公开(公告)号：NL2017074A

公开(公告)日：2017-01-19

申请号：NL2017074

申请日：2016-06-30

Applicant: ASML NETHERLANDS BV

Inventor： REMCO DIRKS ,  MARKUS GERARDUS MARTINUS MARIA VAN KRAAIJ ,  MAXIM PISARENCO

IPC: G03F7/20 ,  G01N21/95

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904’, 906’) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

公开(公告)号：NL2017510A

公开(公告)日：2017-04-24

申请号：NL2017510

申请日：2016-09-22

Applicant: ASML NETHERLANDS BV

Inventor： MAXIM PISARENCO ,  RICHARD QUINTANILHA ,  MARKUS GERARDUS MARTINUS MARIA VAN KRAAIJ

IPC: G03F7/20

Abstract: A structure of interest is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector. A processor calculates a property such as linewidth (CD) by simulating interaction of radiation with a structure and comparing the simulated interaction with the detected radiation. A layered structure model is used to represent the structure in a numerical method. The structure model defines for each layer of the structure a homogeneous background permittivity and for at least one layer a non-homogeneous contrast permittivity. The method uses Maxwell’s equation in Born approximation, whereby a product of the contrast permittivity and the total field is approximated by a product of the contrast permittivity and the background field. A computation complexity is reduced by several orders of magnitude compared with known methods.

公开(公告)号：NL2024627A

公开(公告)日：2020-01-31

申请号：NL2024627

申请日：2020-01-09

Applicant: ASML NETHERLANDS BV

Inventor： ARNAUD HUBAUX ,  JOHAN FRANCISCUS MARIA BECKERS ,  JOHAN GERTRUDIS CORNELIS KUNNEN ,  WILLEM RICHARD PONGERS ,  DYLAN JOHN DAVID DAVIES ,  AJINKYA RAVINDRA DAWARE ,  MAXIM PISARENCO ,  NICK KANT ,  FREDERIK EDUARD DE JONG ,  HENDRIK CORNELIS ANTON BORGER ,  CHUNG-HSUN LI ,  GEORGIOS TSIROGIANNIS ,  JUAN MANUEL GONZALEZ HUESCA ,  ANDRIY VASYLIOVICH HLOD

IPC: G03F7/20

Abstract: Described is a method and associated computer program and apparatuses for method for making a decision Within a manufacturing process. The method comprises obtaining scanner data relating to one or more parameters of a lithographic exposure step of the manufacturing process and applying a decision 5 model. The decision model outputs a value for each of one or more categorical indicators based on the scanner data, each categorical indicator being indicative of a quality of the manufacturing process. An action is decided upon (e. g., to inspect a substrate as a candidate for rework) based on a value of the categorical indicator. 10 Figure 4.