公开(公告)号：NL2007127A

公开(公告)日：2012-02-07

申请号：NL2007127

申请日：2011-07-18

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  BOEF ARIE ,  MOS EVERHARDUS ,  FUCHS ANDREAS ,  COOGANS MARTYN ,  SMILDE HENDRIK

IPC: G03F7/20

公开(公告)号：NL2007088A

公开(公告)日：2012-01-23

申请号：NL2007088

申请日：2011-07-12

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  BOEF ARIE ,  FUCHS ANDREAS ,  COOGANS MARTYN ,  BHATTACHARYYA KAUSTUVE ,  MORGAN STEPHEN PETER ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

Abstract: A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

公开(公告)号：NL2009723A

公开(公告)日：2013-06-03

申请号：NL2009723

申请日：2012-10-30

Applicant: ASML NETHERLANDS BV

Inventor： MIDDLEBROOKS SCOTT ,  PLUIJMS RENE ,  COOGANS MARTYN ,  NOOT MARC

IPC: G01N21/47 ,  G03F7/20