公开(公告)号：JP2010045381A

公开(公告)日：2010-02-25

申请号：JP2009224795

申请日：2009-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MARIA ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEPHUS MARIA ,  KAMEN HRISTOV CHILOV

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: The present invention includes a lithographic apparatus and a device manufacturing method that uses a patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase the update speed of an array of the individually controllable elements. Thus, the number of high-speed analog inputs required for the array is decreased, the complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithographic apparatus may include a plurality of supply channels. Each supply channel is disposed such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the required number of inputs to the patterning apparatus for individually addressing each cell is reduced. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种利用有效的图案形成装置的系统和方法。 解决方案：本发明包括使用增加可同时编程的独立可控元件的数量的图案形成装置的光刻设备和设备制造方法，以便增加独立可控元件阵列的更新速度 。 因此，阵列所需的高速模拟输入的数量减少，阵列的复杂度降低，阵列的最大更新速度增加。 此外，阵列中的元素的数量可以容易地增加。 图案形成装置被分成多个单元组，并且光刻设备可以包括多个供电通道。 每个供应通道被布置成使得其向与单元组对应的每个单元提供电压信号。 因此，减少了用于单独寻址每个单元的图案形成装置所需的输入数量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010033067A

公开(公告)日：2010-02-12

申请号：JP2009253100

申请日：2009-11-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus equipped with an array of individually controllable elements, and a data processing pipeline. SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements so as to substantially form the requested dose pattern on a substrate. The data processing pipeline compresses an offline preprocessing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which is rasterized in a fewer number of operations than the first representation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装备有独立可控元件阵列的光刻设备和数据处理管线。 解决方案：独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便在衬底上基本上形成所请求的剂量图案。 数据处理流水线压缩离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其以比第一表示少的操作被光栅化。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012108549A

公开(公告)日：2012-06-07

申请号：JP2012038950

申请日：2012-02-24

Applicant: ASML NETHERLANDS BV

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus comprising an array of individually controllable elements and a data processing pipeline.SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation.

公开(公告)号：JP2006352128A

公开(公告)日：2006-12-28

申请号：JP2006164154

申请日：2006-06-14

Applicant: ASML NETHERLANDS BV

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MAR ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEP ,  KAMEN HRISTOV CHILOV

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: A device-manufacturing method uses patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase update speed of an array of the individually controllable elements, and the system includes a lithography apparatus. Thus, the number of high-speed analog inputs required for the array is decreased, thereby complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithography apparatus includes a plurality of supply channels. Each supply channel is disposed, such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the number of inputs required for individually addressing each cell to the patterning apparatus is reduced. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2006338000A

公开(公告)日：2006-12-14

申请号：JP2006137659

申请日：2006-05-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an array of individually controllable elements and a data processing pipeline. SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有独立可控元件阵列和数据处理管线的光刻设备。 解决方案：独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便基本上在衬底上形成所请求的剂量图案。 数据处理流水线包括离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其可以以比第一表示少的操作进行光栅化。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：SG128584A1

公开(公告)日：2007-01-30

申请号：SG200603921

申请日：2006-06-08

Applicant: ASML NETHERLANDS BV

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MAR ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILHELMUS JOSEPH ,  CHILOV KAMEN HRISTOV

Abstract: The present invention comprises a lithographic apparatus and device manufacturing method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.