公开(公告)号：NL2004305A

公开(公告)日：2010-09-14

申请号：NL2004305

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  LIEROP MATHIEUS ,  DAVID SAMUEL ,  BESSEMS DAVID

IPC: G03F7/20 ,  G03F9/00

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.