公开(公告)号：DE602005000696D1

公开(公告)日：2007-04-26

申请号：DE602005000696

申请日：2005-04-04

Applicant: ASML NETHERLANDS BV

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS ,  DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES ,  MULKENS JOHANNES CATHARINUS ,  PEETERS FELIX GODFRIED ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：DE602005010014D1

公开(公告)日：2008-11-13

申请号：DE602005010014

申请日：2005-06-28

Applicant: ASML NETHERLANDS BV

Inventor： JEUNINK ANDRE BERNARDUS ,  AKHSSAY M HAMED ,  BASELMANS JOHANNES JACOBUS ,  COMMISSARIS FRANCISCUS ,  VAN DIJK REMCO MARCEL ,  DE GROOT SIMON ,  TEL WIM TJIBBO ,  VAN DER HOFF ALEXANDER HENDRIK ,  VAN DE STADT ARNOUT

IPC: G03F7/20

Abstract: A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.

公开(公告)号：DE602005000696T2

公开(公告)日：2008-01-24

申请号：DE602005000696

申请日：2005-04-04

Applicant: ASML NETHERLANDS BV

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS ,  DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES ,  MULKENS JOHANNES CATHARINUS ,  PEETERS FELIX GODFRIED ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027