. g., to inspect a substrate as a candidate for rework) based on a value of the categorical indicator. 10 Figure 4.

公开(公告)号：NL2020531A

公开(公告)日：2018-10-10

申请号：NL2020531

申请日：2018-03-06

Applicant: ASML NETHERLANDS BV

Inventor： NICK KANT ,  ROBERTUS MARTINUS ALPHONSUS VAN HERPEN ,  NICO VANROOSE ,  JAMES ROBERT DOWNES ,  LENSE HENDRIK-JAN MARIA SWAENEN ,  MARK LOUWRENS BEKS

IPC: G03F7/20

Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the 5 aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus. 10

公开(公告)号：NL2017368A

公开(公告)日：2017-03-30

申请号：NL2017368

申请日：2016-08-26

Applicant: ASML NETHERLANDS BV

Inventor： NICK KANT ,  MARK JAN HENDRIK LUTTIKHOF

IPC: G03F7/20

Abstract: The invention relates to a method of reducing effects of reticle heating and/or cooling in a lithographic process, comprising the steps of: calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.