公开(公告)号：NL2009853A

公开(公告)日：2013-06-26

申请号：NL2009853

申请日：2012-11-21

Applicant: ASML NETHERLANDS BV

Inventor： ELINGS WOUTER ,  BILSEN FRANCISCUS ,  MOL CHRISTIANUS ,  MOS EVERHARDUS ,  TOLSMA HOITE ,  BERGE PETER TEN ,  WIJNEN PAUL ,  VERSTAPPEN LEONARDUS ,  DICKER GERALD ,  JUNGBLUT REINER ,  CHUNG-HSUN LI

IPC: G03F7/20

Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.

公开(公告)号：NL2024627A

公开(公告)日：2020-01-31

申请号：NL2024627

申请日：2020-01-09

Applicant: ASML NETHERLANDS BV

Inventor： ARNAUD HUBAUX ,  JOHAN FRANCISCUS MARIA BECKERS ,  JOHAN GERTRUDIS CORNELIS KUNNEN ,  WILLEM RICHARD PONGERS ,  DYLAN JOHN DAVID DAVIES ,  AJINKYA RAVINDRA DAWARE ,  MAXIM PISARENCO ,  NICK KANT ,  FREDERIK EDUARD DE JONG ,  HENDRIK CORNELIS ANTON BORGER ,  CHUNG-HSUN LI ,  GEORGIOS TSIROGIANNIS ,  JUAN MANUEL GONZALEZ HUESCA ,  ANDRIY VASYLIOVICH HLOD

IPC: G03F7/20

Abstract: Described is a method and associated computer program and apparatuses for method for making a decision Within a manufacturing process. The method comprises obtaining scanner data relating to one or more parameters of a lithographic exposure step of the manufacturing process and applying a decision 5 model. The decision model outputs a value for each of one or more categorical indicators based on the scanner data, each categorical indicator being indicative of a quality of the manufacturing process. An action is decided upon (e. g., to inspect a substrate as a candidate for rework) based on a value of the categorical indicator. 10 Figure 4.

公开(公告)号：NL2024206A

公开(公告)日：2019-12-02

申请号：NL2024206

申请日：2019-11-11

Applicant: ASML NETHERLANDS BV

Inventor： CORNELIS MELCHIOR BROUWER ,  CHUNG-HSUN LI

IPC: G03F7/20

Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.