公开(公告)号：JP2007065662A

公开(公告)日：2007-03-15

申请号：JP2006231481

申请日：2006-08-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KESSELS LAMBERTUS GERARDUS MAR ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN ENGELEN REMCO J

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70508

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method utilizing an improved data compression/decompression system. SOLUTION: The lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation. The dictionary decompressor comprises: an external dictionary memory; a first dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to reference data to the external dictionary memory contained in the compressed representation; and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to reference data to the internal dictionary memory contained in compressed representation. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种利用改进的数据压缩/解压缩系统的光刻设备和设备制造方法。 解决方案：光刻设备包括调制辐射束的单独可控元件的阵列，压缩图案存储器，其通过调制光束存储要在衬底上形成的请求剂量图案的压缩表示，以及 字典解压缩器，其至少部分地解压缩压缩表示。 字典解压缩器包括：外部字典存储器; 第一字典解码器，其通过从所述外部字典存储器中提取与所述压缩表示中包含的外部字典存储器相对应的参考数据的模式数据的至少部分来解压缩所述压缩表示的至少一部分; 以及具有内部字典存储器的第二字典解码器，所述第二字典解码器通过从所述内部字典存储器将对应于参考数据的模式数据的部分提取到所述内部字典存储器来至少部分地解压缩所述压缩表示的至少一部分 包含在压缩表示中。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006352128A

公开(公告)日：2006-12-28

申请号：JP2006164154

申请日：2006-06-14

Applicant: ASML NETHERLANDS BV

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MAR ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEP ,  KAMEN HRISTOV CHILOV

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: A device-manufacturing method uses patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase update speed of an array of the individually controllable elements, and the system includes a lithography apparatus. Thus, the number of high-speed analog inputs required for the array is decreased, thereby complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithography apparatus includes a plurality of supply channels. Each supply channel is disposed, such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the number of inputs required for individually addressing each cell to the patterning apparatus is reduced. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：SG128584A1

公开(公告)日：2007-01-30

申请号：SG200603921

申请日：2006-06-08

Applicant: ASML NETHERLANDS BV

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MAR ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILHELMUS JOSEPH ,  CHILOV KAMEN HRISTOV

Abstract: The present invention comprises a lithographic apparatus and device manufacturing method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.

公开(公告)号：SG123689A1

公开(公告)日：2006-07-26

申请号：SG200507862

申请日：2005-12-06

Applicant: ASML NETHERLANDS BV

Inventor： BONTEKOE MARCEL ,  TINNEMANS PATRICIUS ALOYSIUS J ,  KESSELS LAMBERTUS GERARDUS MAR ,  HASSEL VAN MARCO CORNELIS JACO ,  MULCKHUYSE WOUTER FRANS WILLEM

Abstract: A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence ofpoints within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.