公开(公告)号：JP2010033067A

公开(公告)日：2010-02-12

申请号：JP2009253100

申请日：2009-11-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus equipped with an array of individually controllable elements, and a data processing pipeline. SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements so as to substantially form the requested dose pattern on a substrate. The data processing pipeline compresses an offline preprocessing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which is rasterized in a fewer number of operations than the first representation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装备有独立可控元件阵列的光刻设备和数据处理管线。 解决方案：独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便在衬底上基本上形成所请求的剂量图案。 数据处理流水线压缩离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其以比第一表示少的操作被光栅化。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012108549A

公开(公告)日：2012-06-07

申请号：JP2012038950

申请日：2012-02-24

Applicant: ASML NETHERLANDS BV

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus comprising an array of individually controllable elements and a data processing pipeline.SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation.

公开(公告)号：JP2006338000A

公开(公告)日：2006-12-14

申请号：JP2006137659

申请日：2006-05-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an array of individually controllable elements and a data processing pipeline. SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有独立可控元件阵列和数据处理管线的光刻设备。 解决方案：独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便基本上在衬底上形成所请求的剂量图案。 数据处理流水线包括离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其可以以比第一表示少的操作进行光栅化。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006186371A

公开(公告)日：2006-07-13

申请号：JP2005373094

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： BONTEKOE MARCEL ,  TINNEMANS PATRICIUS ALOYSIUS J ,  KESSELS LAMBERTUS G M ,  VAN HASSEL MARCO CORNELIS J M ,  MULCKHUYSE WOUTER FRANS WILLEM

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus more efficiently using a bandwidth available within a data path inside a maskless lithographic system, and also to provide a device manufacturing method. SOLUTION: The lithography apparatus includes: a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times, and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes: a rasterizer device arranged to convert data; and also a data manipulation device arranged to constitute a control signal suitable for controlling the array of individually controllable elements. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：WO2013079316A3

公开(公告)日：2013-07-25

申请号：PCT/EP2012072497

申请日：2012-11-13

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  BONTEKOE MARCEL ,  PEETERS PATRICK

IPC: G03F7/20

CPC classification number: G06K15/1836 ,  G03F7/70291 ,  G03F7/70508

Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation comprises primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.

Abstract translation: 一种用于转换用于曝光设备，光刻或曝光设备的所需设备图案的向量表示的方法，向可编程图案形成设备提供数据的设备和方法以及设备制造方法。 在一个实施例中，用于转换的方法输出对应于期望的设备图案的期望的辐射剂量图案的光栅化表示，其中基于矢量的表示包括识别一个或多个基本图案的原始数据; 以及背景数据，其识别如何从每个识别的原始图案的一个或多个实例形成期望的设备图案的至少一部分，该方法包括形成在原始数据中标识的每个基元图案的光栅化图元，以及通过 存储与对应于该光栅化图元的实例数据相关联的每个光栅化图元。

公开(公告)号：SG123689A1

公开(公告)日：2006-07-26

申请号：SG200507862

申请日：2005-12-06

Applicant: ASML NETHERLANDS BV

Inventor： BONTEKOE MARCEL ,  TINNEMANS PATRICIUS ALOYSIUS J ,  KESSELS LAMBERTUS GERARDUS MAR ,  HASSEL VAN MARCO CORNELIS JACO ,  MULCKHUYSE WOUTER FRANS WILLEM

Abstract: A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence ofpoints within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

公开(公告)号：NL2009797A

公开(公告)日：2013-05-30

申请号：NL2009797

申请日：2012-11-13

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  BONTEKOE MARCEL ,  PEETERS PATRICK

IPC: G03F7/20